JPS57120866A - Resistance value measuring method of thin film resistance - Google Patents

Resistance value measuring method of thin film resistance

Info

Publication number
JPS57120866A
JPS57120866A JP735381A JP735381A JPS57120866A JP S57120866 A JPS57120866 A JP S57120866A JP 735381 A JP735381 A JP 735381A JP 735381 A JP735381 A JP 735381A JP S57120866 A JPS57120866 A JP S57120866A
Authority
JP
Japan
Prior art keywords
thin film
resistance
film resistance
electrodes
resistance value
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP735381A
Other languages
Japanese (ja)
Inventor
Yasuo Kitahata
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Yokogawa Electric Corp
Original Assignee
Yokogawa Electric Corp
Yokogawa Hokushin Electric Corp
Yokogawa Electric Works Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Yokogawa Electric Corp, Yokogawa Hokushin Electric Corp, Yokogawa Electric Works Ltd filed Critical Yokogawa Electric Corp
Priority to JP735381A priority Critical patent/JPS57120866A/en
Publication of JPS57120866A publication Critical patent/JPS57120866A/en
Pending legal-status Critical Current

Links

Classifications

    • GPHYSICS
    • G01MEASURING; TESTING
    • G01RMEASURING ELECTRIC VARIABLES; MEASURING MAGNETIC VARIABLES
    • G01R27/00Arrangements for measuring resistance, reactance, impedance, or electric characteristics derived therefrom
    • G01R27/02Measuring real or complex resistance, reactance, impedance, or other two-pole characteristics derived therefrom, e.g. time constant

Abstract

PURPOSE:To make the whole device small-sized without requiring a shielding body, by measuring a resistance value of a thin film resistance by a double or quadruple concentric circle electrode placed on an insulating substance. CONSTITUTION:An evaporated substance generated from an evaporation source 11 adheres onto the surface of an insulating film 12 and electrodes 14a-14d, is solidified and forms a thin film resistance. Also, when prescribed voltage is supplied to the electrodes 14b, 14c from a constant-voltage power source 17 through lead wires 15b, 15c, a current flows between each electrode 14a-15d by said thin film resistance, and is detected by an ampere meter connected to the electrodes 14a, 14d through lead wires 15a, 15d. From this current value, a resistance value of the thin film resistance is derived, and thickness of the thin film resistance can be controlled to a desired value by adjusting the quantity of the evaporative substance generated from the evaporation source 11 in accordance with said resistance value. In this way, a shielding body becomes unnecessary by using a concentric circle electrode, and a measurement is executed with good reproducibility.
JP735381A 1981-01-21 1981-01-21 Resistance value measuring method of thin film resistance Pending JPS57120866A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP735381A JPS57120866A (en) 1981-01-21 1981-01-21 Resistance value measuring method of thin film resistance

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP735381A JPS57120866A (en) 1981-01-21 1981-01-21 Resistance value measuring method of thin film resistance

Publications (1)

Publication Number Publication Date
JPS57120866A true JPS57120866A (en) 1982-07-28

Family

ID=11663585

Family Applications (1)

Application Number Title Priority Date Filing Date
JP735381A Pending JPS57120866A (en) 1981-01-21 1981-01-21 Resistance value measuring method of thin film resistance

Country Status (1)

Country Link
JP (1) JPS57120866A (en)

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS62263474A (en) * 1986-05-09 1987-11-16 Japan Radio Co Ltd Detector for thin film resistor
EP0320469A2 (en) * 1987-12-11 1989-06-14 Officine Galileo S.p.A. An instrument for the measurement of the "ohms per square" of metalized films
CN111613547A (en) * 2020-05-29 2020-09-01 京东方科技集团股份有限公司 Substrate and film material determining method, manufacturing method and testing system

Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5138470B2 (en) * 1972-01-21 1976-10-21 Nippon Kokan Kk

Patent Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5138470B2 (en) * 1972-01-21 1976-10-21 Nippon Kokan Kk

Cited By (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS62263474A (en) * 1986-05-09 1987-11-16 Japan Radio Co Ltd Detector for thin film resistor
EP0320469A2 (en) * 1987-12-11 1989-06-14 Officine Galileo S.p.A. An instrument for the measurement of the "ohms per square" of metalized films
EP0320469A3 (en) * 1987-12-11 1989-06-28 Officine Galileo S.p.A. An instrument for the measurement of the "ohms per square" of metalized films
CN111613547A (en) * 2020-05-29 2020-09-01 京东方科技集团股份有限公司 Substrate and film material determining method, manufacturing method and testing system
CN111613547B (en) * 2020-05-29 2024-04-05 京东方科技集团股份有限公司 Substrate and film material determining method, manufacturing method and testing system

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