JPS5711952B2 - - Google Patents

Info

Publication number
JPS5711952B2
JPS5711952B2 JP10702974A JP10702974A JPS5711952B2 JP S5711952 B2 JPS5711952 B2 JP S5711952B2 JP 10702974 A JP10702974 A JP 10702974A JP 10702974 A JP10702974 A JP 10702974A JP S5711952 B2 JPS5711952 B2 JP S5711952B2
Authority
JP
Japan
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
JP10702974A
Other versions
JPS5056380A (ja
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Priority claimed from DE19732346799 external-priority patent/DE2346799C3/de
Application filed filed Critical
Publication of JPS5056380A publication Critical patent/JPS5056380A/ja
Publication of JPS5711952B2 publication Critical patent/JPS5711952B2/ja
Expired legal-status Critical Current

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/24—Vacuum evaporation
    • C23C14/28—Vacuum evaporation by wave energy or particle radiation
    • C23C14/30—Vacuum evaporation by wave energy or particle radiation by electron bombardment

Landscapes

  • Chemical & Material Sciences (AREA)
  • Health & Medical Sciences (AREA)
  • Toxicology (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Physical Vapour Deposition (AREA)
  • Electron Sources, Ion Sources (AREA)
  • Manufacturing Of Magnetic Record Carriers (AREA)
JP10702974A 1973-09-17 1974-09-17 Expired JPS5711952B2 (ja)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
DE19732346799 DE2346799C3 (de) 1973-09-17 Elektronenstrahlverdampfer

Publications (2)

Publication Number Publication Date
JPS5056380A JPS5056380A (ja) 1975-05-17
JPS5711952B2 true JPS5711952B2 (ja) 1982-03-08

Family

ID=5892846

Family Applications (1)

Application Number Title Priority Date Filing Date
JP10702974A Expired JPS5711952B2 (ja) 1973-09-17 1974-09-17

Country Status (6)

Country Link
US (1) US3931490A (ja)
JP (1) JPS5711952B2 (ja)
DD (1) DD113570A5 (ja)
FR (1) FR2244014B1 (ja)
GB (1) GB1457165A (ja)
NL (1) NL7412256A (ja)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5959754U (ja) * 1982-10-13 1984-04-19 セイレイ工業株式会社 枝打機のエンジン停止用スイツチ
JPS61285934A (ja) * 1985-06-12 1986-12-16 開成工業株式会社 枝打機

Families Citing this family (23)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DD204947A1 (de) * 1982-04-20 1983-12-14 Manfred Neumann Einrichtung zum elektronenstrahlbedampfen breiter baender
DD208995A1 (de) * 1982-08-03 1984-04-18 Manfred Neumann Einrichtung zum elektronenstrahlbedampfen sehr breiter baender
JP3568189B2 (ja) * 1999-04-21 2004-09-22 東北パイオニア株式会社 有機ｅｌディスプレイの製造方法および装置
TW490714B (en) * 1999-12-27 2002-06-11 Semiconductor Energy Lab Film formation apparatus and method for forming a film
US20020011205A1 (en) * 2000-05-02 2002-01-31 Shunpei Yamazaki Film-forming apparatus, method of cleaning the same, and method of manufacturing a light-emitting device
US7517551B2 (en) * 2000-05-12 2009-04-14 Semiconductor Energy Laboratory Co., Ltd. Method of manufacturing a light-emitting device
SG113448A1 (en) * 2002-02-25 2005-08-29 Semiconductor Energy Lab Fabrication system and a fabrication method of a light emitting device
US7309269B2 (en) * 2002-04-15 2007-12-18 Semiconductor Energy Laboratory Co., Ltd. Method of fabricating light-emitting device and apparatus for manufacturing light-emitting device
US20040035360A1 (en) * 2002-05-17 2004-02-26 Semiconductor Energy Laboratory Co., Ltd. Manufacturing apparatus
TWI336905B (en) * 2002-05-17 2011-02-01 Semiconductor Energy Lab Evaporation method, evaporation device and method of fabricating light emitting device
US20030221620A1 (en) * 2002-06-03 2003-12-04 Semiconductor Energy Laboratory Co., Ltd. Vapor deposition device
US20040040504A1 (en) * 2002-08-01 2004-03-04 Semiconductor Energy Laboratory Co., Ltd. Manufacturing apparatus
TWI277363B (en) * 2002-08-30 2007-03-21 Semiconductor Energy Lab Fabrication system, light-emitting device and fabricating method of organic compound-containing layer
US20040123804A1 (en) * 2002-09-20 2004-07-01 Semiconductor Energy Laboratory Co., Ltd. Fabrication system and manufacturing method of light emitting device
US7211461B2 (en) * 2003-02-14 2007-05-01 Semiconductor Energy Laboratory Co., Ltd. Manufacturing apparatus
JP4463492B2 (ja) * 2003-04-10 2010-05-19 株式会社半導体エネルギー研究所 製造装置
JP4493926B2 (ja) 2003-04-25 2010-06-30 株式会社半導体エネルギー研究所 製造装置
US7211454B2 (en) * 2003-07-25 2007-05-01 Semiconductor Energy Laboratory Co., Ltd. Manufacturing method of a light emitting device including moving the source of the vapor deposition parallel to the substrate
US8123862B2 (en) 2003-08-15 2012-02-28 Semiconductor Energy Laboratory Co., Ltd. Deposition apparatus and manufacturing apparatus
JP4545504B2 (ja) * 2004-07-15 2010-09-15 株式会社半導体エネルギー研究所 膜形成方法、発光装置の作製方法
US20100140078A1 (en) * 2008-12-05 2010-06-10 Solopower, Inc. Method and apparatus for forming contact layers for continuous workpieces
CN201864770U (zh) * 2010-11-22 2011-06-15 江苏淘镜有限公司 电子枪蒸发用坩埚
DE102018117130A1 (de) * 2018-07-16 2020-01-16 VON ARDENNE Asset GmbH & Co. KG Beschichtungsanordnung und Verfahren

Family Cites Families (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3364296A (en) * 1963-06-12 1968-01-16 Air Reduction Electron beam furnace
US3244855A (en) * 1963-07-19 1966-04-05 United States Steel Corp System for correcting the shift of an electron-gun beam from the desired region of impingement
US3389210A (en) * 1965-03-29 1968-06-18 Everette M. Whitson Multiple crucible for a permanent magnet transverse electron beam evaporation source
US3394217A (en) * 1965-06-11 1968-07-23 Air Reduction Method and apparatus for controlling plural electron beams
US3432335A (en) * 1966-03-15 1969-03-11 Lokomotivbau Elektrotech Cyclically moving electron beam for uniform vapor deposited coating
US3394678A (en) * 1966-12-23 1968-07-30 Air Reduction Apparatus for vacuum coating
US3612859A (en) * 1968-01-31 1971-10-12 Westinghouse Electric Corp Method for measuring and controlling the density of a metallic vapor
US3714416A (en) * 1969-02-24 1973-01-30 Applied Radiation Corp Method and apparatus for irradiation treatment of elongate materials
US3655902A (en) * 1970-10-19 1972-04-11 Air Reduction Heating system for electron beam furnace

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5959754U (ja) * 1982-10-13 1984-04-19 セイレイ工業株式会社 枝打機のエンジン停止用スイツチ
JPS61285934A (ja) * 1985-06-12 1986-12-16 開成工業株式会社 枝打機

Also Published As

Publication number Publication date
DD113570A5 (ja) 1975-06-12
GB1457165A (en) 1976-12-01
NL7412256A (nl) 1975-03-19
FR2244014A1 (ja) 1975-04-11
DE2346799A1 (de) 1975-04-24
FR2244014B1 (ja) 1976-10-08
DE2346799B2 (de) 1976-04-22
US3931490A (en) 1976-01-06
JPS5056380A (ja) 1975-05-17

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