JPS57117340A - Improved plasma reaction treatment apparatus - Google Patents

Improved plasma reaction treatment apparatus

Info

Publication number
JPS57117340A
JPS57117340A JP17739381A JP17739381A JPS57117340A JP S57117340 A JPS57117340 A JP S57117340A JP 17739381 A JP17739381 A JP 17739381A JP 17739381 A JP17739381 A JP 17739381A JP S57117340 A JPS57117340 A JP S57117340A
Authority
JP
Japan
Prior art keywords
reaction chamber
plasma reaction
reaction treatment
treatment apparatus
irregularity
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP17739381A
Other languages
English (en)
Japanese (ja)
Other versions
JPS6253941B2 (cg-RX-API-DMAC7.html
Inventor
Akira Uehara
Hisashi Nakane
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Tokyo Ohka Kogyo Co Ltd
Original Assignee
Tokyo Ohka Kogyo Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Tokyo Ohka Kogyo Co Ltd filed Critical Tokyo Ohka Kogyo Co Ltd
Priority to JP17739381A priority Critical patent/JPS57117340A/ja
Publication of JPS57117340A publication Critical patent/JPS57117340A/ja
Publication of JPS6253941B2 publication Critical patent/JPS6253941B2/ja
Granted legal-status Critical Current

Links

Landscapes

  • Physical Or Chemical Processes And Apparatus (AREA)
  • Drying Of Semiconductors (AREA)
JP17739381A 1981-11-05 1981-11-05 Improved plasma reaction treatment apparatus Granted JPS57117340A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP17739381A JPS57117340A (en) 1981-11-05 1981-11-05 Improved plasma reaction treatment apparatus

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP17739381A JPS57117340A (en) 1981-11-05 1981-11-05 Improved plasma reaction treatment apparatus

Related Parent Applications (1)

Application Number Title Priority Date Filing Date
JP8588077A Division JPS5421175A (en) 1977-07-18 1977-07-18 Improvement of plasma reaction processor

Publications (2)

Publication Number Publication Date
JPS57117340A true JPS57117340A (en) 1982-07-21
JPS6253941B2 JPS6253941B2 (cg-RX-API-DMAC7.html) 1987-11-12

Family

ID=16030144

Family Applications (1)

Application Number Title Priority Date Filing Date
JP17739381A Granted JPS57117340A (en) 1981-11-05 1981-11-05 Improved plasma reaction treatment apparatus

Country Status (1)

Country Link
JP (1) JPS57117340A (cg-RX-API-DMAC7.html)

Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS51106218U (cg-RX-API-DMAC7.html) * 1975-02-24 1976-08-25

Patent Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS51106218U (cg-RX-API-DMAC7.html) * 1975-02-24 1976-08-25

Also Published As

Publication number Publication date
JPS6253941B2 (cg-RX-API-DMAC7.html) 1987-11-12

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