JPS5711448A - Hollow cathode discharge device - Google Patents

Hollow cathode discharge device

Info

Publication number
JPS5711448A
JPS5711448A JP8489780A JP8489780A JPS5711448A JP S5711448 A JPS5711448 A JP S5711448A JP 8489780 A JP8489780 A JP 8489780A JP 8489780 A JP8489780 A JP 8489780A JP S5711448 A JPS5711448 A JP S5711448A
Authority
JP
Japan
Prior art keywords
hollow cathode
orifice
charged particles
magnetic field
discharge
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP8489780A
Other languages
Japanese (ja)
Inventor
Shigeki Kadoma
Setsuo Suzuki
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Toshiba Corp
Original Assignee
Toshiba Corp
Tokyo Shibaura Electric Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Toshiba Corp, Tokyo Shibaura Electric Co Ltd filed Critical Toshiba Corp
Priority to JP8489780A priority Critical patent/JPS5711448A/en
Publication of JPS5711448A publication Critical patent/JPS5711448A/en
Pending legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J27/00—Ion beam tubes
    • H01J27/02—Ion sources; Ion guns
    • H01J27/08—Ion sources; Ion guns using arc discharge

Abstract

PURPOSE:To improve the life of a hollow cathode electrode and ease the starting of discharge by reducing the collision of electrically charged particles on the orifice of a hollow cathode through applying a magnetic field along the axial direction of the hollow cathode on the orifice of it. CONSTITUTION:A magnetic field generator 10 comprising a ring-wound coil 10a, and cylindrical wound coil 10b is provided coaxially with the hollow cathode 2 outside the discharge chamber 1 of it. Thus a magnetic field along the axial direction of the cathode 2 is applied in the inside of the hollow cathode 2, especially on the part of orifice 5a strongly, and the line of magnetic force distribution is formed as solid line A. Charged particles (e) move along lines of magnetic force during arc discharging. The collision of charged particles (e) on the orifice 5a is reduced, therefore the thickness of the end plate 5 of the orifice 5a can be made thin, the life of a hollow cathode can be improved through reduction of wear of the orifice 5a, and the starting of discharge can be eased through the enlarging the depth of electric field in the hollow cathode 2.
JP8489780A 1980-06-23 1980-06-23 Hollow cathode discharge device Pending JPS5711448A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP8489780A JPS5711448A (en) 1980-06-23 1980-06-23 Hollow cathode discharge device

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP8489780A JPS5711448A (en) 1980-06-23 1980-06-23 Hollow cathode discharge device

Publications (1)

Publication Number Publication Date
JPS5711448A true JPS5711448A (en) 1982-01-21

Family

ID=13843523

Family Applications (1)

Application Number Title Priority Date Filing Date
JP8489780A Pending JPS5711448A (en) 1980-06-23 1980-06-23 Hollow cathode discharge device

Country Status (1)

Country Link
JP (1) JPS5711448A (en)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO1999010560A1 (en) * 1997-08-29 1999-03-04 Minnesota Mining And Manufacturing Company Jet plasma process and apparatus for deposition of coatings and coatings thus obtained
WO2011037488A1 (en) * 2009-09-22 2011-03-31 Inano Limited Plasma ion source

Cited By (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO1999010560A1 (en) * 1997-08-29 1999-03-04 Minnesota Mining And Manufacturing Company Jet plasma process and apparatus for deposition of coatings and coatings thus obtained
US6203898B1 (en) 1997-08-29 2001-03-20 3M Innovatave Properties Company Article comprising a substrate having a silicone coating
US6348237B2 (en) 1997-08-29 2002-02-19 3M Innovative Properties Company Jet plasma process for deposition of coatings
US7189436B2 (en) 1997-08-29 2007-03-13 3M Innovative Properties Company Flash evaporation-plasma coating deposition method
WO2011037488A1 (en) * 2009-09-22 2011-03-31 Inano Limited Plasma ion source

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