JPS57114141A - Increasing method for developing power of developer for positive type photosensitive resin - Google Patents

Increasing method for developing power of developer for positive type photosensitive resin

Info

Publication number
JPS57114141A
JPS57114141A JP91081A JP91081A JPS57114141A JP S57114141 A JPS57114141 A JP S57114141A JP 91081 A JP91081 A JP 91081A JP 91081 A JP91081 A JP 91081A JP S57114141 A JPS57114141 A JP S57114141A
Authority
JP
Japan
Prior art keywords
developer
photosensitive resin
developing
positive type
type photosensitive
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP91081A
Other languages
English (en)
Japanese (ja)
Other versions
JPS6360896B2 (enrdf_load_stackoverflow
Inventor
Hideo Matsuzaki
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
San Ei Kagaku Co Ltd
Sanei Kagaku Kogyo KK
Original Assignee
San Ei Kagaku Co Ltd
Sanei Kagaku Kogyo KK
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by San Ei Kagaku Co Ltd, Sanei Kagaku Kogyo KK filed Critical San Ei Kagaku Co Ltd
Priority to JP91081A priority Critical patent/JPS57114141A/ja
Publication of JPS57114141A publication Critical patent/JPS57114141A/ja
Publication of JPS6360896B2 publication Critical patent/JPS6360896B2/ja
Granted legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/26—Processing photosensitive materials; Apparatus therefor
    • G03F7/30—Imagewise removal using liquid means
    • G03F7/32—Liquid compositions therefor, e.g. developers
    • G03F7/322—Aqueous alkaline compositions

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
JP91081A 1981-01-06 1981-01-06 Increasing method for developing power of developer for positive type photosensitive resin Granted JPS57114141A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP91081A JPS57114141A (en) 1981-01-06 1981-01-06 Increasing method for developing power of developer for positive type photosensitive resin

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP91081A JPS57114141A (en) 1981-01-06 1981-01-06 Increasing method for developing power of developer for positive type photosensitive resin

Publications (2)

Publication Number Publication Date
JPS57114141A true JPS57114141A (en) 1982-07-15
JPS6360896B2 JPS6360896B2 (enrdf_load_stackoverflow) 1988-11-25

Family

ID=11486825

Family Applications (1)

Application Number Title Priority Date Filing Date
JP91081A Granted JPS57114141A (en) 1981-01-06 1981-01-06 Increasing method for developing power of developer for positive type photosensitive resin

Country Status (1)

Country Link
JP (1) JPS57114141A (enrdf_load_stackoverflow)

Cited By (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS59182444A (ja) * 1983-04-01 1984-10-17 Sumitomo Chem Co Ltd ポジ型フオトレジストの改良現像液
JPS59219743A (ja) * 1983-05-28 1984-12-11 Tokyo Ohka Kogyo Co Ltd ポジ型レジスト現像液
JPS60254043A (ja) * 1984-05-30 1985-12-14 Yotsukaichi Gosei Kk ポジ型感光材料用現像剤
JPS62139289A (ja) * 1985-12-12 1987-06-22 富士電機株式会社 高周波誘導加熱装置
JPS63106651A (ja) * 1986-07-02 1988-05-11 Mitsui Toatsu Chem Inc レジスト膜の形成方法
US4777119A (en) * 1986-01-29 1988-10-11 Hughes Aircraft Company Method for developing poly(methacrylic anhydride) resists
JPS6419345A (en) * 1987-04-06 1989-01-23 Thiokol Morton Inc High contrast positive photoresist developer containing alkanol amine
JPH01279245A (ja) * 1988-05-02 1989-11-09 Dainippon Ink & Chem Inc 現像液組成物
JPH02151866A (ja) * 1988-11-21 1990-06-11 Macdermid Inc フォトレジスト現像液
US5094934A (en) * 1987-04-06 1992-03-10 Morton International, Inc. Method of developing a high contrast, positive photoresist using a developer containing alkanolamine

Cited By (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS59182444A (ja) * 1983-04-01 1984-10-17 Sumitomo Chem Co Ltd ポジ型フオトレジストの改良現像液
JPS59219743A (ja) * 1983-05-28 1984-12-11 Tokyo Ohka Kogyo Co Ltd ポジ型レジスト現像液
JPS60254043A (ja) * 1984-05-30 1985-12-14 Yotsukaichi Gosei Kk ポジ型感光材料用現像剤
JPS62139289A (ja) * 1985-12-12 1987-06-22 富士電機株式会社 高周波誘導加熱装置
US4777119A (en) * 1986-01-29 1988-10-11 Hughes Aircraft Company Method for developing poly(methacrylic anhydride) resists
JPS63106651A (ja) * 1986-07-02 1988-05-11 Mitsui Toatsu Chem Inc レジスト膜の形成方法
JPS6419345A (en) * 1987-04-06 1989-01-23 Thiokol Morton Inc High contrast positive photoresist developer containing alkanol amine
US5094934A (en) * 1987-04-06 1992-03-10 Morton International, Inc. Method of developing a high contrast, positive photoresist using a developer containing alkanolamine
JPH01279245A (ja) * 1988-05-02 1989-11-09 Dainippon Ink & Chem Inc 現像液組成物
JPH02151866A (ja) * 1988-11-21 1990-06-11 Macdermid Inc フォトレジスト現像液

Also Published As

Publication number Publication date
JPS6360896B2 (enrdf_load_stackoverflow) 1988-11-25

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