JPS57112744A - Photoresist - Google Patents
PhotoresistInfo
- Publication number
- JPS57112744A JPS57112744A JP18723780A JP18723780A JPS57112744A JP S57112744 A JPS57112744 A JP S57112744A JP 18723780 A JP18723780 A JP 18723780A JP 18723780 A JP18723780 A JP 18723780A JP S57112744 A JPS57112744 A JP S57112744A
- Authority
- JP
- Japan
- Prior art keywords
- resist
- type resist
- ultraviolet rays
- electron beams
- photoresist
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/09—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers
- G03F7/105—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers having substances, e.g. indicators, for forming visible images
Landscapes
- Engineering & Computer Science (AREA)
- Architecture (AREA)
- Structural Engineering (AREA)
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Non-Silver Salt Photosensitive Materials And Non-Silver Salt Photography (AREA)
- Electron Beam Exposure (AREA)
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP18723780A JPS57112744A (en) | 1980-12-29 | 1980-12-29 | Photoresist |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP18723780A JPS57112744A (en) | 1980-12-29 | 1980-12-29 | Photoresist |
Publications (2)
Publication Number | Publication Date |
---|---|
JPS57112744A true JPS57112744A (en) | 1982-07-13 |
JPH033210B2 JPH033210B2 (ja) | 1991-01-18 |
Family
ID=16202448
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP18723780A Granted JPS57112744A (en) | 1980-12-29 | 1980-12-29 | Photoresist |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS57112744A (ja) |
Citations (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS5379528A (en) * | 1976-12-23 | 1978-07-14 | Fujitsu Ltd | Pattern formation process |
JPS5559455A (en) * | 1978-10-25 | 1980-05-02 | Fuji Photo Film Co Ltd | Image formation method |
JPS55110240A (en) * | 1979-02-19 | 1980-08-25 | Fujitsu Ltd | Photoresist |
-
1980
- 1980-12-29 JP JP18723780A patent/JPS57112744A/ja active Granted
Patent Citations (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS5379528A (en) * | 1976-12-23 | 1978-07-14 | Fujitsu Ltd | Pattern formation process |
JPS5559455A (en) * | 1978-10-25 | 1980-05-02 | Fuji Photo Film Co Ltd | Image formation method |
JPS55110240A (en) * | 1979-02-19 | 1980-08-25 | Fujitsu Ltd | Photoresist |
Also Published As
Publication number | Publication date |
---|---|
JPH033210B2 (ja) | 1991-01-18 |
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