JPS5689737A - Electron beam sensitive composition - Google Patents
Electron beam sensitive compositionInfo
- Publication number
- JPS5689737A JPS5689737A JP16715179A JP16715179A JPS5689737A JP S5689737 A JPS5689737 A JP S5689737A JP 16715179 A JP16715179 A JP 16715179A JP 16715179 A JP16715179 A JP 16715179A JP S5689737 A JPS5689737 A JP S5689737A
- Authority
- JP
- Japan
- Prior art keywords
- represented
- formula
- deriv
- halogen
- furylacrolein
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03C—PHOTOSENSITIVE MATERIALS FOR PHOTOGRAPHIC PURPOSES; PHOTOGRAPHIC PROCESSES, e.g. CINE, X-RAY, COLOUR, STEREO-PHOTOGRAPHIC PROCESSES; AUXILIARY PROCESSES IN PHOTOGRAPHY
- G03C1/00—Photosensitive materials
- G03C1/72—Photosensitive compositions not covered by the groups G03C1/005 - G03C1/705
- G03C1/73—Photosensitive compositions not covered by the groups G03C1/005 - G03C1/705 containing organic compounds
Landscapes
- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Materials Engineering (AREA)
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
Abstract
PURPOSE:To obtain a composition having stability to ultraviolet light and visible light and superior reactivity to electron beams by mixing the reaction product of furylacrolein and an aromatic amine with a halogen-contg. high molecular compound. CONSTITUTION:Furylacrolein represented by formula I is reacted with an indoline deriv. represented by formula II (where each of X and Y is acyl, alkyl, alkoxyl, amino, nitro or halogen, m is 0-4 and n is 0-4), a tetrahydroquinoline deriv. represented by formula III (where n is 0-6) or an N-alkylaniline deriv. represented by formula IV (where n is 0-5 and R is alkyl) in an equipmolar ratio. By mixing 1pt.wt. of the resulting reaction product with about 1-100pts.wt. of a halogen- contg. high molecular compound such as polyvinyl chloride, the titled composition is obtd.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP54167151A JPS5817944B2 (en) | 1979-12-21 | 1979-12-21 | Electron beam sensitive composition |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP54167151A JPS5817944B2 (en) | 1979-12-21 | 1979-12-21 | Electron beam sensitive composition |
Publications (2)
Publication Number | Publication Date |
---|---|
JPS5689737A true JPS5689737A (en) | 1981-07-21 |
JPS5817944B2 JPS5817944B2 (en) | 1983-04-11 |
Family
ID=15844360
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP54167151A Expired JPS5817944B2 (en) | 1979-12-21 | 1979-12-21 | Electron beam sensitive composition |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS5817944B2 (en) |
Citations (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS4915490A (en) * | 1972-03-22 | 1974-02-09 |
-
1979
- 1979-12-21 JP JP54167151A patent/JPS5817944B2/en not_active Expired
Patent Citations (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS4915490A (en) * | 1972-03-22 | 1974-02-09 |
Also Published As
Publication number | Publication date |
---|---|
JPS5817944B2 (en) | 1983-04-11 |
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