JPS5683937A - Electron beam exposing device - Google Patents

Electron beam exposing device

Info

Publication number
JPS5683937A
JPS5683937A JP16103279A JP16103279A JPS5683937A JP S5683937 A JPS5683937 A JP S5683937A JP 16103279 A JP16103279 A JP 16103279A JP 16103279 A JP16103279 A JP 16103279A JP S5683937 A JPS5683937 A JP S5683937A
Authority
JP
Japan
Prior art keywords
temperature
table block
electronic
adjustor
short period
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP16103279A
Other languages
Japanese (ja)
Inventor
Shigeru Furuya
Sumio Yamamoto
Akira Taguchi
Yoshimi Yamashita
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Fujitsu Ltd
Original Assignee
Fujitsu Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Fujitsu Ltd filed Critical Fujitsu Ltd
Priority to JP16103279A priority Critical patent/JPS5683937A/en
Publication of JPS5683937A publication Critical patent/JPS5683937A/en
Pending legal-status Critical Current

Links

Classifications

    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01JELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/02Details
    • H01J37/20Means for supporting or positioning the objects or the material; Means for adjusting diaphragms or lenses associated with the support
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01JELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/20Positioning, supporting, modifying or maintaining the physical state of objects being observed or treated
    • H01J2237/2001Maintaining constant desired temperature

Landscapes

  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Electron Beam Exposure (AREA)

Abstract

PURPOSE:To improve an efficiency of operation by a method wherein a temperature detector and an electronic temperature adjuster element are arranged on a table block, and a temperature of the table block is adjusted to a desired value in a short period of time. CONSTITUTION:Temperature of the table block 13 is sensed by a thermocouple 22 and always compared with a desired temperature set by a temperature setting means 24. Either a positive or a negative voltage is applied to an electronic temperature adjustor 21 from the temperature adjuster 23 so as to make difference zero, the electronic adjustor element is operated as a heater or a cooler and the table block 13 is kept at a desired temperature. With this arrangement, the treated material 12 on the table block 13 is heated through a thermal condition from the table block 13, rapidly increased to reach to the desired temperature in a short period of time and stabled. Thus, a working efficiency may be improved more.
JP16103279A 1979-12-12 1979-12-12 Electron beam exposing device Pending JPS5683937A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP16103279A JPS5683937A (en) 1979-12-12 1979-12-12 Electron beam exposing device

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP16103279A JPS5683937A (en) 1979-12-12 1979-12-12 Electron beam exposing device

Publications (1)

Publication Number Publication Date
JPS5683937A true JPS5683937A (en) 1981-07-08

Family

ID=15727294

Family Applications (1)

Application Number Title Priority Date Filing Date
JP16103279A Pending JPS5683937A (en) 1979-12-12 1979-12-12 Electron beam exposing device

Country Status (1)

Country Link
JP (1) JPS5683937A (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0472612A (en) * 1990-07-12 1992-03-06 Fujitsu Ltd Electron beam exposure device

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0472612A (en) * 1990-07-12 1992-03-06 Fujitsu Ltd Electron beam exposure device

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