JPS5678129A - Ic guide rail for ic handler - Google Patents

Ic guide rail for ic handler

Info

Publication number
JPS5678129A
JPS5678129A JP15531379A JP15531379A JPS5678129A JP S5678129 A JPS5678129 A JP S5678129A JP 15531379 A JP15531379 A JP 15531379A JP 15531379 A JP15531379 A JP 15531379A JP S5678129 A JPS5678129 A JP S5678129A
Authority
JP
Japan
Prior art keywords
guide rail
rail
handler
fused
plasmatic
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP15531379A
Other languages
Japanese (ja)
Inventor
Shoji Omomo
Toshio Kizawa
Kenpei Suzuki
Shinichi Koya
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Advantest Corp
Fujitsu Ltd
Original Assignee
Advantest Corp
Fujitsu Ltd
Takeda Riken Industries Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Advantest Corp, Fujitsu Ltd, Takeda Riken Industries Co Ltd filed Critical Advantest Corp
Priority to JP15531379A priority Critical patent/JPS5678129A/en
Publication of JPS5678129A publication Critical patent/JPS5678129A/en
Pending legal-status Critical Current

Links

Classifications

    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/04Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer
    • H01L21/50Assembly of semiconductor devices using processes or apparatus not provided for in a single one of the subgroups H01L21/06 - H01L21/326, e.g. sealing of a cap to a base of a container

Landscapes

  • Engineering & Computer Science (AREA)
  • Physics & Mathematics (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • General Physics & Mathematics (AREA)
  • Manufacturing & Machinery (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Testing Of Individual Semiconductor Devices (AREA)

Abstract

PURPOSE:To obtain the guide rail with an excellent quality and a high reliability for the subject IC handler by a method wherein a coating is formed on a metallic base material for rail by injecting fused ceramic in a plasmatic atmosphere. CONSTITUTION:A package, wherein an IC 10 is fed, and a terminal 11 slide on a metallic guide rail 3 and impact abrasion is also added when the IC strikes against a stopper. When a coating 33 is formed on a rail material 32 by performing a plasmatic injection of the fused Al2O3 and TiO2 or the mixture of them, the guide rail of an excellent quality and a high reliability can be obtained, because the ceramic layer has an excellent abrasion resistance and a high insulating property, and no electrification is generated. Also in this constitution, the fused ceramic is injected thickly so that an abrasive machining can be performed on the surface and this enables to obtain a smooth surface by having an easy grinding with a diamond grindstone.
JP15531379A 1979-11-30 1979-11-30 Ic guide rail for ic handler Pending JPS5678129A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP15531379A JPS5678129A (en) 1979-11-30 1979-11-30 Ic guide rail for ic handler

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP15531379A JPS5678129A (en) 1979-11-30 1979-11-30 Ic guide rail for ic handler

Publications (1)

Publication Number Publication Date
JPS5678129A true JPS5678129A (en) 1981-06-26

Family

ID=15603152

Family Applications (1)

Application Number Title Priority Date Filing Date
JP15531379A Pending JPS5678129A (en) 1979-11-30 1979-11-30 Ic guide rail for ic handler

Country Status (1)

Country Link
JP (1) JPS5678129A (en)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS61130110A (en) * 1984-11-30 1986-06-18 Toshiba Corp Semiconductor unit conveyor device
JPS61138181A (en) * 1984-12-11 1986-06-25 Toshiba Corp Semiconductor transfer device

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS61130110A (en) * 1984-11-30 1986-06-18 Toshiba Corp Semiconductor unit conveyor device
JPS61138181A (en) * 1984-12-11 1986-06-25 Toshiba Corp Semiconductor transfer device

Similar Documents

Publication Publication Date Title
TR200002377T2 (en) Process for the production of powder polish.
ES457466A1 (en) Process for embedding hard particles in a bearing surface
EP0295023A3 (en) Method of fabricating a superconductive body, and apparatus and systems comprising the body
JPS55114962A (en) Surface potentiometer
JPS5678129A (en) Ic guide rail for ic handler
JPS55137803A (en) Cutting tool covered with cemented carbide and manufacture thereof
JPS5645326A (en) Spark machining device
ATE1784T1 (en) PROCESS FOR THE MANUFACTURE OF DIAMOND PARTICLES AND METAL BOND ABRASIVE TOOL MANUFACTURED THEREFORE.
GB800680A (en) Gear-finishing tool
JPS5654619A (en) Connecting material filling method for magnetic head
JPS51117390A (en) Diamond grindstone for polishing glass
GB856047A (en) Improvements in diamond tools
JPS54129589A (en) Grindstone for grinding cylinders
JPS5214359A (en) Process for sealing of the semiconductor and lead-frame used in this method
JPS57111827A (en) Thin film magnetic head
SU415285A1 (en)
JPS5453390A (en) Dressing method of grinding stone
JPS523795A (en) Honing grindstone and superfinished grindstone containing silicon carb ide fiber
Seligman PULSE LIFE AND DIELECTRIC STRENGTH OF A GLASS-FILLED EPOXY RESIN SYSTEM
GB877726A (en) Improvements in and relating to gear-finishing tool
JPS52138601A (en) Holder for machine winding
JPS6476982A (en) Ceramic having magnetic property on surface and production thereof
JPS57185375A (en) Grinding liquid
ES242629A3 (en) Procedure for the preparation of a porcelain enamel layer applicable to a ferrosa metallic alloy surface. (Machine-translation by Google Translate, not legally binding)
JPS57121464A (en) Object holding method for automatic polishing machine