JPS567428A - Holding mechanism for silicon substrate - Google Patents

Holding mechanism for silicon substrate

Info

Publication number
JPS567428A
JPS567428A JP8358079A JP8358079A JPS567428A JP S567428 A JPS567428 A JP S567428A JP 8358079 A JP8358079 A JP 8358079A JP 8358079 A JP8358079 A JP 8358079A JP S567428 A JPS567428 A JP S567428A
Authority
JP
Japan
Prior art keywords
substrate
platen
slider
holding mechanism
carrying
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP8358079A
Other languages
English (en)
Japanese (ja)
Other versions
JPS626301B2 (enExample
Inventor
Toshio Matsuyama
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
NEC Kyushu Ltd
Original Assignee
NEC Kyushu Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by NEC Kyushu Ltd filed Critical NEC Kyushu Ltd
Priority to JP8358079A priority Critical patent/JPS567428A/ja
Publication of JPS567428A publication Critical patent/JPS567428A/ja
Publication of JPS626301B2 publication Critical patent/JPS626301B2/ja
Granted legal-status Critical Current

Links

Classifications

    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/04Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer
    • H01L21/18Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer the devices having semiconductor bodies comprising elements of Group IV of the Periodic Table or AIIIBV compounds with or without impurities, e.g. doping materials
    • H01L21/26Bombardment with radiation
    • H01L21/263Bombardment with radiation with high-energy radiation
    • H01L21/265Bombardment with radiation with high-energy radiation producing ion implantation

Landscapes

  • Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • High Energy & Nuclear Physics (AREA)
  • General Physics & Mathematics (AREA)
  • Toxicology (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • Health & Medical Sciences (AREA)
  • Manufacturing & Machinery (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Feeding Of Articles By Means Other Than Belts Or Rollers (AREA)
  • Discharge By Other Means (AREA)
JP8358079A 1979-07-02 1979-07-02 Holding mechanism for silicon substrate Granted JPS567428A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP8358079A JPS567428A (en) 1979-07-02 1979-07-02 Holding mechanism for silicon substrate

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP8358079A JPS567428A (en) 1979-07-02 1979-07-02 Holding mechanism for silicon substrate

Publications (2)

Publication Number Publication Date
JPS567428A true JPS567428A (en) 1981-01-26
JPS626301B2 JPS626301B2 (enExample) 1987-02-10

Family

ID=13806426

Family Applications (1)

Application Number Title Priority Date Filing Date
JP8358079A Granted JPS567428A (en) 1979-07-02 1979-07-02 Holding mechanism for silicon substrate

Country Status (1)

Country Link
JP (1) JPS567428A (enExample)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS60133628U (ja) * 1984-02-14 1985-09-06 関西日本電気株式会社 イオン注入装置

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS60133628U (ja) * 1984-02-14 1985-09-06 関西日本電気株式会社 イオン注入装置

Also Published As

Publication number Publication date
JPS626301B2 (enExample) 1987-02-10

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