JPS5667844A - Photosetting composition - Google Patents

Photosetting composition

Info

Publication number
JPS5667844A
JPS5667844A JP14325079A JP14325079A JPS5667844A JP S5667844 A JPS5667844 A JP S5667844A JP 14325079 A JP14325079 A JP 14325079A JP 14325079 A JP14325079 A JP 14325079A JP S5667844 A JPS5667844 A JP S5667844A
Authority
JP
Japan
Prior art keywords
photopolymn
initiator
monoazaindole
nongaseous
azaindole
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP14325079A
Other languages
English (en)
Japanese (ja)
Other versions
JPS5749894B2 (OSRAM
Inventor
Toshihide Takemoto
Tadashi Taguchi
Noboru Fujikawa
Mitsuo Kono
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Asahi Chemical Industry Co Ltd
Original Assignee
Asahi Chemical Industry Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Asahi Chemical Industry Co Ltd filed Critical Asahi Chemical Industry Co Ltd
Priority to JP14325079A priority Critical patent/JPS5667844A/ja
Publication of JPS5667844A publication Critical patent/JPS5667844A/ja
Publication of JPS5749894B2 publication Critical patent/JPS5749894B2/ja
Granted legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/085—Photosensitive compositions characterised by adhesion-promoting non-macromolecular additives

Landscapes

  • Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • General Physics & Mathematics (AREA)
  • Polymerisation Methods In General (AREA)
  • ing And Chemical Polishing (AREA)
JP14325079A 1979-11-07 1979-11-07 Photosetting composition Granted JPS5667844A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP14325079A JPS5667844A (en) 1979-11-07 1979-11-07 Photosetting composition

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP14325079A JPS5667844A (en) 1979-11-07 1979-11-07 Photosetting composition

Publications (2)

Publication Number Publication Date
JPS5667844A true JPS5667844A (en) 1981-06-08
JPS5749894B2 JPS5749894B2 (OSRAM) 1982-10-25

Family

ID=15334368

Family Applications (1)

Application Number Title Priority Date Filing Date
JP14325079A Granted JPS5667844A (en) 1979-11-07 1979-11-07 Photosetting composition

Country Status (1)

Country Link
JP (1) JPS5667844A (OSRAM)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN105669677A (zh) * 2016-03-01 2016-06-15 苏州艾缇克药物化学有限公司 一种6-氯-7-氮杂吲哚的合成方法

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN105669677A (zh) * 2016-03-01 2016-06-15 苏州艾缇克药物化学有限公司 一种6-氯-7-氮杂吲哚的合成方法

Also Published As

Publication number Publication date
JPS5749894B2 (OSRAM) 1982-10-25

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