JPS5749894B2 - - Google Patents

Info

Publication number
JPS5749894B2
JPS5749894B2 JP14325079A JP14325079A JPS5749894B2 JP S5749894 B2 JPS5749894 B2 JP S5749894B2 JP 14325079 A JP14325079 A JP 14325079A JP 14325079 A JP14325079 A JP 14325079A JP S5749894 B2 JPS5749894 B2 JP S5749894B2
Authority
JP
Japan
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
JP14325079A
Other languages
Japanese (ja)
Other versions
JPS5667844A (en
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed filed Critical
Priority to JP14325079A priority Critical patent/JPS5667844A/ja
Publication of JPS5667844A publication Critical patent/JPS5667844A/ja
Publication of JPS5749894B2 publication Critical patent/JPS5749894B2/ja
Granted legal-status Critical Current

Links

Classifications

    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004Photosensitive materials
    • G03F7/085Photosensitive compositions characterised by adhesion-promoting non-macromolecular additives

Landscapes

  • Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • General Physics & Mathematics (AREA)
  • Polymerisation Methods In General (AREA)
  • ing And Chemical Polishing (AREA)
JP14325079A 1979-11-07 1979-11-07 Photosetting composition Granted JPS5667844A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP14325079A JPS5667844A (en) 1979-11-07 1979-11-07 Photosetting composition

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP14325079A JPS5667844A (en) 1979-11-07 1979-11-07 Photosetting composition

Publications (2)

Publication Number Publication Date
JPS5667844A JPS5667844A (en) 1981-06-08
JPS5749894B2 true JPS5749894B2 (OSRAM) 1982-10-25

Family

ID=15334368

Family Applications (1)

Application Number Title Priority Date Filing Date
JP14325079A Granted JPS5667844A (en) 1979-11-07 1979-11-07 Photosetting composition

Country Status (1)

Country Link
JP (1) JPS5667844A (OSRAM)

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN105669677A (zh) * 2016-03-01 2016-06-15 苏州艾缇克药物化学有限公司 一种6-氯-7-氮杂吲哚的合成方法

Also Published As

Publication number Publication date
JPS5667844A (en) 1981-06-08

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