JPS5667845A - Photopolymerizing composition - Google Patents

Photopolymerizing composition

Info

Publication number
JPS5667845A
JPS5667845A JP14325179A JP14325179A JPS5667845A JP S5667845 A JPS5667845 A JP S5667845A JP 14325179 A JP14325179 A JP 14325179A JP 14325179 A JP14325179 A JP 14325179A JP S5667845 A JPS5667845 A JP S5667845A
Authority
JP
Japan
Prior art keywords
diphenylcarbazone
photopolymn
initiator
composition
nongaseous
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP14325179A
Other languages
Japanese (ja)
Other versions
JPS5740500B2 (en
Inventor
Toshihide Takemoto
Tadashi Taguchi
Noboru Fujikawa
Mitsuo Kono
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Asahi Chemical Industry Co Ltd
Original Assignee
Asahi Chemical Industry Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Asahi Chemical Industry Co Ltd filed Critical Asahi Chemical Industry Co Ltd
Priority to JP14325179A priority Critical patent/JPS5667845A/en
Publication of JPS5667845A publication Critical patent/JPS5667845A/en
Publication of JPS5740500B2 publication Critical patent/JPS5740500B2/ja
Granted legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/085—Photosensitive compositions characterised by adhesion-promoting non-macromolecular additives

Abstract

PURPOSE:To improve the bonding strength of a photopolymerizing composition to a resist and a copper substrate by adding diphenylcarbazone or its deriv. to the composition consisting of a nongaseous ethylenic unsatd. compound and a photopolymn. initiator. CONSTITUTION:This composition consists of a nongaseous ethylenic unsatd. compound (A) having two or more terminal ethylene groups and forming a polymer in the presence of a photopolymn. initiator, the photopolymn. initiator (B) capable of being activated by active light and diphenylcarbazone or its deriv. (C) represented by the formula (where X is O, S or Se, each of R1-10 is H, 1-4C alkyl, aromatic hydrocarbon, amino, NHR' or halogen and R' is 1-4C alkyl), e.g., diphenylcarbazone or dichlorodiphenylcarbazone.
JP14325179A 1979-11-07 1979-11-07 Photopolymerizing composition Granted JPS5667845A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP14325179A JPS5667845A (en) 1979-11-07 1979-11-07 Photopolymerizing composition

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP14325179A JPS5667845A (en) 1979-11-07 1979-11-07 Photopolymerizing composition

Publications (2)

Publication Number Publication Date
JPS5667845A true JPS5667845A (en) 1981-06-08
JPS5740500B2 JPS5740500B2 (en) 1982-08-27

Family

ID=15334393

Family Applications (1)

Application Number Title Priority Date Filing Date
JP14325179A Granted JPS5667845A (en) 1979-11-07 1979-11-07 Photopolymerizing composition

Country Status (1)

Country Link
JP (1) JPS5667845A (en)

Also Published As

Publication number Publication date
JPS5740500B2 (en) 1982-08-27

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