JPS5666848A - Improved method for preparing seamless printing master - Google Patents

Improved method for preparing seamless printing master

Info

Publication number
JPS5666848A
JPS5666848A JP14216079A JP14216079A JPS5666848A JP S5666848 A JPS5666848 A JP S5666848A JP 14216079 A JP14216079 A JP 14216079A JP 14216079 A JP14216079 A JP 14216079A JP S5666848 A JPS5666848 A JP S5666848A
Authority
JP
Japan
Prior art keywords
cylinder
carrier
resin
printing master
image carrier
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP14216079A
Other languages
English (en)
Japanese (ja)
Other versions
JPS6321889B2 (enrdf_load_stackoverflow
Inventor
Motoaki Takahashi
Nobuo Ogawa
Tsutomu Kojima
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Asahi Chemical Industry Co Ltd
Original Assignee
Asahi Chemical Industry Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Asahi Chemical Industry Co Ltd filed Critical Asahi Chemical Industry Co Ltd
Priority to JP14216079A priority Critical patent/JPS5666848A/ja
Publication of JPS5666848A publication Critical patent/JPS5666848A/ja
Publication of JPS6321889B2 publication Critical patent/JPS6321889B2/ja
Granted legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/20—Exposure; Apparatus therefor
    • G03F7/2035—Exposure; Apparatus therefor simultaneous coating and exposure; using a belt mask, e.g. endless

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Printing Plates And Materials Therefor (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
JP14216079A 1979-11-03 1979-11-03 Improved method for preparing seamless printing master Granted JPS5666848A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP14216079A JPS5666848A (en) 1979-11-03 1979-11-03 Improved method for preparing seamless printing master

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP14216079A JPS5666848A (en) 1979-11-03 1979-11-03 Improved method for preparing seamless printing master

Publications (2)

Publication Number Publication Date
JPS5666848A true JPS5666848A (en) 1981-06-05
JPS6321889B2 JPS6321889B2 (enrdf_load_stackoverflow) 1988-05-10

Family

ID=15308751

Family Applications (1)

Application Number Title Priority Date Filing Date
JP14216079A Granted JPS5666848A (en) 1979-11-03 1979-11-03 Improved method for preparing seamless printing master

Country Status (1)

Country Link
JP (1) JPS5666848A (enrdf_load_stackoverflow)

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5990843A (ja) * 1982-09-27 1984-05-25 イ−・アイ・デユポン・ド・ネモア−ス・アンド・コンパニ− フレキソ印刷プレート
WO2002067058A1 (de) * 2001-02-21 2002-08-29 Siemens Aktiengesellschaft Anordnung zur kontinuierlichen erzeugung eines strukturierten, beschichteten substrates
JP2013207060A (ja) * 2012-03-28 2013-10-07 Sony Corp 構造物形成装置、構造物の製造方法及び構造物

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0656784U (ja) * 1993-01-18 1994-08-05 リズム時計工業株式会社 分針車のスリップ機構

Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS55108665A (en) * 1979-02-14 1980-08-21 Asahi Chem Ind Co Ltd Production of seamless printing plate and producing apparatus thereof

Patent Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS55108665A (en) * 1979-02-14 1980-08-21 Asahi Chem Ind Co Ltd Production of seamless printing plate and producing apparatus thereof

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5990843A (ja) * 1982-09-27 1984-05-25 イ−・アイ・デユポン・ド・ネモア−ス・アンド・コンパニ− フレキソ印刷プレート
WO2002067058A1 (de) * 2001-02-21 2002-08-29 Siemens Aktiengesellschaft Anordnung zur kontinuierlichen erzeugung eines strukturierten, beschichteten substrates
JP2013207060A (ja) * 2012-03-28 2013-10-07 Sony Corp 構造物形成装置、構造物の製造方法及び構造物

Also Published As

Publication number Publication date
JPS6321889B2 (enrdf_load_stackoverflow) 1988-05-10

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