JPS5665979A - Production of heat-resistant silicide film with aluminum oxide vapor deposited compositely - Google Patents

Production of heat-resistant silicide film with aluminum oxide vapor deposited compositely

Info

Publication number
JPS5665979A
JPS5665979A JP13932479A JP13932479A JPS5665979A JP S5665979 A JPS5665979 A JP S5665979A JP 13932479 A JP13932479 A JP 13932479A JP 13932479 A JP13932479 A JP 13932479A JP S5665979 A JPS5665979 A JP S5665979A
Authority
JP
Japan
Prior art keywords
vapor
silicon
heat
silicide film
compositely
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP13932479A
Other languages
Japanese (ja)
Other versions
JPS5849634B2 (en
Inventor
Katsuo Fukutomi
Masahiro Kitajima
Masatoshi Okada
Ryoji Watanabe
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
National Research Institute for Metals
Original Assignee
National Research Institute for Metals
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by National Research Institute for Metals filed Critical National Research Institute for Metals
Priority to JP13932479A priority Critical patent/JPS5849634B2/en
Publication of JPS5665979A publication Critical patent/JPS5665979A/en
Publication of JPS5849634B2 publication Critical patent/JPS5849634B2/en
Expired legal-status Critical Current

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/0021—Reactive sputtering or evaporation

Landscapes

  • Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Physical Vapour Deposition (AREA)

Abstract

PURPOSE:To form a heat-resistant silicide film, by inducing glow discharge to cause plasma chemical reaction in the vapor phase where nitrogen or carbon- containing gas is mixed with mixture vapor of silicon vapor, aluminum vapor and oxygen. CONSTITUTION:The material consisting of, for example, molybdenum and tungsten is fitted into the ion plating device, and silicon and alumina pieces are provided in the device. After air in the device is evacuated and inert gas is led into the device, silicon and alumina are fused and evaporated by electron beam impulse to generate mixture gas of silicon-aluminum-oxygen. The carbon source such as acetylene and the nitrogen source such as ammonia are led into this vapor and are mixed. Glow discharge is induced in this vapor phase by high-frequency discharge, microwave discharge, and so on to cause plasma chemical reaction, thereby depositing a composite silicide on the base material.
JP13932479A 1979-10-30 1979-10-30 Method for producing heat-resistant silicide film with composite vapor deposition of aluminum oxide Expired JPS5849634B2 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP13932479A JPS5849634B2 (en) 1979-10-30 1979-10-30 Method for producing heat-resistant silicide film with composite vapor deposition of aluminum oxide

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP13932479A JPS5849634B2 (en) 1979-10-30 1979-10-30 Method for producing heat-resistant silicide film with composite vapor deposition of aluminum oxide

Publications (2)

Publication Number Publication Date
JPS5665979A true JPS5665979A (en) 1981-06-04
JPS5849634B2 JPS5849634B2 (en) 1983-11-05

Family

ID=15242651

Family Applications (1)

Application Number Title Priority Date Filing Date
JP13932479A Expired JPS5849634B2 (en) 1979-10-30 1979-10-30 Method for producing heat-resistant silicide film with composite vapor deposition of aluminum oxide

Country Status (1)

Country Link
JP (1) JPS5849634B2 (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN108107035A (en) * 2017-12-07 2018-06-01 中铝材料应用研究院有限公司 A kind of method that glow discharge spectrometry measures aluminium material surface coating mass

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP2902189B1 (en) * 2012-09-28 2021-01-20 Dai Nippon Printing Co., Ltd. Transparent vapor-deposited film

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN108107035A (en) * 2017-12-07 2018-06-01 中铝材料应用研究院有限公司 A kind of method that glow discharge spectrometry measures aluminium material surface coating mass

Also Published As

Publication number Publication date
JPS5849634B2 (en) 1983-11-05

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