JPS5660334A - Spectral analyzer for plasma light source light emission - Google Patents

Spectral analyzer for plasma light source light emission

Info

Publication number
JPS5660334A
JPS5660334A JP13578679A JP13578679A JPS5660334A JP S5660334 A JPS5660334 A JP S5660334A JP 13578679 A JP13578679 A JP 13578679A JP 13578679 A JP13578679 A JP 13578679A JP S5660334 A JPS5660334 A JP S5660334A
Authority
JP
Japan
Prior art keywords
carrier gas
plasma torch
plasma
adjusting means
detected
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP13578679A
Other languages
Japanese (ja)
Other versions
JPS622258B2 (en
Inventor
Satoru Imai
Shotaro Asada
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Shimadzu Corp
Original Assignee
Shimadzu Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Shimadzu Corp filed Critical Shimadzu Corp
Priority to JP13578679A priority Critical patent/JPS5660334A/en
Publication of JPS5660334A publication Critical patent/JPS5660334A/en
Publication of JPS622258B2 publication Critical patent/JPS622258B2/ja
Granted legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
    • G01N21/62—Systems in which the material investigated is excited whereby it emits light or causes a change in wavelength of the incident light
    • G01N21/71—Systems in which the material investigated is excited whereby it emits light or causes a change in wavelength of the incident light thermally excited
    • G01N21/73—Systems in which the material investigated is excited whereby it emits light or causes a change in wavelength of the incident light thermally excited using plasma burners or torches

Landscapes

  • Health & Medical Sciences (AREA)
  • Physics & Mathematics (AREA)
  • Chemical & Material Sciences (AREA)
  • Plasma & Fusion (AREA)
  • Nuclear Medicine, Radiotherapy & Molecular Imaging (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Analytical Chemistry (AREA)
  • Biochemistry (AREA)
  • General Health & Medical Sciences (AREA)
  • General Physics & Mathematics (AREA)
  • Immunology (AREA)
  • Pathology (AREA)
  • Investigating, Analyzing Materials By Fluorescence Or Luminescence (AREA)

Abstract

PURPOSE:To improve analysis precision, by providing a carrier gas flow rate adjusting means, a plasma torch vertical position adjusting means, and a spectroscope emission slit width adjusting means. CONSTITUTION:Argon gas and ground gas forming plasma are supplied from the lower part to plasma torch 1 by fixed flow rates respectively. That is, carrier gas passes through flow meter 5 and is jetted into spray room 7 through flow rate adjusting stop 6. The CPU is a microcomputer and stores proper values of the carrier gas flou rate, the plasma torch vertical position and the slit width for respective elements; and when an element to be detected is designated, respective parameters for this element are read, and the adjusting mechanism of stop 6, width adjusting mechanism 15 of emission slit S2, and so on are driven, so that the optimum inspection for each element to be detected can be performed automatically with one operation.
JP13578679A 1979-10-20 1979-10-20 Spectral analyzer for plasma light source light emission Granted JPS5660334A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP13578679A JPS5660334A (en) 1979-10-20 1979-10-20 Spectral analyzer for plasma light source light emission

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP13578679A JPS5660334A (en) 1979-10-20 1979-10-20 Spectral analyzer for plasma light source light emission

Publications (2)

Publication Number Publication Date
JPS5660334A true JPS5660334A (en) 1981-05-25
JPS622258B2 JPS622258B2 (en) 1987-01-19

Family

ID=15159803

Family Applications (1)

Application Number Title Priority Date Filing Date
JP13578679A Granted JPS5660334A (en) 1979-10-20 1979-10-20 Spectral analyzer for plasma light source light emission

Country Status (1)

Country Link
JP (1) JPS5660334A (en)

Cited By (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS59186279A (en) * 1983-04-06 1984-10-23 Meidensha Electric Mfg Co Ltd Control of inhibitor of inorganic system dendrite in electrolyte of zinc-bromine battery
JPS60119444A (en) * 1983-11-30 1985-06-26 Shimadzu Corp Cathode luminescence detecting device
JPS60179636A (en) * 1984-02-27 1985-09-13 Shimadzu Corp High frequency induction coupling plasma type emission spectrochemical analyzing apparatus
JPS61140950U (en) * 1985-02-22 1986-09-01
JPS6275334A (en) * 1985-09-30 1987-04-07 Yokogawa Electric Corp High frecquency induction bond plasma emission spectrosope
JPH08261938A (en) * 1996-04-17 1996-10-11 Shimadzu Corp High-frequency inductively coupled plasma emission spectral analyzer
JP2010243348A (en) * 2009-04-07 2010-10-28 Shimadzu Corp Icp emission analyzer and icp emission analysis method

Cited By (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS59186279A (en) * 1983-04-06 1984-10-23 Meidensha Electric Mfg Co Ltd Control of inhibitor of inorganic system dendrite in electrolyte of zinc-bromine battery
JPS60119444A (en) * 1983-11-30 1985-06-26 Shimadzu Corp Cathode luminescence detecting device
JPS60179636A (en) * 1984-02-27 1985-09-13 Shimadzu Corp High frequency induction coupling plasma type emission spectrochemical analyzing apparatus
JPS61140950U (en) * 1985-02-22 1986-09-01
JPH052846Y2 (en) * 1985-02-22 1993-01-25
JPS6275334A (en) * 1985-09-30 1987-04-07 Yokogawa Electric Corp High frecquency induction bond plasma emission spectrosope
JPH08261938A (en) * 1996-04-17 1996-10-11 Shimadzu Corp High-frequency inductively coupled plasma emission spectral analyzer
JP2010243348A (en) * 2009-04-07 2010-10-28 Shimadzu Corp Icp emission analyzer and icp emission analysis method

Also Published As

Publication number Publication date
JPS622258B2 (en) 1987-01-19

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