JPS565983B2 - - Google Patents
Info
- Publication number
- JPS565983B2 JPS565983B2 JP8687576A JP8687576A JPS565983B2 JP S565983 B2 JPS565983 B2 JP S565983B2 JP 8687576 A JP8687576 A JP 8687576A JP 8687576 A JP8687576 A JP 8687576A JP S565983 B2 JPS565983 B2 JP S565983B2
- Authority
- JP
- Japan
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
Classifications
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
- C08F8/00—Chemical modification by after-treatment
- C08F8/30—Introducing nitrogen atoms or nitrogen-containing groups
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/008—Azides
- G03F7/012—Macromolecular azides; Macromolecular additives, e.g. binders
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/008—Azides
- G03F7/012—Macromolecular azides; Macromolecular additives, e.g. binders
- G03F7/0125—Macromolecular azides; Macromolecular additives, e.g. binders characterised by the polymeric binder or the macromolecular additives other than the macromolecular azides
Landscapes
- Physics & Mathematics (AREA)
- Chemical & Material Sciences (AREA)
- Spectroscopy & Molecular Physics (AREA)
- General Physics & Mathematics (AREA)
- General Chemical & Material Sciences (AREA)
- Health & Medical Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Medicinal Chemistry (AREA)
- Polymers & Plastics (AREA)
- Organic Chemistry (AREA)
- Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)
- Macromonomer-Based Addition Polymer (AREA)
Priority Applications (3)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP8687576A JPS5312984A (en) | 1976-07-21 | 1976-07-21 | Photosensitive composition |
| GB3074577A GB1580959A (en) | 1976-07-21 | 1977-07-21 | Substituted acrylamide and polymers |
| DE19772733005 DE2733005C3 (de) | 1976-07-21 | 1977-07-21 | Lichtempfindliche Masse |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP8687576A JPS5312984A (en) | 1976-07-21 | 1976-07-21 | Photosensitive composition |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS5312984A JPS5312984A (en) | 1978-02-06 |
| JPS565983B2 true JPS565983B2 (ja) | 1981-02-07 |
Family
ID=13898990
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP8687576A Granted JPS5312984A (en) | 1976-07-21 | 1976-07-21 | Photosensitive composition |
Country Status (3)
| Country | Link |
|---|---|
| JP (1) | JPS5312984A (ja) |
| DE (1) | DE2733005C3 (ja) |
| GB (1) | GB1580959A (ja) |
Families Citing this family (8)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS5412544B2 (ja) * | 1972-12-09 | 1979-05-23 | ||
| DE3541534A1 (de) * | 1985-11-25 | 1987-05-27 | Hoechst Ag | Positiv arbeitendes strahlungsempfindliches gemisch |
| GB8802314D0 (en) * | 1988-02-03 | 1988-03-02 | Vickers Plc | Improvements in/relating to radiation-sensitive compounds |
| JP2944296B2 (ja) | 1992-04-06 | 1999-08-30 | 富士写真フイルム株式会社 | 感光性平版印刷版の製造方法 |
| JP4036440B2 (ja) * | 2002-03-29 | 2008-01-23 | 東洋合成工業株式会社 | 新規な感光性化合物及び感光性樹脂並びに感光性組成物 |
| EP1865012A4 (en) * | 2005-03-31 | 2009-09-02 | Toyo Gosei Co Ltd | LIGHT-SENSITIVE RESIN, LIGHT-SENSITIVE COMPOSITION AND LIGHT-NETWORKED ELEMENT |
| JP5020871B2 (ja) | 2008-03-25 | 2012-09-05 | 富士フイルム株式会社 | 平版印刷版の製造方法 |
| JP5422134B2 (ja) | 2008-03-25 | 2014-02-19 | 富士フイルム株式会社 | 浸漬型平版印刷版用自動現像方法 |
Family Cites Families (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| DE2134333A1 (en) * | 1970-07-10 | 1972-01-20 | Agency Of Industrial Science And Technology, Tokio | Light sensitive compsn with azido substd polymeric structure |
| BE790383A (fr) * | 1971-10-22 | 1973-02-15 | Howson Algraphy Ltd | Matière sensibles à la lumière |
| JPS592099B2 (ja) * | 1973-11-24 | 1984-01-17 | テイアツクビデオ (株) | 磁気録画再生装置のマガジン装着装置 |
| JPS5146204A (en) * | 1974-10-14 | 1976-04-20 | Konishiroku Photo Ind | Kankoseisoseibutsu |
-
1976
- 1976-07-21 JP JP8687576A patent/JPS5312984A/ja active Granted
-
1977
- 1977-07-21 DE DE19772733005 patent/DE2733005C3/de not_active Expired
- 1977-07-21 GB GB3074577A patent/GB1580959A/en not_active Expired
Also Published As
| Publication number | Publication date |
|---|---|
| DE2733005C3 (de) | 1981-11-05 |
| JPS5312984A (en) | 1978-02-06 |
| DE2733005B2 (de) | 1981-01-29 |
| GB1580959A (en) | 1980-12-10 |
| DE2733005A1 (de) | 1978-01-26 |