JPS5649521A - Formation of thin film - Google Patents
Formation of thin filmInfo
- Publication number
- JPS5649521A JPS5649521A JP12484779A JP12484779A JPS5649521A JP S5649521 A JPS5649521 A JP S5649521A JP 12484779 A JP12484779 A JP 12484779A JP 12484779 A JP12484779 A JP 12484779A JP S5649521 A JPS5649521 A JP S5649521A
- Authority
- JP
- Japan
- Prior art keywords
- electrode
- substrate
- thin film
- plus
- minus
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Classifications
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
- C23C16/50—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating using electric discharges
- C23C16/503—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating using electric discharges using dc or ac discharges
Landscapes
- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Physics & Mathematics (AREA)
- Plasma & Fusion (AREA)
- General Chemical & Material Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Materials Engineering (AREA)
- Mechanical Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Chemical Vapour Deposition (AREA)
- Photovoltaic Devices (AREA)
Abstract
PURPOSE:To reduce a quantity of gas consumption and to easily obtain a thin film of a high specific resistance by a method wherein a thin film is formed on a substrate in such way that a minus side electrode and a plus side electrode are provided leaving a prescribed space from the substrate side and a DC glow discharge is used. CONSTITUTION:On the bottom of a vacuum case 1 having a vacuum exhaust system 9, a plus-side electrode 3 with a CH4 leading-in opening 6 at the central part is provided and a mesh form minus-side electrode 2 is provided on said electrode 3. A substrate holder 4 with a substrate 5 such as glass or the like is adhered on the undersurface is provided on the ceiling of the above electrode 2, a minus-side terminal coming from a DC power source 8 located on the outside is connected to the holder 4 and a plus-side terminal is connected to the electrode 3 respectively. With the above constitution, CH4 gas is filled in the case 1 using a valve 7, the inside of the case 1 is maintained at about 0.1Torr, flow discharge is generated by applying a voltage of approximately 950V and a high resistance carbon film is precipitated on the surface of the substrate 5.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP12484779A JPS5649521A (en) | 1979-09-28 | 1979-09-28 | Formation of thin film |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP12484779A JPS5649521A (en) | 1979-09-28 | 1979-09-28 | Formation of thin film |
Publications (1)
Publication Number | Publication Date |
---|---|
JPS5649521A true JPS5649521A (en) | 1981-05-06 |
Family
ID=14895562
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP12484779A Pending JPS5649521A (en) | 1979-09-28 | 1979-09-28 | Formation of thin film |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS5649521A (en) |
Cited By (12)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS58147554A (en) * | 1982-02-25 | 1983-09-02 | Sumitomo Electric Ind Ltd | Manufacture of coated sintered hard alloy tool |
JPS6016419A (en) * | 1983-07-08 | 1985-01-28 | Nippon Denshi Kogyo Kk | Plasma cvd processing apparatus |
EP0150878A2 (en) * | 1984-01-28 | 1985-08-07 | Philips Patentverwaltung GmbH | Process for the manufacture of a thin film strain gage system |
US4673588A (en) * | 1984-01-28 | 1987-06-16 | U.S. Philips Corporation | Device for coating a substrate by means of plasma-CVD or cathode sputtering |
JPS62224922A (en) * | 1986-03-27 | 1987-10-02 | Mitsui Toatsu Chem Inc | Manufacture of semiconductor and equipment therefor |
US4783369A (en) * | 1985-03-23 | 1988-11-08 | Canon Kabushiki Kaisha | Heat-generating resistor and heat-generating resistance element using same |
US4804974A (en) * | 1985-03-23 | 1989-02-14 | Canon Kabushiki Kaisha | Thermal recording head |
US4845513A (en) * | 1985-03-23 | 1989-07-04 | Canon Kabushiki Kaisha | Thermal recording head |
US4847639A (en) * | 1985-06-10 | 1989-07-11 | Canon Kabushiki Kaisha | Liquid jet recording head and recording system incorporating the same |
US4870388A (en) * | 1985-03-22 | 1989-09-26 | Canon Kabushiki Kaisha | Heat-generating resistor and heat-generating resistance element using same |
US4983993A (en) * | 1985-03-25 | 1991-01-08 | Canon Kabushiki Kaisha | Thermal recording head |
JP2010015118A (en) * | 2008-07-04 | 2010-01-21 | Yoshiko Kato | Eyeglasses nose pad |
-
1979
- 1979-09-28 JP JP12484779A patent/JPS5649521A/en active Pending
Cited By (14)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS58147554A (en) * | 1982-02-25 | 1983-09-02 | Sumitomo Electric Ind Ltd | Manufacture of coated sintered hard alloy tool |
JPS6016419A (en) * | 1983-07-08 | 1985-01-28 | Nippon Denshi Kogyo Kk | Plasma cvd processing apparatus |
EP0301604A2 (en) * | 1984-01-28 | 1989-02-01 | Philips Patentverwaltung GmbH | Apparatus for coating a substrate by plasma-chemical vapour deposition or cathodic sputtering, and process using the apparatus |
EP0150878A2 (en) * | 1984-01-28 | 1985-08-07 | Philips Patentverwaltung GmbH | Process for the manufacture of a thin film strain gage system |
US4673588A (en) * | 1984-01-28 | 1987-06-16 | U.S. Philips Corporation | Device for coating a substrate by means of plasma-CVD or cathode sputtering |
US4715319A (en) * | 1984-01-28 | 1987-12-29 | U.S. Philips Corporation | Device for coating a substrate by means of plasma-CVD or cathode sputtering |
US4870388A (en) * | 1985-03-22 | 1989-09-26 | Canon Kabushiki Kaisha | Heat-generating resistor and heat-generating resistance element using same |
US4783369A (en) * | 1985-03-23 | 1988-11-08 | Canon Kabushiki Kaisha | Heat-generating resistor and heat-generating resistance element using same |
US4804974A (en) * | 1985-03-23 | 1989-02-14 | Canon Kabushiki Kaisha | Thermal recording head |
US4845513A (en) * | 1985-03-23 | 1989-07-04 | Canon Kabushiki Kaisha | Thermal recording head |
US4983993A (en) * | 1985-03-25 | 1991-01-08 | Canon Kabushiki Kaisha | Thermal recording head |
US4847639A (en) * | 1985-06-10 | 1989-07-11 | Canon Kabushiki Kaisha | Liquid jet recording head and recording system incorporating the same |
JPS62224922A (en) * | 1986-03-27 | 1987-10-02 | Mitsui Toatsu Chem Inc | Manufacture of semiconductor and equipment therefor |
JP2010015118A (en) * | 2008-07-04 | 2010-01-21 | Yoshiko Kato | Eyeglasses nose pad |
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