JPS5648632A - Photosensitive lithographic plate - Google Patents
Photosensitive lithographic plateInfo
- Publication number
- JPS5648632A JPS5648632A JP12492779A JP12492779A JPS5648632A JP S5648632 A JPS5648632 A JP S5648632A JP 12492779 A JP12492779 A JP 12492779A JP 12492779 A JP12492779 A JP 12492779A JP S5648632 A JPS5648632 A JP S5648632A
- Authority
- JP
- Japan
- Prior art keywords
- image
- layer
- oil soluble
- lipophilic
- lithographic plate
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 239000000839 emulsion Substances 0.000 abstract 2
- WOAHJDHKFWSLKE-UHFFFAOYSA-N 1,2-benzoquinone Chemical compound O=C1C=CC=CC1=O WOAHJDHKFWSLKE-UHFFFAOYSA-N 0.000 abstract 1
- 238000010521 absorption reaction Methods 0.000 abstract 1
- 150000001875 compounds Chemical class 0.000 abstract 1
- 230000006866 deterioration Effects 0.000 abstract 1
- 238000004090 dissolution Methods 0.000 abstract 1
- 230000005660 hydrophilic surface Effects 0.000 abstract 1
- 229910052709 silver Inorganic materials 0.000 abstract 1
- 239000004332 silver Substances 0.000 abstract 1
- -1 silver halide Chemical class 0.000 abstract 1
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/09—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers
- G03F7/091—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers characterised by antireflection means or light filtering or absorbing means, e.g. anti-halation, contrast enhancement
Landscapes
- Engineering & Computer Science (AREA)
- Architecture (AREA)
- Structural Engineering (AREA)
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Photosensitive Polymer And Photoresist Processing (AREA)
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP12492779A JPS5648632A (en) | 1979-09-28 | 1979-09-28 | Photosensitive lithographic plate |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP12492779A JPS5648632A (en) | 1979-09-28 | 1979-09-28 | Photosensitive lithographic plate |
Publications (2)
Publication Number | Publication Date |
---|---|
JPS5648632A true JPS5648632A (en) | 1981-05-01 |
JPS6339896B2 JPS6339896B2 (enrdf_load_stackoverflow) | 1988-08-08 |
Family
ID=14897596
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP12492779A Granted JPS5648632A (en) | 1979-09-28 | 1979-09-28 | Photosensitive lithographic plate |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS5648632A (enrdf_load_stackoverflow) |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS62234149A (ja) * | 1985-12-23 | 1987-10-14 | ゼネラル・エレクトリック・カンパニイ | ホトレジスト記録媒体 |
Families Citing this family (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH06290869A (ja) * | 1992-03-31 | 1994-10-18 | Shin Etsu Polymer Co Ltd | El表示灯 |
Citations (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS5427804A (en) * | 1977-07-29 | 1979-03-02 | Riso Kagaku Corp | Method and material for photoengraving |
-
1979
- 1979-09-28 JP JP12492779A patent/JPS5648632A/ja active Granted
Patent Citations (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS5427804A (en) * | 1977-07-29 | 1979-03-02 | Riso Kagaku Corp | Method and material for photoengraving |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS62234149A (ja) * | 1985-12-23 | 1987-10-14 | ゼネラル・エレクトリック・カンパニイ | ホトレジスト記録媒体 |
Also Published As
Publication number | Publication date |
---|---|
JPS6339896B2 (enrdf_load_stackoverflow) | 1988-08-08 |
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