JPS5644773A - Gas plasma processing apparatus of material to be etched - Google Patents
Gas plasma processing apparatus of material to be etchedInfo
- Publication number
- JPS5644773A JPS5644773A JP11951979A JP11951979A JPS5644773A JP S5644773 A JPS5644773 A JP S5644773A JP 11951979 A JP11951979 A JP 11951979A JP 11951979 A JP11951979 A JP 11951979A JP S5644773 A JPS5644773 A JP S5644773A
- Authority
- JP
- Japan
- Prior art keywords
- etched
- gas plasma
- processing apparatus
- plasma processing
- stand
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Landscapes
- ing And Chemical Polishing (AREA)
Abstract
PURPOSE: To form the minute pattern film with high accuracy, by providing cooling mechanism of material to be etched in the gas plasma processing apparatus.
CONSTITUTION: Thermal decomposition or softening of photoresist film due to temperature rise of material to be etched, is prevented. For example, about 10°C cooling water is flowed in the sample stand 7 at about 5l/min. flowing rate so as to cool the stand 7 in the gas plasma reaction tube 1. The material to be etched 5 is placed on the stand 7 and is cooled. Then, said material 5 is etched by the gas plasma and temperature rise of the material 5 during the gas plasma treatment is controlled. Hereby, minute pattern having a high accuracy is obtained.
COPYRIGHT: (C)1981,JPO&Japio
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP11951979A JPS5644773A (en) | 1979-09-17 | 1979-09-17 | Gas plasma processing apparatus of material to be etched |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP11951979A JPS5644773A (en) | 1979-09-17 | 1979-09-17 | Gas plasma processing apparatus of material to be etched |
Publications (1)
Publication Number | Publication Date |
---|---|
JPS5644773A true JPS5644773A (en) | 1981-04-24 |
Family
ID=14763274
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP11951979A Pending JPS5644773A (en) | 1979-09-17 | 1979-09-17 | Gas plasma processing apparatus of material to be etched |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS5644773A (en) |
-
1979
- 1979-09-17 JP JP11951979A patent/JPS5644773A/en active Pending
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