JPS5643529A - Measuring method of minute refractive index difference between optical waveguide line and its substrate - Google Patents

Measuring method of minute refractive index difference between optical waveguide line and its substrate

Info

Publication number
JPS5643529A
JPS5643529A JP12028879A JP12028879A JPS5643529A JP S5643529 A JPS5643529 A JP S5643529A JP 12028879 A JP12028879 A JP 12028879A JP 12028879 A JP12028879 A JP 12028879A JP S5643529 A JPS5643529 A JP S5643529A
Authority
JP
Japan
Prior art keywords
angle
incidence
derived
coupler
refractive index
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP12028879A
Other languages
English (en)
Japanese (ja)
Other versions
JPS6351260B2 (enrdf_load_stackoverflow
Inventor
Yoichi Isoda
Mitsukazu Kondo
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
NEC Corp
Original Assignee
NEC Corp
Nippon Electric Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by NEC Corp, Nippon Electric Co Ltd filed Critical NEC Corp
Priority to JP12028879A priority Critical patent/JPS5643529A/ja
Publication of JPS5643529A publication Critical patent/JPS5643529A/ja
Publication of JPS6351260B2 publication Critical patent/JPS6351260B2/ja
Granted legal-status Critical Current

Links

Landscapes

  • Testing Of Optical Devices Or Fibers (AREA)
  • Investigating Or Analysing Materials By Optical Means (AREA)
JP12028879A 1979-09-18 1979-09-18 Measuring method of minute refractive index difference between optical waveguide line and its substrate Granted JPS5643529A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP12028879A JPS5643529A (en) 1979-09-18 1979-09-18 Measuring method of minute refractive index difference between optical waveguide line and its substrate

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP12028879A JPS5643529A (en) 1979-09-18 1979-09-18 Measuring method of minute refractive index difference between optical waveguide line and its substrate

Publications (2)

Publication Number Publication Date
JPS5643529A true JPS5643529A (en) 1981-04-22
JPS6351260B2 JPS6351260B2 (enrdf_load_stackoverflow) 1988-10-13

Family

ID=14782523

Family Applications (1)

Application Number Title Priority Date Filing Date
JP12028879A Granted JPS5643529A (en) 1979-09-18 1979-09-18 Measuring method of minute refractive index difference between optical waveguide line and its substrate

Country Status (1)

Country Link
JP (1) JPS5643529A (enrdf_load_stackoverflow)

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS646735A (en) * 1987-06-29 1989-01-11 Hitachi Ltd Method and apparatus for measuring refractive index distribution
JPH0210242A (ja) * 1988-03-03 1990-01-16 American Teleph & Telegr Co <Att> 光学装置アセンブリの製造、操作および保守における試験
CN110082313A (zh) * 2019-04-22 2019-08-02 天津大学 一种基于棱镜耦合仪的微纳材料折射率测量方法

Families Citing this family (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0220149U (enrdf_load_stackoverflow) * 1988-07-26 1990-02-09
US5340986A (en) * 1991-11-18 1994-08-23 Gaztech International Corporation Diffusion-type gas sample chamber
WO2012036075A1 (ja) * 2010-09-16 2012-03-22 シャープ株式会社 屈折率測定装置、及び屈折率測定方法

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS646735A (en) * 1987-06-29 1989-01-11 Hitachi Ltd Method and apparatus for measuring refractive index distribution
JPH0210242A (ja) * 1988-03-03 1990-01-16 American Teleph & Telegr Co <Att> 光学装置アセンブリの製造、操作および保守における試験
CN110082313A (zh) * 2019-04-22 2019-08-02 天津大学 一种基于棱镜耦合仪的微纳材料折射率测量方法
CN110082313B (zh) * 2019-04-22 2021-08-20 天津大学 一种基于棱镜耦合仪的微纳材料折射率测量方法

Also Published As

Publication number Publication date
JPS6351260B2 (enrdf_load_stackoverflow) 1988-10-13

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