JPS5642338A - Electron source of electron beam drawing device - Google Patents

Electron source of electron beam drawing device

Info

Publication number
JPS5642338A
JPS5642338A JP11618479A JP11618479A JPS5642338A JP S5642338 A JPS5642338 A JP S5642338A JP 11618479 A JP11618479 A JP 11618479A JP 11618479 A JP11618479 A JP 11618479A JP S5642338 A JPS5642338 A JP S5642338A
Authority
JP
Japan
Prior art keywords
electron beam
cathod
electron
single crystal
hexaboride
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP11618479A
Other languages
Japanese (ja)
Inventor
Kazumitsu Nakamura
Sadaharu Katsuta
Shinjiro Katagiri
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Hitachi Ltd
Original Assignee
Hitachi Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Hitachi Ltd filed Critical Hitachi Ltd
Priority to JP11618479A priority Critical patent/JPS5642338A/en
Publication of JPS5642338A publication Critical patent/JPS5642338A/en
Pending legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/02—Details
    • H01J37/04—Arrangements of electrodes and associated parts for generating or controlling the discharge, e.g. electron-optical arrangement, ion-optical arrangement
    • H01J37/06—Electron sources; Electron guns
    • H01J37/065—Construction of guns or parts thereof

Landscapes

  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Electron Beam Exposure (AREA)

Abstract

PURPOSE:To enhance the drawing speed by a method wherein the electron beam radiating face at a cathod of boride group single crystal is made as a linear or rectangular shape. CONSTITUTION:The cathod 15 is buried in a graphite heater 10 so that the edge of a square pole single crystal is made as the electron radiating face. The cathod 15 is made by cutting down, polishing or an La hexaboride that is grown in an Al flux, is applied by the reason the edge is very sharp and homogeneous, it is more effective for the uniform electron beam radiation. A rectangular thin plate 16 can be used instead of the square pole. Further, the single crystal such as a hexaboride of Ba, Ce or others, is also effective.
JP11618479A 1979-09-12 1979-09-12 Electron source of electron beam drawing device Pending JPS5642338A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP11618479A JPS5642338A (en) 1979-09-12 1979-09-12 Electron source of electron beam drawing device

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP11618479A JPS5642338A (en) 1979-09-12 1979-09-12 Electron source of electron beam drawing device

Publications (1)

Publication Number Publication Date
JPS5642338A true JPS5642338A (en) 1981-04-20

Family

ID=14680882

Family Applications (1)

Application Number Title Priority Date Filing Date
JP11618479A Pending JPS5642338A (en) 1979-09-12 1979-09-12 Electron source of electron beam drawing device

Country Status (1)

Country Link
JP (1) JPS5642338A (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP0360035A2 (en) * 1988-09-20 1990-03-28 Siemens Aktiengesellschaft Electron beam source

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP0360035A2 (en) * 1988-09-20 1990-03-28 Siemens Aktiengesellschaft Electron beam source

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