JPS5642226A - Projection type exposure device - Google Patents

Projection type exposure device

Info

Publication number
JPS5642226A
JPS5642226A JP11794779A JP11794779A JPS5642226A JP S5642226 A JPS5642226 A JP S5642226A JP 11794779 A JP11794779 A JP 11794779A JP 11794779 A JP11794779 A JP 11794779A JP S5642226 A JPS5642226 A JP S5642226A
Authority
JP
Japan
Prior art keywords
mirror
wafer
light
lens
mask
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP11794779A
Other languages
Japanese (ja)
Inventor
Masayuki Sengoku
Katsu Inoue
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Hitachi Ltd
Original Assignee
Hitachi Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Hitachi Ltd filed Critical Hitachi Ltd
Priority to JP11794779A priority Critical patent/JPS5642226A/en
Publication of JPS5642226A publication Critical patent/JPS5642226A/en
Pending legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F9/00—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically
    • G03F9/70—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically for microlithography

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Exposure Or Original Feeding In Electrophotography (AREA)
  • Projection-Type Copiers In General (AREA)

Abstract

PURPOSE:To perform position detection of low electric power and high sensitivity by a single lighting light source for performing exposure and for detecting position. CONSTITUTION:A rotating body 46 consisting of a reflecting part, a transmitting part and a shielding part is provided on the way of an exposure device in which light from a lighting light source 10 is condensed by a condensing lens 16 via a mirror 48 and lights and exposes the wafer 24 on a wafer moving table 22 via a mask 18 and a reducing lens 20. The exposure of the wafer is performed in the transmitting part and when the light is reflected by the reflecting part, the light reflected by a half mirror 32 via a lens 50 lights the wafer mark 24a through the mirror 34, the opening 18a of the mask 7 and the reducing lens 20. This reflected light is detected with a detector 36 through the reducing lens 20, mask opening 18a, mirror 50 and half mirror 32.
JP11794779A 1979-09-17 1979-09-17 Projection type exposure device Pending JPS5642226A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP11794779A JPS5642226A (en) 1979-09-17 1979-09-17 Projection type exposure device

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP11794779A JPS5642226A (en) 1979-09-17 1979-09-17 Projection type exposure device

Publications (1)

Publication Number Publication Date
JPS5642226A true JPS5642226A (en) 1981-04-20

Family

ID=14724162

Family Applications (1)

Application Number Title Priority Date Filing Date
JP11794779A Pending JPS5642226A (en) 1979-09-17 1979-09-17 Projection type exposure device

Country Status (1)

Country Link
JP (1) JPS5642226A (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5788125U (en) * 1980-11-18 1982-05-31

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5788125U (en) * 1980-11-18 1982-05-31
JPS6339963Y2 (en) * 1980-11-18 1988-10-19

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