JPS5642054B2 - - Google Patents
Info
- Publication number
- JPS5642054B2 JPS5642054B2 JP8383773A JP8383773A JPS5642054B2 JP S5642054 B2 JPS5642054 B2 JP S5642054B2 JP 8383773 A JP8383773 A JP 8383773A JP 8383773 A JP8383773 A JP 8383773A JP S5642054 B2 JPS5642054 B2 JP S5642054B2
- Authority
- JP
- Japan
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01F—MAGNETS; INDUCTANCES; TRANSFORMERS; SELECTION OF MATERIALS FOR THEIR MAGNETIC PROPERTIES
- H01F41/00—Apparatus or processes specially adapted for manufacturing or assembling magnets, inductances or transformers; Apparatus or processes specially adapted for manufacturing materials characterised by their magnetic properties
- H01F41/14—Apparatus or processes specially adapted for manufacturing or assembling magnets, inductances or transformers; Apparatus or processes specially adapted for manufacturing materials characterised by their magnetic properties for applying magnetic films to substrates
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/24—Vacuum evaporation
- C23C14/32—Vacuum evaporation by explosion; by evaporation and subsequent ionisation of the vapours, e.g. ion-plating
Landscapes
- Engineering & Computer Science (AREA)
- Chemical & Material Sciences (AREA)
- Power Engineering (AREA)
- Manufacturing & Machinery (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Materials Engineering (AREA)
- Mechanical Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Manufacturing Of Magnetic Record Carriers (AREA)
- Physical Vapour Deposition (AREA)
- Thin Magnetic Films (AREA)
Priority Applications (3)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP8383773A JPS5642054B2 (ja) | 1973-07-25 | 1973-07-25 | |
DE2435887A DE2435887C2 (de) | 1973-07-25 | 1974-07-25 | Vorrichtung zur kontinuierlichen Herstellung eines Magnetaufzeichnungsbandes |
US491900A US3898952A (en) | 1973-07-25 | 1974-07-25 | Apparatus for production of magnetic recording medium |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP8383773A JPS5642054B2 (ja) | 1973-07-25 | 1973-07-25 |
Publications (2)
Publication Number | Publication Date |
---|---|
JPS5033811A JPS5033811A (ja) | 1975-04-01 |
JPS5642054B2 true JPS5642054B2 (ja) | 1981-10-02 |
Family
ID=13813802
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP8383773A Expired JPS5642054B2 (ja) | 1973-07-25 | 1973-07-25 |
Country Status (3)
Country | Link |
---|---|
US (1) | US3898952A (ja) |
JP (1) | JPS5642054B2 (ja) |
DE (1) | DE2435887C2 (ja) |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS6037845A (ja) * | 1983-08-09 | 1985-02-27 | Kyoritsu Denpa Kk | 選択呼出システム |
Families Citing this family (24)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS5812728B2 (ja) * | 1974-12-10 | 1983-03-10 | 富士写真フイルム株式会社 | ジキキロクバイタイノ セイホウ |
US4091138A (en) * | 1975-02-12 | 1978-05-23 | Sumitomo Bakelite Company Limited | Insulating film, sheet, or plate material with metallic coating and method for manufacturing same |
JPS51149008A (en) * | 1975-05-23 | 1976-12-21 | Fuji Photo Film Co Ltd | Magnetic recording medium manufacturing method |
JPS5383709A (en) * | 1976-12-29 | 1978-07-24 | Matsushita Electric Ind Co Ltd | Preparation of magnetic recording medium |
JPS6010370B2 (ja) * | 1977-06-22 | 1985-03-16 | 松下電器産業株式会社 | 磁気記録媒体の製造方法 |
JPS5412708A (en) * | 1977-06-29 | 1979-01-30 | Matsushita Electric Ind Co Ltd | Production of magnetic recording media |
JPS5836413B2 (ja) * | 1978-04-25 | 1983-08-09 | 松下電器産業株式会社 | 磁気記録媒体の製造方法およびその製造装置 |
JPS6033289B2 (ja) * | 1979-07-18 | 1985-08-02 | 松下電器産業株式会社 | 金属薄膜型磁気記録媒体 |
JPS6037527B2 (ja) * | 1980-03-10 | 1985-08-27 | 積水化学工業株式会社 | 磁気記録媒体の製造方法 |
JPS58122622A (ja) * | 1982-01-18 | 1983-07-21 | Hitachi Ltd | 磁気記録媒体に有機保護膜を形成する方法 |
US4394236A (en) * | 1982-02-16 | 1983-07-19 | Shatterproof Glass Corporation | Magnetron cathode sputtering apparatus |
US4440107A (en) * | 1982-07-12 | 1984-04-03 | Energy Conversion Devices, Inc. | Magnetic apparatus for reducing substrate warpage |
US4544612A (en) * | 1982-09-22 | 1985-10-01 | Nippon Telegraph & Telephone Public Corporation | Iron oxide magnetic film and process for fabrication thereof |
US4575475A (en) * | 1983-07-12 | 1986-03-11 | Tdk Corporation | Magnetic recording medium |
JPH0644543B2 (ja) * | 1984-01-18 | 1994-06-08 | 株式会社日立製作所 | 磁性膜デバイスの製造方法 |
JPH0610856B2 (ja) * | 1984-08-04 | 1994-02-09 | ティーディーケイ株式会社 | 磁気記録媒体 |
JPH0765164B2 (ja) * | 1986-04-18 | 1995-07-12 | 松下電器産業株式会社 | 蒸着装置 |
DE3832693A1 (de) * | 1988-09-27 | 1990-03-29 | Leybold Ag | Vorrichtung zum aufbringen dielektrischer oder metallischer werkstoffe |
US5224441A (en) * | 1991-09-27 | 1993-07-06 | The Boc Group, Inc. | Apparatus for rapid plasma treatments and method |
EP0561243B1 (en) * | 1992-03-13 | 1997-08-13 | Matsushita Electric Industrial Co., Ltd. | Plasma CVD apparatus and method therefor |
DE4312444A1 (de) * | 1993-04-16 | 1994-10-20 | Leybold Ag | Vorrichtung zum Beschichten von Substraten, insbesondere mit magnetisierbaren Werkstoffen |
DE4438675A1 (de) * | 1994-10-29 | 1996-05-02 | Leybold Ag | Vorrichtung zum Aufdampfen von Schichten auf Folienbänder |
DE19543375A1 (de) * | 1995-11-21 | 1997-05-22 | Leybold Ag | Vorrichtung zum Beschichten von Substraten mittels Magnetronzerstäuben |
DE10129507C2 (de) * | 2001-06-19 | 2003-07-17 | Fraunhofer Ges Forschung | Einrichtung zur plasmaaktivierten Bedampfung großer Flächen |
Family Cites Families (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US3329601A (en) * | 1964-09-15 | 1967-07-04 | Donald M Mattox | Apparatus for coating a cathodically biased substrate from plasma of ionized coatingmaterial |
US3477902A (en) * | 1965-10-14 | 1969-11-11 | Radiation Res Corp | Process for making tires by exposure to an ionized gas and treatment with resorcinol-formaldehyde/latex composition and the product |
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1973
- 1973-07-25 JP JP8383773A patent/JPS5642054B2/ja not_active Expired
-
1974
- 1974-07-25 US US491900A patent/US3898952A/en not_active Expired - Lifetime
- 1974-07-25 DE DE2435887A patent/DE2435887C2/de not_active Expired
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS6037845A (ja) * | 1983-08-09 | 1985-02-27 | Kyoritsu Denpa Kk | 選択呼出システム |
Also Published As
Publication number | Publication date |
---|---|
JPS5033811A (ja) | 1975-04-01 |
DE2435887A1 (de) | 1975-02-06 |
DE2435887C2 (de) | 1986-09-04 |
US3898952A (en) | 1975-08-12 |