JPS5640492B2 - - Google Patents

Info

Publication number
JPS5640492B2
JPS5640492B2 JP12388575A JP12388575A JPS5640492B2 JP S5640492 B2 JPS5640492 B2 JP S5640492B2 JP 12388575 A JP12388575 A JP 12388575A JP 12388575 A JP12388575 A JP 12388575A JP S5640492 B2 JPS5640492 B2 JP S5640492B2
Authority
JP
Japan
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
JP12388575A
Other languages
Japanese (ja)
Other versions
JPS5169369A (cg-RX-API-DMAC10.html
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Priority claimed from FR7435152A external-priority patent/FR2288138A1/fr
Priority claimed from FR7435151A external-priority patent/FR2288392A1/fr
Application filed filed Critical
Publication of JPS5169369A publication Critical patent/JPS5169369A/ja
Publication of JPS5640492B2 publication Critical patent/JPS5640492B2/ja
Expired legal-status Critical Current

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C04—CEMENTS; CONCRETE; ARTIFICIAL STONE; CERAMICS; REFRACTORIES
    • C04B—LIME, MAGNESIA; SLAG; CEMENTS; COMPOSITIONS THEREOF, e.g. MORTARS, CONCRETE OR LIKE BUILDING MATERIALS; ARTIFICIAL STONE; CERAMICS; REFRACTORIES; TREATMENT OF NATURAL STONE
    • C04B41/00—After-treatment of mortars, concrete, artificial stone or ceramics; Treatment of natural stone
    • C04B41/80—After-treatment of mortars, concrete, artificial stone or ceramics; Treatment of natural stone of only ceramics
    • C04B41/91—After-treatment of mortars, concrete, artificial stone or ceramics; Treatment of natural stone of only ceramics involving the removal of part of the materials of the treated articles, e.g. etching
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10P—GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
    • H10P50/00—Etching of wafers, substrates or parts of devices
    • H10P50/60—Wet etching
    • H10P50/64—Wet etching of semiconductor materials
    • H10P50/642—Chemical etching
    • C—CHEMISTRY; METALLURGY
    • C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09K—MATERIALS FOR MISCELLANEOUS APPLICATIONS, NOT PROVIDED FOR ELSEWHERE
    • C09K13/00—Etching, surface-brightening or pickling compositions
    • C09K13/04—Etching, surface-brightening or pickling compositions containing an inorganic acid
    • C09K13/08—Etching, surface-brightening or pickling compositions containing an inorganic acid containing a fluorine compound
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10P—GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
    • H10P14/00—Formation of materials, e.g. in the shape of layers or pillars
    • H10P14/60—Formation of materials, e.g. in the shape of layers or pillars of insulating materials
    • H10P14/63—Formation of materials, e.g. in the shape of layers or pillars of insulating materials characterised by the formation processes
    • H10P14/6302—Non-deposition formation processes
    • H10P14/6304—Formation by oxidation, e.g. oxidation of the substrate
    • H10P14/6314—Formation by oxidation, e.g. oxidation of the substrate of a metallic layer
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10W—GENERIC PACKAGES, INTERCONNECTIONS, CONNECTORS OR OTHER CONSTRUCTIONAL DETAILS OF DEVICES COVERED BY CLASS H10
    • H10W20/00—Interconnections in chips, wafers or substrates
    • H10W20/01—Manufacture or treatment

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Organic Chemistry (AREA)
  • Ceramic Engineering (AREA)
  • Inorganic Chemistry (AREA)
  • Structural Engineering (AREA)
  • Weting (AREA)
  • ing And Chemical Polishing (AREA)
  • Internal Circuitry In Semiconductor Integrated Circuit Devices (AREA)
JP12388575A 1974-10-18 1975-10-16 Expired JPS5640492B2 (cg-RX-API-DMAC10.html)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
FR7435152A FR2288138A1 (fr) 1974-10-18 1974-10-18 Procede d'attaque de l'alumine
FR7435151A FR2288392A1 (fr) 1974-10-18 1974-10-18 Procede de realisation de dispositifs semiconducteurs

Publications (2)

Publication Number Publication Date
JPS5169369A JPS5169369A (cg-RX-API-DMAC10.html) 1976-06-15
JPS5640492B2 true JPS5640492B2 (cg-RX-API-DMAC10.html) 1981-09-21

Family

ID=26218562

Family Applications (1)

Application Number Title Priority Date Filing Date
JP12388575A Expired JPS5640492B2 (cg-RX-API-DMAC10.html) 1974-10-18 1975-10-16

Country Status (4)

Country Link
JP (1) JPS5640492B2 (cg-RX-API-DMAC10.html)
BR (1) BR7506737A (cg-RX-API-DMAC10.html)
DE (1) DE2546316C2 (cg-RX-API-DMAC10.html)
GB (1) GB1526425A (cg-RX-API-DMAC10.html)

Families Citing this family (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE3048083C2 (de) * 1980-12-19 1983-09-29 Ludwig 8900 Augsburg Fahrmbacher-Lutz Verfahren zur chemischen Entfernung von Oxidschichten von Gegenständen aus Titan oder Titanlegierungen
JPS59184532A (ja) * 1983-04-05 1984-10-19 Oki Electric Ind Co Ltd 半導体装置の製造方法
AU2607599A (en) * 1998-03-10 1999-09-27 Scacco Electronics Consulting Selective etching of silicon nitride by means of a wet chemical process
KR102562023B1 (ko) 2018-01-30 2023-08-01 도쿄엘렉트론가부시키가이샤 기판 처리 방법, 기판 처리 장치 및 에칭액

Family Cites Families (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US2828193A (en) * 1954-08-09 1958-03-25 Turco Products Inc Method for rejuvenation of aluminum treating solutions
JPS5141161B2 (cg-RX-API-DMAC10.html) * 1972-08-25 1976-11-08

Also Published As

Publication number Publication date
GB1526425A (en) 1978-09-27
DE2546316C2 (de) 1982-11-11
BR7506737A (pt) 1976-08-17
DE2546316A1 (de) 1976-04-22
JPS5169369A (cg-RX-API-DMAC10.html) 1976-06-15

Similar Documents

Publication Publication Date Title
DK140333C (cg-RX-API-DMAC10.html)
DK408475A (cg-RX-API-DMAC10.html)
DK106375A (cg-RX-API-DMAC10.html)
FI345874A7 (cg-RX-API-DMAC10.html)
DE2437775A1 (cg-RX-API-DMAC10.html)
JPS5169369A (cg-RX-API-DMAC10.html)
DK130675A (cg-RX-API-DMAC10.html)
FI191274A7 (cg-RX-API-DMAC10.html)
DK137836C (cg-RX-API-DMAC10.html)
DK140316C (cg-RX-API-DMAC10.html)
DK133533C (cg-RX-API-DMAC10.html)
CS172092B1 (cg-RX-API-DMAC10.html)
CS172049B1 (cg-RX-API-DMAC10.html)
CS171562B1 (cg-RX-API-DMAC10.html)
DE2429122A1 (cg-RX-API-DMAC10.html)
CS168719B1 (cg-RX-API-DMAC10.html)
CS175803B1 (cg-RX-API-DMAC10.html)
CS174438B1 (cg-RX-API-DMAC10.html)
CH610489A5 (cg-RX-API-DMAC10.html)
CH577762A5 (cg-RX-API-DMAC10.html)
DD113369A1 (cg-RX-API-DMAC10.html)
CH585435A5 (cg-RX-API-DMAC10.html)
CH583543A5 (cg-RX-API-DMAC10.html)
DD111130A1 (cg-RX-API-DMAC10.html)
DD116577A5 (cg-RX-API-DMAC10.html)