JPS5634105B2 - - Google Patents

Info

Publication number
JPS5634105B2
JPS5634105B2 JP7940576A JP7940576A JPS5634105B2 JP S5634105 B2 JPS5634105 B2 JP S5634105B2 JP 7940576 A JP7940576 A JP 7940576A JP 7940576 A JP7940576 A JP 7940576A JP S5634105 B2 JPS5634105 B2 JP S5634105B2
Authority
JP
Japan
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
JP7940576A
Other languages
Japanese (ja)
Other versions
JPS529380A (en
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed filed Critical
Publication of JPS529380A publication Critical patent/JPS529380A/ja
Publication of JPS5634105B2 publication Critical patent/JPS5634105B2/ja
Granted legal-status Critical Current

Links

Classifications

    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10DINORGANIC ELECTRIC SEMICONDUCTOR DEVICES
    • H10D62/00Semiconductor bodies, or regions thereof, of devices having potential barriers
    • H10D62/10Shapes, relative sizes or dispositions of the regions of the semiconductor bodies; Shapes of the semiconductor bodies
    • H10D62/102Constructional design considerations for preventing surface leakage or controlling electric field concentration
    • H10D62/103Constructional design considerations for preventing surface leakage or controlling electric field concentration for increasing or controlling the breakdown voltage of reverse-biased devices
    • H10D62/105Constructional design considerations for preventing surface leakage or controlling electric field concentration for increasing or controlling the breakdown voltage of reverse-biased devices by having particular doping profiles, shapes or arrangements of PN junctions; by having supplementary regions, e.g. junction termination extension [JTE] 
    • H10D62/108Constructional design considerations for preventing surface leakage or controlling electric field concentration for increasing or controlling the breakdown voltage of reverse-biased devices by having particular doping profiles, shapes or arrangements of PN junctions; by having supplementary regions, e.g. junction termination extension [JTE]  having localised breakdown regions, e.g. built-in avalanching regions 
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10DINORGANIC ELECTRIC SEMICONDUCTOR DEVICES
    • H10D10/00Bipolar junction transistors [BJT]
    • H10D10/40Vertical BJTs
    • H10D10/441Vertical BJTs having an emitter-base junction ending at a main surface of the body and a base-collector junction ending at a lateral surface of the body
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10DINORGANIC ELECTRIC SEMICONDUCTOR DEVICES
    • H10D62/00Semiconductor bodies, or regions thereof, of devices having potential barriers
    • H10D62/10Shapes, relative sizes or dispositions of the regions of the semiconductor bodies; Shapes of the semiconductor bodies
    • H10D62/17Semiconductor regions connected to electrodes not carrying current to be rectified, amplified or switched, e.g. channel regions
    • H10D62/177Base regions of bipolar transistors, e.g. BJTs or IGBTs
    • YGENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10STECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S257/00Active solid-state devices, e.g. transistors, solid-state diodes
    • Y10S257/913Active solid-state devices, e.g. transistors, solid-state diodes with means to absorb or localize unwanted impurities or defects from semiconductors, e.g. heavy metal gettering

Landscapes

  • Bipolar Transistors (AREA)
JP51079405A 1975-07-03 1976-07-02 Semiconductor device Granted JPS529380A (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US59301775A 1975-07-03 1975-07-03

Publications (2)

Publication Number Publication Date
JPS529380A JPS529380A (en) 1977-01-24
JPS5634105B2 true JPS5634105B2 (en, 2012) 1981-08-07

Family

ID=24373010

Family Applications (1)

Application Number Title Priority Date Filing Date
JP51079405A Granted JPS529380A (en) 1975-07-03 1976-07-02 Semiconductor device

Country Status (5)

Country Link
US (1) US4071852A (en, 2012)
JP (1) JPS529380A (en, 2012)
DE (1) DE2628273A1 (en, 2012)
GB (1) GB1507115A (en, 2012)
IT (1) IT1061511B (en, 2012)

Families Citing this family (13)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4167748A (en) * 1978-07-03 1979-09-11 Bell Telephone Laboratories, Incorporated High voltage monolithic transistor circuit
JPS56152261A (en) * 1980-04-28 1981-11-25 Toshiba Corp I2l element withstanding high surge
US4398206A (en) * 1981-02-11 1983-08-09 Rca Corporation Transistor with integrated diode and resistor
US4797720A (en) * 1981-07-29 1989-01-10 American Telephone And Telegraph Company, At&T Bell Laboratories Controlled breakover bidirectional semiconductor switch
JPS61158177A (ja) * 1984-12-28 1986-07-17 Toshiba Corp 半導体装置
EP0310836A3 (de) * 1987-10-08 1989-06-14 Siemens Aktiengesellschaft Halbleiterbauelement mit einem planaren pn-Übergang
JPH0766975B2 (ja) * 1988-12-09 1995-07-19 サンケン電気株式会社 複合型ダイオード装置
US4999683A (en) * 1988-12-30 1991-03-12 Sanken Electric Co., Ltd. Avalanche breakdown semiconductor device
US5027165A (en) * 1990-05-22 1991-06-25 Maxim Integrated Products Buried zener diode
US5479031A (en) * 1993-09-10 1995-12-26 Teccor Electronics, Inc. Four layer overvoltage protection device having buried regions aligned with shorting dots to increase the accuracy of overshoot voltage value
KR100263912B1 (ko) * 1998-05-20 2000-09-01 김덕중 반도체 소자의 다이오드 및 그 제조방법
JP2001352079A (ja) * 2000-06-07 2001-12-21 Nec Corp ダイオードおよびその製造方法
JP5228123B1 (ja) * 2011-11-28 2013-07-03 株式会社東芝 半導体装置及びその製造方法

Family Cites Families (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
FR1453086A (fr) * 1964-11-06 1966-04-15 Telefunken Patent Dispositif semiconducteur et procédé de fabrication d'un tel dispositif
US3338758A (en) * 1964-12-31 1967-08-29 Fairchild Camera Instr Co Surface gradient protected high breakdown junctions
US3551760A (en) * 1966-03-28 1970-12-29 Hitachi Ltd Semiconductor device with an inversion preventing layer formed in a diffused region
US3714526A (en) * 1971-02-19 1973-01-30 Nasa Phototransistor

Also Published As

Publication number Publication date
US4071852A (en) 1978-01-31
DE2628273A1 (de) 1977-01-27
JPS529380A (en) 1977-01-24
IT1061511B (it) 1983-04-30
GB1507115A (en) 1978-04-12

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