JPS5627139A - Electronnbeam resist composition - Google Patents

Electronnbeam resist composition

Info

Publication number
JPS5627139A
JPS5627139A JP7677080A JP7677080A JPS5627139A JP S5627139 A JPS5627139 A JP S5627139A JP 7677080 A JP7677080 A JP 7677080A JP 7677080 A JP7677080 A JP 7677080A JP S5627139 A JPS5627139 A JP S5627139A
Authority
JP
Japan
Prior art keywords
electronnbeam
resist composition
resist
composition
electronnbeam resist
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP7677080A
Other languages
English (en)
Japanese (ja)
Other versions
JPS6245969B2 (enExample
Inventor
Maachin Inguraa Edowaado
Demosusenesu Kuputoshisu Jiyon
Jieraado Shiyatsudo Robaato
Tomukiyuuikuzu Yafua
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
International Business Machines Corp
Original Assignee
International Business Machines Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by International Business Machines Corp filed Critical International Business Machines Corp
Publication of JPS5627139A publication Critical patent/JPS5627139A/ja
Publication of JPS6245969B2 publication Critical patent/JPS6245969B2/ja
Granted legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/0045—Photosensitive materials with organic non-macromolecular light-sensitive compounds not otherwise provided for, e.g. dissolution inhibitors
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/038—Macromolecular compounds which are rendered insoluble or differentially wettable
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/039—Macromolecular compounds which are photodegradable, e.g. positive electron resists

Landscapes

  • Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • General Physics & Mathematics (AREA)
  • Electron Beam Exposure (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Photoreceptors In Electrophotography (AREA)
JP7677080A 1979-08-09 1980-06-09 Electronnbeam resist composition Granted JPS5627139A (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US6529179A 1979-08-09 1979-08-09

Publications (2)

Publication Number Publication Date
JPS5627139A true JPS5627139A (en) 1981-03-16
JPS6245969B2 JPS6245969B2 (enExample) 1987-09-30

Family

ID=22061674

Family Applications (1)

Application Number Title Priority Date Filing Date
JP7677080A Granted JPS5627139A (en) 1979-08-09 1980-06-09 Electronnbeam resist composition

Country Status (5)

Country Link
EP (1) EP0023988B1 (enExample)
JP (1) JPS5627139A (enExample)
CA (1) CA1165761A (enExample)
DE (1) DE3066749D1 (enExample)
IT (1) IT1149813B (enExample)

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6435545A (en) * 1987-07-31 1989-02-06 Japan Synthetic Rubber Co Ltd Resist composition used for processing with charged particle beam
JPH01210944A (ja) * 1988-02-18 1989-08-24 Japan Synthetic Rubber Co Ltd 感放射線性樹脂組成物
JP2010195699A (ja) * 2009-02-24 2010-09-09 Tokyo Institute Of Technology 有機半導体および有機薄膜トランジスタ

Families Citing this family (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4522754A (en) * 1982-11-12 1985-06-11 Ciba Geigy Corporation Metallically conducting (2-fluoro-5,6,11,12-tetraselenotetracene)2 -bromide
US4601853A (en) * 1984-02-13 1986-07-22 Ciba-Geigy Corporation (2-fluoro-5,6,11,12-tetraselenotetracene)2 chloride
CH664963A5 (de) * 1985-10-18 1988-04-15 Ciba Geigy Ag Difluorierte (5,6,11,12-tetraselenotetracen)2-halogenide, verfahren zu deren herstellung und deren verwendung.
DE58909497D1 (de) * 1988-09-30 1995-12-21 Ciba Geigy Ag Antistatische und elektrisch leitende Reliefbilder, Verfahren zu deren Herstellung, Beschichtungsmittel und strahlungsempfindliche Polymere.
CN113004291B (zh) * 2019-12-20 2022-03-01 中国科学院化学研究所 基于金属卟啉的分子玻璃化学放大光刻胶及其制备方法和应用

Family Cites Families (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3925076A (en) * 1971-02-16 1975-12-09 Monsanto Co Light sensitive compositions and products
US4312991A (en) * 1979-05-10 1982-01-26 International Business Machines Corporation Dithiobenzoate 4,5-dicyano-1,3-(dithiolidene-2-yl)methylene

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6435545A (en) * 1987-07-31 1989-02-06 Japan Synthetic Rubber Co Ltd Resist composition used for processing with charged particle beam
JPH01210944A (ja) * 1988-02-18 1989-08-24 Japan Synthetic Rubber Co Ltd 感放射線性樹脂組成物
JP2010195699A (ja) * 2009-02-24 2010-09-09 Tokyo Institute Of Technology 有機半導体および有機薄膜トランジスタ

Also Published As

Publication number Publication date
DE3066749D1 (en) 1984-04-05
IT8023528A0 (it) 1980-07-18
CA1165761A (en) 1984-04-17
EP0023988B1 (de) 1984-02-29
IT1149813B (it) 1986-12-10
EP0023988A3 (en) 1982-01-20
EP0023988A2 (de) 1981-02-18
JPS6245969B2 (enExample) 1987-09-30

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