JPS5622367B2 - - Google Patents

Info

Publication number
JPS5622367B2
JPS5622367B2 JP4364676A JP4364676A JPS5622367B2 JP S5622367 B2 JPS5622367 B2 JP S5622367B2 JP 4364676 A JP4364676 A JP 4364676A JP 4364676 A JP4364676 A JP 4364676A JP S5622367 B2 JPS5622367 B2 JP S5622367B2
Authority
JP
Japan
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
JP4364676A
Other languages
Japanese (ja)
Other versions
JPS52127168A (en
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed filed Critical
Priority to JP4364676A priority Critical patent/JPS52127168A/ja
Publication of JPS52127168A publication Critical patent/JPS52127168A/ja
Publication of JPS5622367B2 publication Critical patent/JPS5622367B2/ja
Granted legal-status Critical Current

Links

Landscapes

  • Drying Of Semiconductors (AREA)
JP4364676A 1976-04-19 1976-04-19 Etching unit Granted JPS52127168A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP4364676A JPS52127168A (en) 1976-04-19 1976-04-19 Etching unit

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP4364676A JPS52127168A (en) 1976-04-19 1976-04-19 Etching unit

Publications (2)

Publication Number Publication Date
JPS52127168A JPS52127168A (en) 1977-10-25
JPS5622367B2 true JPS5622367B2 (enrdf_load_stackoverflow) 1981-05-25

Family

ID=12669618

Family Applications (1)

Application Number Title Priority Date Filing Date
JP4364676A Granted JPS52127168A (en) 1976-04-19 1976-04-19 Etching unit

Country Status (1)

Country Link
JP (1) JPS52127168A (enrdf_load_stackoverflow)

Families Citing this family (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6032972B2 (ja) * 1977-12-09 1985-07-31 株式会社日立製作所 エツチング装置
JPS5643727A (en) * 1979-09-17 1981-04-22 Mitsubishi Electric Corp Pattern formation on film to be etched
US4464223A (en) * 1983-10-03 1984-08-07 Tegal Corp. Plasma reactor apparatus and method
JPS60153129A (ja) * 1984-01-20 1985-08-12 Seiko Instr & Electronics Ltd 半導体装置の製造方法
JP2799414B2 (ja) * 1988-05-13 1998-09-17 株式会社半導体エネルギー研究所 プラズマｃｖｄ装置および成膜方法
JP2639569B2 (ja) * 1988-09-16 1997-08-13 株式会社半導体エネルギー研究所 プラズマ反応方法およびプラズマ反応装置
US6127277A (en) * 1996-07-03 2000-10-03 Tegal Corporation Method and apparatus for etching a semiconductor wafer with features having vertical sidewalls
US6500314B1 (en) 1996-07-03 2002-12-31 Tegal Corporation Plasma etch reactor and method
CN1148789C (zh) 1996-07-03 2004-05-05 泰格尔公司 腐蚀半导体晶片的方法和装置
US6048435A (en) * 1996-07-03 2000-04-11 Tegal Corporation Plasma etch reactor and method for emerging films

Also Published As

Publication number Publication date
JPS52127168A (en) 1977-10-25

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