JPS5617946A - Method and apparatus for generating gaseous mixture containing organometallic compound for tempering glass - Google Patents

Method and apparatus for generating gaseous mixture containing organometallic compound for tempering glass

Info

Publication number
JPS5617946A
JPS5617946A JP9459079A JP9459079A JPS5617946A JP S5617946 A JPS5617946 A JP S5617946A JP 9459079 A JP9459079 A JP 9459079A JP 9459079 A JP9459079 A JP 9459079A JP S5617946 A JPS5617946 A JP S5617946A
Authority
JP
Japan
Prior art keywords
organometallic compound
soln
spheres
heated air
gaseous mixture
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP9459079A
Other languages
Japanese (ja)
Other versions
JPS62860B2 (en
Inventor
Hitoshi Asakura
Toshiaki Hishida
Yasuichi Yamada
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Ishizuka Glass Co Ltd
Original Assignee
Ishizuka Glass Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Ishizuka Glass Co Ltd filed Critical Ishizuka Glass Co Ltd
Priority to JP9459079A priority Critical patent/JPS5617946A/en
Publication of JPS5617946A publication Critical patent/JPS5617946A/en
Publication of JPS62860B2 publication Critical patent/JPS62860B2/ja
Granted legal-status Critical Current

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C17/00—Surface treatment of glass, not in the form of fibres or filaments, by coating
    • C03C17/22—Surface treatment of glass, not in the form of fibres or filaments, by coating with other inorganic material
    • C03C17/23—Oxides
    • C03C17/245—Oxides by deposition from the vapour phase
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • C23C16/448—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for generating reactive gas streams, e.g. by evaporation or sublimation of precursor materials
    • C23C16/4481—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for generating reactive gas streams, e.g. by evaporation or sublimation of precursor materials by evaporation using carrier gas in contact with the source material
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C2217/00—Coatings on glass
    • C03C2217/20—Materials for coating a single layer on glass
    • C03C2217/21—Oxides
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C2218/00—Methods for coating glass
    • C03C2218/10—Deposition methods
    • C03C2218/15—Deposition methods from the vapour phase
    • C03C2218/152—Deposition methods from the vapour phase by cvd

Landscapes

  • Chemical & Material Sciences (AREA)
  • General Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Organic Chemistry (AREA)
  • Metallurgy (AREA)
  • Mechanical Engineering (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Geochemistry & Mineralogy (AREA)
  • Chemical Vapour Deposition (AREA)
  • Vaporization, Distillation, Condensation, Sublimation, And Cold Traps (AREA)
  • Surface Treatment Of Glass (AREA)

Abstract

PURPOSE:To continuously generate the titled mixed gas of a predetermined concn. by feeding an aqueous organometallic compound soln. to a heated air passage to evaporate it. CONSTITUTION:Many alumina spheres 37 are placed on porous partition plate 36 set at the bottom of cylinder 31 of body 30, and agitator for the spheres 37 (which is attaching shaft 41 provided with agitating vanes 38 at the lower end to swinging type actuator 27) is installed to construct mixed gas generating apparatus 22. An aqueous organometallic compound soln. of a predetermined concn. prepared in agitation tank 13 and shifted into storage tank 17 is fed to apparatus 22 from inflow hole 24 at a constant flow rate. On the other hand, air introduced from supply inlet 7 and heated to about 200-250 deg.C with heater 11 is fed from inflow hole 23. In apparatus 22 the soln. dropped onto spheres 37 being agitated and stuck to them is allowed to contact to the heated air and efficiently evaporated, and the resulting gas is passed through partition plate 36 together with the heated air and taken out of outflow hole 25 as a gaseous mixture contg. an organometallic compd. of a predetermined concn.
JP9459079A 1979-07-24 1979-07-24 Method and apparatus for generating gaseous mixture containing organometallic compound for tempering glass Granted JPS5617946A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP9459079A JPS5617946A (en) 1979-07-24 1979-07-24 Method and apparatus for generating gaseous mixture containing organometallic compound for tempering glass

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP9459079A JPS5617946A (en) 1979-07-24 1979-07-24 Method and apparatus for generating gaseous mixture containing organometallic compound for tempering glass

Publications (2)

Publication Number Publication Date
JPS5617946A true JPS5617946A (en) 1981-02-20
JPS62860B2 JPS62860B2 (en) 1987-01-09

Family

ID=14114483

Family Applications (1)

Application Number Title Priority Date Filing Date
JP9459079A Granted JPS5617946A (en) 1979-07-24 1979-07-24 Method and apparatus for generating gaseous mixture containing organometallic compound for tempering glass

Country Status (1)

Country Link
JP (1) JPS5617946A (en)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR20010066533A (en) * 1999-12-31 2001-07-11 정종순 Vaporization method and equipment for preparation of stable vapor mixture for coating
JP2005340111A (en) * 2004-05-31 2005-12-08 Ebara Ballard Corp Liquid fuel vaporizer, liquid fuel processing apparatus and fuel cell power generation system

Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS498012A (en) * 1972-05-12 1974-01-24
JPS5141643A (en) * 1974-10-05 1976-04-08 Daito Kiko Kk METSUKYOKAITENKAGO
JPS5357176A (en) * 1976-11-04 1978-05-24 Hitachi Ltd Solidifying method for salts in wase liquid

Patent Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS498012A (en) * 1972-05-12 1974-01-24
JPS5141643A (en) * 1974-10-05 1976-04-08 Daito Kiko Kk METSUKYOKAITENKAGO
JPS5357176A (en) * 1976-11-04 1978-05-24 Hitachi Ltd Solidifying method for salts in wase liquid

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR20010066533A (en) * 1999-12-31 2001-07-11 정종순 Vaporization method and equipment for preparation of stable vapor mixture for coating
JP2005340111A (en) * 2004-05-31 2005-12-08 Ebara Ballard Corp Liquid fuel vaporizer, liquid fuel processing apparatus and fuel cell power generation system
JP4638693B2 (en) * 2004-05-31 2011-02-23 Ｊｘ日鉱日石エネルギー株式会社 Liquid fuel vaporizer, liquid fuel processor, and fuel cell power generation system

Also Published As

Publication number Publication date
JPS62860B2 (en) 1987-01-09

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