JPS56165146A - Multilayer material adapted for producing printing block and relief block - Google Patents

Multilayer material adapted for producing printing block and relief block

Info

Publication number
JPS56165146A
JPS56165146A JP5962681A JP5962681A JPS56165146A JP S56165146 A JPS56165146 A JP S56165146A JP 5962681 A JP5962681 A JP 5962681A JP 5962681 A JP5962681 A JP 5962681A JP S56165146 A JPS56165146 A JP S56165146A
Authority
JP
Japan
Prior art keywords
block
multilayer material
material adapted
producing printing
relief
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP5962681A
Other languages
English (en)
Japanese (ja)
Other versions
JPH0132971B2 (enExample
Inventor
Harutoman Hainrihi
Hofuman Geruharuto
Rentsu Buerunaa
Rinchi Jiyoon
Naaruman Herubaato
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
BASF SE
Original Assignee
BASF SE
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by BASF SE filed Critical BASF SE
Publication of JPS56165146A publication Critical patent/JPS56165146A/ja
Publication of JPH0132971B2 publication Critical patent/JPH0132971B2/ja
Granted legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/09—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers
    • G03F7/11—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers having cover layers or intermediate layers, e.g. subbing layers

Landscapes

  • Engineering & Computer Science (AREA)
  • Architecture (AREA)
  • Structural Engineering (AREA)
  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
  • Materials For Photolithography (AREA)
  • Laminated Bodies (AREA)
JP5962681A 1980-04-22 1981-04-20 Multilayer material adapted for producing printing block and relief block Granted JPS56165146A (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
DE19803015419 DE3015419A1 (de) 1980-04-22 1980-04-22 Zur herstellung von druck- und reliefformen geeignete mehrschichtelemente

Publications (2)

Publication Number Publication Date
JPS56165146A true JPS56165146A (en) 1981-12-18
JPH0132971B2 JPH0132971B2 (enExample) 1989-07-11

Family

ID=6100641

Family Applications (1)

Application Number Title Priority Date Filing Date
JP5962681A Granted JPS56165146A (en) 1980-04-22 1981-04-20 Multilayer material adapted for producing printing block and relief block

Country Status (4)

Country Link
US (1) US4355093A (enExample)
EP (1) EP0038477B1 (enExample)
JP (1) JPS56165146A (enExample)
DE (2) DE3015419A1 (enExample)

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS63146036A (ja) * 1986-10-01 1988-06-18 ナップ・システムズ（ユー・エス・エイ）インコーポレイテッド 光重合性組成物
JPWO2014133041A1 (ja) * 2013-02-26 2017-02-02 富士フイルム株式会社 セルロースアシレートフィルム、新規化合物、偏光板および液晶表示装置
US10113040B2 (en) 2014-09-03 2018-10-30 Fujifilm Corporation Polymer film, polarizing plate and liquid crystal display device

Families Citing this family (17)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE3045515A1 (de) * 1980-12-03 1982-07-08 Basf Ag, 6700 Ludwigshafen Lichtempfindliches mehrschichtenmaterial und verfahren zur herstellung von haftschichten dafuer
DE3144905A1 (de) * 1981-11-12 1983-05-19 Basf Ag, 6700 Ludwigshafen Zur herstellung von druck- und reliefformen geeignetes lichtempfindliches auszeichnungsmaterial und verfahren zur herstellung von druck- und reliefformen mittels dieses aufzeichnungsmaterials
US4756988A (en) * 1982-09-29 1988-07-12 Minnesota Mining And Manufacturing Company Multilayer dry-film negative-acting photoresist
US4770986A (en) * 1984-12-24 1988-09-13 Mitsubishi Paper Mills, Ltd. Photographic silver halide element containing a carboxylated polyethylene layer
EP0239130B1 (en) * 1986-03-28 1992-07-15 Hitachi, Ltd. Optical disc
DE3808952A1 (de) * 1988-03-17 1989-10-05 Basf Ag Lichtempfindliche, photopolymerisierbare druckplatte
EP0522616B1 (en) * 1991-07-12 1995-10-04 Agfa-Gevaert N.V. Method for producing images using a photopolymerizable composition
DE69220433T2 (de) * 1991-08-19 1997-10-16 Fuji Photo Film Co Ltd Vorsensibilisierte Platte zur Herstellung einer lithographischen Druckplatte
US5348843A (en) * 1992-06-12 1994-09-20 Permar Systems, Inc. Method for making porcelain tags and signs by selectively radiating a frit containing-emulsion coating applied thereto
US5683837A (en) * 1994-11-18 1997-11-04 Napp Systems, Inc. Water-soluble compositions for preparation of durable, high-resolution printing plates
WO1996018133A1 (en) * 1994-12-06 1996-06-13 Napp Systems, Inc. High-resolution letterpress printing plates and water-soluble photopolymerizable compositions comprising a polyvinylalcohol derivative useful therefor
US5955242A (en) * 1996-09-23 1999-09-21 International Business Machines Corporation High sensitivity, photo-active polymer and developers for high resolution resist applications
DE10040929A1 (de) * 2000-08-18 2002-02-28 Basf Drucksysteme Gmbh Verfahren zur Herstellung organisch entwickelbarer, fotopolymerisierbarer Flexodruckelemente auf flexiblen metallischen Trägern
CN110520797A (zh) 2017-01-31 2019-11-29 富林特集团德国有限公司 含有低度官能化的部分皂化聚乙酸乙烯酯的可辐照固化的混合物
TWI806932B (zh) 2017-11-29 2023-07-01 德商可樂麗歐洲有限公司 用於製造官能化聚乙酸乙烯酯之方法
NL2027002B1 (en) 2020-11-27 2022-07-04 Flint Group Germany Gmbh Photosensitive composition
NL2027003B1 (en) 2020-11-27 2022-07-04 Flint Group Germany Gmbh Photosensitive composition

Family Cites Families (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
GB786199A (en) 1954-09-06 1957-11-13 Gen Electric Co Ltd Improvements in or relating to information storage devices and materials handling apparatus including same
NL220139A (enExample) 1956-08-27
GB835849A (en) 1957-04-26 1960-05-25 Du Pont Photopolymerisable compositions and uses thereof
DE1597515A1 (de) * 1967-10-28 1970-06-11 Basf Ag Verfahren zum Aufbringen lichtempfindlicher Platten,Filme oder Folien auf metallischen Unterlagen
GB1233883A (enExample) 1968-01-22 1971-06-03
JPS503041B1 (enExample) 1970-03-27 1975-01-31
GB1416440A (en) 1971-08-13 1975-12-03 Nippon Paint Co Ltd Photopolymerizable materials
US3877939A (en) * 1973-06-25 1975-04-15 Nippon Paint Co Ltd Photopolymer printing plates and coated relief printing plates
DE2822190A1 (de) * 1978-05-20 1979-11-22 Hoechst Ag Photopolymerisierbares gemisch

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS63146036A (ja) * 1986-10-01 1988-06-18 ナップ・システムズ（ユー・エス・エイ）インコーポレイテッド 光重合性組成物
JPWO2014133041A1 (ja) * 2013-02-26 2017-02-02 富士フイルム株式会社 セルロースアシレートフィルム、新規化合物、偏光板および液晶表示装置
US10040754B2 (en) 2013-02-26 2018-08-07 Fujifilm Corporation Cellulose acylate film, novel compound, polarizing plate and liquid crystal display device
US10113040B2 (en) 2014-09-03 2018-10-30 Fujifilm Corporation Polymer film, polarizing plate and liquid crystal display device

Also Published As

Publication number Publication date
JPH0132971B2 (enExample) 1989-07-11
DE3164530D1 (en) 1984-08-09
EP0038477B1 (de) 1984-07-04
EP0038477A1 (de) 1981-10-28
DE3015419A1 (de) 1981-10-29
US4355093A (en) 1982-10-19

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