JPS56168656A - Multilayer material adapted for producing printing block and relief block - Google Patents

Multilayer material adapted for producing printing block and relief block

Info

Publication number
JPS56168656A
JPS56168656A JP5962581A JP5962581A JPS56168656A JP S56168656 A JPS56168656 A JP S56168656A JP 5962581 A JP5962581 A JP 5962581A JP 5962581 A JP5962581 A JP 5962581A JP S56168656 A JPS56168656 A JP S56168656A
Authority
JP
Japan
Prior art keywords
block
multilayer material
material adapted
producing printing
relief
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP5962581A
Other languages
Japanese (ja)
Inventor
Harutoman Hainrihi
Hofuman Geruharuto
Rentsu Buerunaa
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
BASF SE
Original Assignee
BASF SE
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by BASF SE filed Critical BASF SE
Publication of JPS56168656A publication Critical patent/JPS56168656A/en
Pending legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/09—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers
    • G03F7/11—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers having cover layers or intermediate layers, e.g. subbing layers

Landscapes

  • Engineering & Computer Science (AREA)
  • Architecture (AREA)
  • Structural Engineering (AREA)
  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
  • Materials For Photolithography (AREA)
  • Laminated Bodies (AREA)
JP5962581A 1980-04-22 1981-04-20 Multilayer material adapted for producing printing block and relief block Pending JPS56168656A (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
DE19803015340 DE3015340A1 (en) 1980-04-22 1980-04-22 MULTI-LAYER ELEMENTS SUITABLE FOR PRODUCING PRINT AND RELIEF FORMS

Publications (1)

Publication Number Publication Date
JPS56168656A true JPS56168656A (en) 1981-12-24

Family

ID=6100592

Family Applications (1)

Application Number Title Priority Date Filing Date
JP5962581A Pending JPS56168656A (en) 1980-04-22 1981-04-20 Multilayer material adapted for producing printing block and relief block

Country Status (4)

Country Link
US (1) US4357414A (en)
EP (1) EP0038476B1 (en)
JP (1) JPS56168656A (en)
DE (2) DE3015340A1 (en)

Families Citing this family (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE3045515A1 (en) * 1980-12-03 1982-07-08 Basf Ag, 6700 Ludwigshafen LIGHT SENSITIVE MULTILAYER MATERIAL AND METHOD FOR PRODUCING ADHESIVE LAYERS THEREFOR
JPS59172644A (en) * 1983-03-22 1984-09-29 Toray Ind Inc Photosensitive resin plate material developable with water
US4590250A (en) * 1984-01-16 1986-05-20 Desoto, Inc. Polyurethane coatings for magnetic recording structures and production thereof
DE10040929A1 (en) 2000-08-18 2002-02-28 Basf Drucksysteme Gmbh Process for the production of organically developable, photopolymerizable flexographic printing elements on flexible metallic supports

Family Cites Families (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE1597515A1 (en) * 1967-10-28 1970-06-11 Basf Ag Process for applying photosensitive plates, films or foils to metallic substrates
US3877939A (en) * 1973-06-25 1975-04-15 Nippon Paint Co Ltd Photopolymer printing plates and coated relief printing plates
DE2822190A1 (en) * 1978-05-20 1979-11-22 Hoechst Ag PHOTOPOLYMERIZABLE MIXTURE

Also Published As

Publication number Publication date
US4357414A (en) 1982-11-02
EP0038476A1 (en) 1981-10-28
DE3015340A1 (en) 1981-10-29
EP0038476B1 (en) 1984-07-04
DE3164529D1 (en) 1984-08-09

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