JPS56150827A - Inspection device for abnormality of mask - Google Patents

Inspection device for abnormality of mask

Info

Publication number
JPS56150827A
JPS56150827A JP5414180A JP5414180A JPS56150827A JP S56150827 A JPS56150827 A JP S56150827A JP 5414180 A JP5414180 A JP 5414180A JP 5414180 A JP5414180 A JP 5414180A JP S56150827 A JPS56150827 A JP S56150827A
Authority
JP
Japan
Prior art keywords
foreign substance
mask
section
light
substance
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP5414180A
Other languages
Japanese (ja)
Inventor
Tamotsu Sasaki
Katsunori Kameyama
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Hitachi Ltd
Original Assignee
Hitachi Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Hitachi Ltd filed Critical Hitachi Ltd
Priority to JP5414180A priority Critical patent/JPS56150827A/en
Publication of JPS56150827A publication Critical patent/JPS56150827A/en
Pending legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
    • G03F1/68—Preparation processes not covered by groups G03F1/20 - G03F1/50
    • G03F1/82—Auxiliary processes, e.g. cleaning or inspecting
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
    • G03F1/68—Preparation processes not covered by groups G03F1/20 - G03F1/50
    • G03F1/82—Auxiliary processes, e.g. cleaning or inspecting
    • G03F1/84—Inspecting

Abstract

PURPOSE:To enable to perform, without fail, the inspection and removal of the foreign substance on the surface of the mask by a method wherein the mask supporting section, the foreign substance inspecting section where the foreign substance on the substrate surface is inspected and the foreign substance removing device, through which the foreign substance is discharged to outside, are formed. CONSTITUTION:The mask 3, having the prescribed pattern film 16 on the surface of its substrate, is partially inserted to the aperture section provided on the light irradiating section 6 to be used for inspection of a flaw on the mask, and is supported by a plate-spring 17. Then, the light of a lamp 20 is irradiated from above diagonally on the substrate surface of the mask 3. In this case, if there exists a foreign substance 24 such as dust or dirt on the surface of the pattern film 16, the section having dust or dirt is seen brightly because the light is irregularly reflected at the spot having the foreign substance, and the existence of the foreign substance can be inspected without fail. When the foreign substance is detected through said procedures, the substance is removed from the surface of the mask 3 by injecting N2 gas from an N2 gas piping. At the same time, the flown-off foreign substance is sucked into an exhaust pipe by the aid of the sucking force of the exhaust pipe and then discharged to outside.
JP5414180A 1980-04-25 1980-04-25 Inspection device for abnormality of mask Pending JPS56150827A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP5414180A JPS56150827A (en) 1980-04-25 1980-04-25 Inspection device for abnormality of mask

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP5414180A JPS56150827A (en) 1980-04-25 1980-04-25 Inspection device for abnormality of mask

Publications (1)

Publication Number Publication Date
JPS56150827A true JPS56150827A (en) 1981-11-21

Family

ID=12962277

Family Applications (1)

Application Number Title Priority Date Filing Date
JP5414180A Pending JPS56150827A (en) 1980-04-25 1980-04-25 Inspection device for abnormality of mask

Country Status (1)

Country Link
JP (1) JPS56150827A (en)

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6124232A (en) * 1984-07-13 1986-02-01 Hitachi Ltd Pattern inspecting method
JPS6211132A (en) * 1985-07-04 1987-01-20 Hitachi Electronics Eng Co Ltd Apparatus for inspecting foreign matter
US6327021B1 (en) 1998-07-06 2001-12-04 Mitsubishi Denki Kabushiki Kaisha Mask inspection system and method of manufacturing semiconductor device
KR100465710B1 (en) * 2002-10-01 2005-01-13 엘지전자 주식회사 inspect device and its method of photomask

Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS4888982A (en) * 1972-02-23 1973-11-21
JPS5212565A (en) * 1975-07-21 1977-01-31 Hitachi Ltd Sample cleaning device
JPS5355983A (en) * 1976-10-31 1978-05-20 Konishiroku Photo Ind Co Ltd Automatic micro defect detector
JPS55102233A (en) * 1979-01-30 1980-08-05 Matsushita Electric Ind Co Ltd Removing method of dust

Patent Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS4888982A (en) * 1972-02-23 1973-11-21
JPS5212565A (en) * 1975-07-21 1977-01-31 Hitachi Ltd Sample cleaning device
JPS5355983A (en) * 1976-10-31 1978-05-20 Konishiroku Photo Ind Co Ltd Automatic micro defect detector
JPS55102233A (en) * 1979-01-30 1980-08-05 Matsushita Electric Ind Co Ltd Removing method of dust

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6124232A (en) * 1984-07-13 1986-02-01 Hitachi Ltd Pattern inspecting method
JPS6211132A (en) * 1985-07-04 1987-01-20 Hitachi Electronics Eng Co Ltd Apparatus for inspecting foreign matter
US6327021B1 (en) 1998-07-06 2001-12-04 Mitsubishi Denki Kabushiki Kaisha Mask inspection system and method of manufacturing semiconductor device
KR100465710B1 (en) * 2002-10-01 2005-01-13 엘지전자 주식회사 inspect device and its method of photomask

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