JPS56146879A - Vapor deposition method - Google Patents
Vapor deposition methodInfo
- Publication number
- JPS56146879A JPS56146879A JP4885380A JP4885380A JPS56146879A JP S56146879 A JPS56146879 A JP S56146879A JP 4885380 A JP4885380 A JP 4885380A JP 4885380 A JP4885380 A JP 4885380A JP S56146879 A JPS56146879 A JP S56146879A
- Authority
- JP
- Japan
- Prior art keywords
- vapor
- deposited
- boats
- shutter
- depositing
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Classifications
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/54—Controlling or regulating the coating process
- C23C14/542—Controlling the film thickness or evaporation rate
- C23C14/545—Controlling the film thickness or evaporation rate using measurement on deposited material
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/50—Substrate holders
- C23C14/505—Substrate holders for rotation of the substrates
Landscapes
- Chemical & Material Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Engineering & Computer Science (AREA)
- Materials Engineering (AREA)
- Mechanical Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Physical Vapour Deposition (AREA)
- Physical Deposition Of Substances That Are Components Of Semiconductor Devices (AREA)
- Recrystallisation Techniques (AREA)
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP4885380A JPS56146879A (en) | 1980-04-14 | 1980-04-14 | Vapor deposition method |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP4885380A JPS56146879A (en) | 1980-04-14 | 1980-04-14 | Vapor deposition method |
Publications (2)
Publication Number | Publication Date |
---|---|
JPS56146879A true JPS56146879A (en) | 1981-11-14 |
JPS6130026B2 JPS6130026B2 (ja) | 1986-07-10 |
Family
ID=12814818
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP4885380A Granted JPS56146879A (en) | 1980-04-14 | 1980-04-14 | Vapor deposition method |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS56146879A (ja) |
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2014177703A (ja) * | 2013-03-14 | 2014-09-25 | Samsung Display Co Ltd | 真空蒸着器 |
WO2019041904A1 (zh) * | 2017-08-29 | 2019-03-07 | 京东方科技集团股份有限公司 | 限制装置、限制结构及其调节方法和蒸镀系统 |
Families Citing this family (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
RU2476951C1 (ru) * | 2011-07-27 | 2013-02-27 | Государственное образовательное учреждение высшего профессионального образования "Саратовский государственный технический университет" (СГТУ) | Микропрофиль структуры вакуумной интегральной свч-схемы и способ его получения |
-
1980
- 1980-04-14 JP JP4885380A patent/JPS56146879A/ja active Granted
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2014177703A (ja) * | 2013-03-14 | 2014-09-25 | Samsung Display Co Ltd | 真空蒸着器 |
WO2019041904A1 (zh) * | 2017-08-29 | 2019-03-07 | 京东方科技集团股份有限公司 | 限制装置、限制结构及其调节方法和蒸镀系统 |
Also Published As
Publication number | Publication date |
---|---|
JPS6130026B2 (ja) | 1986-07-10 |
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