JPS56145647A - Ion source for mass spectrometer - Google Patents

Ion source for mass spectrometer

Info

Publication number
JPS56145647A
JPS56145647A JP4689780A JP4689780A JPS56145647A JP S56145647 A JPS56145647 A JP S56145647A JP 4689780 A JP4689780 A JP 4689780A JP 4689780 A JP4689780 A JP 4689780A JP S56145647 A JPS56145647 A JP S56145647A
Authority
JP
Japan
Prior art keywords
ion
ion source
electron beam
mass spectrometer
magnetic
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP4689780A
Other languages
Japanese (ja)
Inventor
Kohei Mochizuki
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Hitachi Ltd
Original Assignee
Hitachi Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Hitachi Ltd filed Critical Hitachi Ltd
Priority to JP4689780A priority Critical patent/JPS56145647A/en
Publication of JPS56145647A publication Critical patent/JPS56145647A/en
Pending legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J49/00—Particle spectrometers or separator tubes
    • H01J49/02—Details
    • H01J49/10—Ion sources; Ion guns

Abstract

PURPOSE:To both increase the life of an ion source and obtain an ion beam of high density, by forming its slits with magnetic materials and focusing a magnetic field with an electron beam as the center. CONSTITUTION:For slits 3a, 3b, annular magnetic materials 12, 13 are used respectively. Lines of magnetic force 9 produced by magnets 8a, 8b are caused to flow in the magnetic materials 12, 13, then a range of the lines of magnetic force 9 enveloping an electron beam 2 can be reduced. In this way, the electron beam 2 obtains high density to increase the quantity of an ion injected out of an ion irradiation port 10.
JP4689780A 1980-04-11 1980-04-11 Ion source for mass spectrometer Pending JPS56145647A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP4689780A JPS56145647A (en) 1980-04-11 1980-04-11 Ion source for mass spectrometer

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP4689780A JPS56145647A (en) 1980-04-11 1980-04-11 Ion source for mass spectrometer

Publications (1)

Publication Number Publication Date
JPS56145647A true JPS56145647A (en) 1981-11-12

Family

ID=12760149

Family Applications (1)

Application Number Title Priority Date Filing Date
JP4689780A Pending JPS56145647A (en) 1980-04-11 1980-04-11 Ion source for mass spectrometer

Country Status (1)

Country Link
JP (1) JPS56145647A (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2008539549A (en) * 2005-04-26 2008-11-13 バリアン・インコーポレイテッド Control method of ion instability affected by space charge in electron impact ion source

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2008539549A (en) * 2005-04-26 2008-11-13 バリアン・インコーポレイテッド Control method of ion instability affected by space charge in electron impact ion source

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