JPS56145633A - Magnetron - Google Patents

Magnetron

Info

Publication number
JPS56145633A
JPS56145633A JP4845580A JP4845580A JPS56145633A JP S56145633 A JPS56145633 A JP S56145633A JP 4845580 A JP4845580 A JP 4845580A JP 4845580 A JP4845580 A JP 4845580A JP S56145633 A JPS56145633 A JP S56145633A
Authority
JP
Japan
Prior art keywords
cathode
anode
radius
inner end
space
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP4845580A
Other languages
Japanese (ja)
Inventor
Yoshi Sotokawa
Tetsuya Yoshida
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
NEC Home Electronics Ltd
NEC Corp
Original Assignee
NEC Home Electronics Ltd
Nippon Electric Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by NEC Home Electronics Ltd, Nippon Electric Co Ltd filed Critical NEC Home Electronics Ltd
Priority to JP4845580A priority Critical patent/JPS56145633A/en
Publication of JPS56145633A publication Critical patent/JPS56145633A/en
Pending legal-status Critical Current

Links

Classifications

    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01JELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J25/00Transit-time tubes, e.g. klystrons, travelling-wave tubes, magnetrons
    • H01J25/50Magnetrons, i.e. tubes with a magnet system producing an H-field crossing the E-field

Landscapes

  • Microwave Tubes (AREA)

Abstract

PURPOSE:To prevent the effectiveness of a magnetron from being lowered even if the cathode voltage decreases, by properly presetting the radius measured from the center line of a cathode to the inner end face of an anode blade piece and the radius of the cathode. CONSTITUTION:An anode 2 is arranged around a cathode 1. This anode 2 radially fixes 12 rectangular anode blade pieces 4, 4... on the inner surface of an anode cylindrical body 3 at equal intervals. The cathode 1 is enclosed by the inner end faces of the respective anode blade pieces 4, 4... at specified gap size (g) and the space of these gap size (g) is used as actuating space (m). A magnetic field is applied to the actuating space (m) by a magnet. The radius Ra measured from the center of the cathode 1 to the inner end face of the anode blade piece 4 is present to 4.1-4.5mm. and the radius Rc of the cathode 1 to 2-2.34mm.. The anode voltage operates at 2.5KV.
JP4845580A 1980-04-11 1980-04-11 Magnetron Pending JPS56145633A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP4845580A JPS56145633A (en) 1980-04-11 1980-04-11 Magnetron

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP4845580A JPS56145633A (en) 1980-04-11 1980-04-11 Magnetron

Publications (1)

Publication Number Publication Date
JPS56145633A true JPS56145633A (en) 1981-11-12

Family

ID=12803820

Family Applications (1)

Application Number Title Priority Date Filing Date
JP4845580A Pending JPS56145633A (en) 1980-04-11 1980-04-11 Magnetron

Country Status (1)

Country Link
JP (1) JPS56145633A (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US8701624B2 (en) 2008-12-23 2014-04-22 Trelleborg Sealing Solutions Kalmar Vibration damped article

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US8701624B2 (en) 2008-12-23 2014-04-22 Trelleborg Sealing Solutions Kalmar Vibration damped article

Similar Documents

Publication Publication Date Title
AU4980079A (en) High frequency magnetic field coupling arc plasma reactor
EP0097117A3 (en) Cylindrical cathode for magnetically-enhanced sputtering
ATE102395T1 (en) DEVICE FOR SURFACE TREATMENT OF WORKPIECES.
JPS56145633A (en) Magnetron
ES8206802A1 (en) Apparatus for monitoring a valve.
GB472583A (en) Improvements in or relating to electron discharge devices
JPS5721050A (en) Magnetron
JPS57203781A (en) Plasma working device
GB647470A (en) Improvements in and relating to high frequency magnetrons
GB1009870A (en) Crossed-field electric discharge tube
GB1070123A (en) Method and apparatus for detecting leaks
GB873024A (en) Glow discharge apparatus
JPS5754401A (en) High frequency filter
JPS6432634A (en) Plasma treater
GB938022A (en) Ionic pump
JPS57117240A (en) High-frequency sputtering etching device
JPS548975A (en) Semiconuctor device
JPS52132667A (en) Magnetron
JPS5750435A (en) Plasma etching device
EP0209963A3 (en) Improvement in or relating to ignitron devices
FR2386127A1 (en) Charged particles injector ion source - has cylindrical housing, in which hollow ring contains source annular anode and cathode
JPS55102162A (en) Ion source
JPS55144633A (en) Magnetron
JPS52132666A (en) Magnetron
SU1320533A1 (en) Electric trap