JPS56142528A - Developing solution for o-quinone diazide photosensitive material - Google Patents
Developing solution for o-quinone diazide photosensitive materialInfo
- Publication number
- JPS56142528A JPS56142528A JP4598680A JP4598680A JPS56142528A JP S56142528 A JPS56142528 A JP S56142528A JP 4598680 A JP4598680 A JP 4598680A JP 4598680 A JP4598680 A JP 4598680A JP S56142528 A JPS56142528 A JP S56142528A
- Authority
- JP
- Japan
- Prior art keywords
- soln
- developing
- polyelectrolyte
- photosensitive material
- quinone diazide
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- WOAHJDHKFWSLKE-UHFFFAOYSA-N 1,2-benzoquinone Chemical compound O=C1C=CC=CC1=O WOAHJDHKFWSLKE-UHFFFAOYSA-N 0.000 title abstract 3
- 239000000463 material Substances 0.000 title abstract 3
- 239000000178 monomer Substances 0.000 abstract 4
- 229920000867 polyelectrolyte Polymers 0.000 abstract 4
- HEMHJVSKTPXQMS-UHFFFAOYSA-M Sodium hydroxide Chemical compound [OH-].[Na+] HEMHJVSKTPXQMS-UHFFFAOYSA-M 0.000 abstract 3
- PUAQLLVFLMYYJJ-UHFFFAOYSA-N 2-aminopropiophenone Chemical compound CC(N)C(=O)C1=CC=CC=C1 PUAQLLVFLMYYJJ-UHFFFAOYSA-N 0.000 abstract 2
- 239000003513 alkali Substances 0.000 abstract 2
- 150000003863 ammonium salts Chemical class 0.000 abstract 2
- 125000000129 anionic group Chemical group 0.000 abstract 2
- 239000002699 waste material Substances 0.000 abstract 2
- AGBXYHCHUYARJY-UHFFFAOYSA-N 2-phenylethenesulfonic acid Chemical compound OS(=O)(=O)C=CC1=CC=CC=C1 AGBXYHCHUYARJY-UHFFFAOYSA-N 0.000 abstract 1
- KGIGUEBEKRSTEW-UHFFFAOYSA-N 2-vinylpyridine Chemical compound C=CC1=CC=CC=N1 KGIGUEBEKRSTEW-UHFFFAOYSA-N 0.000 abstract 1
- NIXOWILDQLNWCW-UHFFFAOYSA-M Acrylate Chemical compound [O-]C(=O)C=C NIXOWILDQLNWCW-UHFFFAOYSA-M 0.000 abstract 1
- DGAQECJNVWCQMB-PUAWFVPOSA-M Ilexoside XXIX Chemical compound C[C@@H]1CC[C@@]2(CC[C@@]3(C(=CC[C@H]4[C@]3(CC[C@@H]5[C@@]4(CC[C@@H](C5(C)C)OS(=O)(=O)[O-])C)C)[C@@H]2[C@]1(C)O)C)C(=O)O[C@H]6[C@@H]([C@H]([C@@H]([C@H](O6)CO)O)O)O.[Na+] DGAQECJNVWCQMB-PUAWFVPOSA-M 0.000 abstract 1
- 229910019142 PO4 Inorganic materials 0.000 abstract 1
- 229910006069 SO3H Inorganic materials 0.000 abstract 1
- 239000004115 Sodium Silicate Substances 0.000 abstract 1
- 125000002091 cationic group Chemical group 0.000 abstract 1
- 239000003795 chemical substances by application Substances 0.000 abstract 1
- 229920001577 copolymer Polymers 0.000 abstract 1
- -1 cyclic amine Chemical class 0.000 abstract 1
- 125000004122 cyclic group Chemical group 0.000 abstract 1
- 125000000896 monocarboxylic acid group Chemical group 0.000 abstract 1
- DYUWTXWIYMHBQS-UHFFFAOYSA-N n-prop-2-enylprop-2-en-1-amine Chemical compound C=CCNCC=C DYUWTXWIYMHBQS-UHFFFAOYSA-N 0.000 abstract 1
- 239000010452 phosphate Substances 0.000 abstract 1
- 125000002467 phosphate group Chemical group [H]OP(=O)(O[H])O[*] 0.000 abstract 1
- RMAQACBXLXPBSY-UHFFFAOYSA-N silicic acid Chemical compound O[Si](O)(O)O RMAQACBXLXPBSY-UHFFFAOYSA-N 0.000 abstract 1
- 235000012239 silicon dioxide Nutrition 0.000 abstract 1
- 239000011734 sodium Substances 0.000 abstract 1
- 229910052708 sodium Inorganic materials 0.000 abstract 1
- NTHWMYGWWRZVTN-UHFFFAOYSA-N sodium silicate Chemical compound [Na+].[Na+].[O-][Si]([O-])=O NTHWMYGWWRZVTN-UHFFFAOYSA-N 0.000 abstract 1
- 229910052911 sodium silicate Inorganic materials 0.000 abstract 1
- 125000000020 sulfo group Chemical group O=S(=O)([*])O[H] 0.000 abstract 1
- 150000003512 tertiary amines Chemical class 0.000 abstract 1
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 abstract 1
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/26—Processing photosensitive materials; Apparatus therefor
- G03F7/30—Imagewise removal using liquid means
- G03F7/32—Liquid compositions therefor, e.g. developers
- G03F7/322—Aqueous alkaline compositions
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Photosensitive Polymer And Photoresist Processing (AREA)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP4598680A JPS56142528A (en) | 1980-04-08 | 1980-04-08 | Developing solution for o-quinone diazide photosensitive material |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP4598680A JPS56142528A (en) | 1980-04-08 | 1980-04-08 | Developing solution for o-quinone diazide photosensitive material |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS56142528A true JPS56142528A (en) | 1981-11-06 |
| JPS647650B2 JPS647650B2 (enrdf_load_stackoverflow) | 1989-02-09 |
Family
ID=12734475
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP4598680A Granted JPS56142528A (en) | 1980-04-08 | 1980-04-08 | Developing solution for o-quinone diazide photosensitive material |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS56142528A (enrdf_load_stackoverflow) |
Cited By (12)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS58102934A (ja) * | 1981-12-11 | 1983-06-18 | デイスコビジヨン・アソシエイツ | フオトレジスト層を現像する方法 |
| US5478690A (en) * | 1991-02-14 | 1995-12-26 | Nippon Paint Co., Ltd. | Alkali developable photosensitive resin composition comprising a binder having betaine side groups |
| EP0732628A1 (en) | 1995-03-07 | 1996-09-18 | Minnesota Mining And Manufacturing Company | Aqueous alkaline solution for developing offset printing plate |
| US5942368A (en) * | 1996-04-23 | 1999-08-24 | Konica Corporation | Pigment dispersion composition |
| WO2002064651A1 (en) * | 2001-02-09 | 2002-08-22 | 3M Innovative Properties Company | Self-crosslinking copolymer for image receptor layer |
| EP1314552A2 (en) | 1998-04-06 | 2003-05-28 | Fuji Photo Film Co., Ltd. | Photosensitive resin composition |
| EP1338415A2 (en) | 2002-02-21 | 2003-08-27 | Fuji Photo Film Co., Ltd. | Method for preparing lithographic printing plate |
| EP1584984A1 (en) | 2004-04-06 | 2005-10-12 | Fuji Photo Film Co., Ltd. | Method for replenishing developer in an automatic developing machine for photosensitive lithographic printing plate |
| US7214474B2 (en) * | 2004-06-29 | 2007-05-08 | Intel Corporation | Wash composition with polymeric surfactant |
| WO2011024988A1 (ja) * | 2009-08-31 | 2011-03-03 | 和光純薬工業株式会社 | アリルスルホネートアニオン含有イオン液体 |
| EP2354854A1 (en) | 2002-09-20 | 2011-08-10 | FUJIFILM Corporation | Method of making lithographic printing plate |
| EP2381312A2 (en) | 2000-08-25 | 2011-10-26 | Fujifilm Corporation | Alkaline liquid developer for lithographic printing plate and method for preparing lithographic printing plate |
-
1980
- 1980-04-08 JP JP4598680A patent/JPS56142528A/ja active Granted
Cited By (14)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS58102934A (ja) * | 1981-12-11 | 1983-06-18 | デイスコビジヨン・アソシエイツ | フオトレジスト層を現像する方法 |
| US5478690A (en) * | 1991-02-14 | 1995-12-26 | Nippon Paint Co., Ltd. | Alkali developable photosensitive resin composition comprising a binder having betaine side groups |
| EP0732628A1 (en) | 1995-03-07 | 1996-09-18 | Minnesota Mining And Manufacturing Company | Aqueous alkaline solution for developing offset printing plate |
| US5670294A (en) * | 1995-03-07 | 1997-09-23 | Imation Corp | Aqueous alkaline solution for developing offset printing plates |
| US5942368A (en) * | 1996-04-23 | 1999-08-24 | Konica Corporation | Pigment dispersion composition |
| EP1314552A2 (en) | 1998-04-06 | 2003-05-28 | Fuji Photo Film Co., Ltd. | Photosensitive resin composition |
| EP2381312A2 (en) | 2000-08-25 | 2011-10-26 | Fujifilm Corporation | Alkaline liquid developer for lithographic printing plate and method for preparing lithographic printing plate |
| WO2002064651A1 (en) * | 2001-02-09 | 2002-08-22 | 3M Innovative Properties Company | Self-crosslinking copolymer for image receptor layer |
| EP1338415A2 (en) | 2002-02-21 | 2003-08-27 | Fuji Photo Film Co., Ltd. | Method for preparing lithographic printing plate |
| EP2354854A1 (en) | 2002-09-20 | 2011-08-10 | FUJIFILM Corporation | Method of making lithographic printing plate |
| EP1584984A1 (en) | 2004-04-06 | 2005-10-12 | Fuji Photo Film Co., Ltd. | Method for replenishing developer in an automatic developing machine for photosensitive lithographic printing plate |
| US7214474B2 (en) * | 2004-06-29 | 2007-05-08 | Intel Corporation | Wash composition with polymeric surfactant |
| WO2011024988A1 (ja) * | 2009-08-31 | 2011-03-03 | 和光純薬工業株式会社 | アリルスルホネートアニオン含有イオン液体 |
| US8546609B2 (en) | 2009-08-31 | 2013-10-01 | Wako Pure Chemical Industries, Ltd. | Ionic liquid containing allylsulfonate anion |
Also Published As
| Publication number | Publication date |
|---|---|
| JPS647650B2 (enrdf_load_stackoverflow) | 1989-02-09 |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| JPS56142528A (en) | Developing solution for o-quinone diazide photosensitive material | |
| JPS57192952A (en) | Composition of developing solution | |
| AR246019A1 (es) | Composicion detergente especialmente apta para ser utilizada como champu | |
| FR2431859A1 (fr) | Agent de nettoyage pour surfaces dentinaires | |
| PT92585A (pt) | Processo para a preparacao de novas resinas de permuta anionica de polivinilpiridinio | |
| JPS51115298A (en) | Process for production of spherical silica gel | |
| GB881593A (en) | Improvements in the preparation of planographic printing plates | |
| JPS5523941A (en) | Immobilization of enzyme using water-soluble photo- crosslinkable resin | |
| PT73314A (fr) | Procede pour la fabrication de l'acide beta-hydroxybutyrique etde ses oligocondensats | |
| DE50105469D1 (de) | Mikrokapseln (VII) | |
| JPS5236589A (en) | Membrane of cation exchange resin containing fluorine | |
| MC1255A1 (fr) | L'acide 7-methoxy-5-oxo-5h-thiazolo(2,3-b)quinazoline-2-carboxylique et ses sels,leur preparation et leurs utilisations therapeutiques | |
| JPS5595946A (en) | Developer for o-quinone diazide type photosensitive material | |
| GB1516653A (en) | Poloxamer-iodine gel | |
| JPS5586535A (en) | Method of bonding | |
| ES8206542A1 (es) | Procedimiento para la obtencion de fosfonoformaldehido | |
| JPS5278781A (en) | Agent for treating solution of acid or alkali | |
| JPS5512921A (en) | Photoengraving process | |
| JPS568146A (en) | Manufacture of screen plate material | |
| JPS5393180A (en) | Diffusing and dialyzing for solution containing base | |
| JPS5350288A (en) | Preventin of stickiness of water-containing gel of acrylamide type polymer | |
| SU1134924A1 (ru) | Способ изготовлени электрофотографических офсетных форм | |
| SU994774A1 (ru) | Способ обеспыливани хвостохранилищ,содержащих кислоторастворимые алюмосиликаты | |
| JPS546869A (en) | Increasing method for current efficiency of cation exchange membrane | |
| JPS54158388A (en) | Production of cation exchange membrane |