JPS5613973B2 - - Google Patents
Info
- Publication number
- JPS5613973B2 JPS5613973B2 JP4513675A JP4513675A JPS5613973B2 JP S5613973 B2 JPS5613973 B2 JP S5613973B2 JP 4513675 A JP4513675 A JP 4513675A JP 4513675 A JP4513675 A JP 4513675A JP S5613973 B2 JPS5613973 B2 JP S5613973B2
- Authority
- JP
- Japan
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
Landscapes
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
- Formation Of Various Coating Films On Cathode Ray Tubes And Lamps (AREA)
- Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
- Surface Acoustic Wave Elements And Circuit Networks Thereof (AREA)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP50045136A JPS51120615A (en) | 1975-04-16 | 1975-04-16 | Manufacturing method for comb-type electrodes |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP50045136A JPS51120615A (en) | 1975-04-16 | 1975-04-16 | Manufacturing method for comb-type electrodes |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS51120615A JPS51120615A (en) | 1976-10-22 |
| JPS5613973B2 true JPS5613973B2 (xx) | 1981-04-01 |
Family
ID=12710851
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP50045136A Granted JPS51120615A (en) | 1975-04-16 | 1975-04-16 | Manufacturing method for comb-type electrodes |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS51120615A (xx) |
Families Citing this family (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS55138839A (en) * | 1979-04-17 | 1980-10-30 | Nec Kyushu Ltd | Method of fabricating semiconductor device |
| FR2465255B1 (fr) * | 1979-09-10 | 1987-02-20 | Roumiguieres Jean Louis | Procede pour reporter sur un support l'ombre fidele d'un masque perce de fentes distribuees periodiquement, et application de ce procede notamment en photolithogravure |
| JPH061755B2 (ja) * | 1987-03-31 | 1994-01-05 | 横河電機株式会社 | フオト・リソグラフイ装置 |
| JP5943886B2 (ja) * | 2013-08-20 | 2016-07-05 | 株式会社東芝 | パターン形成方法及び露光用マスク |
-
1975
- 1975-04-16 JP JP50045136A patent/JPS51120615A/ja active Granted
Also Published As
| Publication number | Publication date |
|---|---|
| JPS51120615A (en) | 1976-10-22 |