JPS51120615A - Manufacturing method for comb-type electrodes - Google Patents
Manufacturing method for comb-type electrodesInfo
- Publication number
- JPS51120615A JPS51120615A JP50045136A JP4513675A JPS51120615A JP S51120615 A JPS51120615 A JP S51120615A JP 50045136 A JP50045136 A JP 50045136A JP 4513675 A JP4513675 A JP 4513675A JP S51120615 A JPS51120615 A JP S51120615A
- Authority
- JP
- Japan
- Prior art keywords
- comb
- type electrodes
- manufacturing
- expending
- obtain high
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Landscapes
- Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
- Surface Acoustic Wave Elements And Circuit Networks Thereof (AREA)
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
- Formation Of Various Coating Films On Cathode Ray Tubes And Lamps (AREA)
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP50045136A JPS51120615A (en) | 1975-04-16 | 1975-04-16 | Manufacturing method for comb-type electrodes |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP50045136A JPS51120615A (en) | 1975-04-16 | 1975-04-16 | Manufacturing method for comb-type electrodes |
Publications (2)
Publication Number | Publication Date |
---|---|
JPS51120615A true JPS51120615A (en) | 1976-10-22 |
JPS5613973B2 JPS5613973B2 (ja) | 1981-04-01 |
Family
ID=12710851
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP50045136A Granted JPS51120615A (en) | 1975-04-16 | 1975-04-16 | Manufacturing method for comb-type electrodes |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS51120615A (ja) |
Cited By (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS55138839A (en) * | 1979-04-17 | 1980-10-30 | Nec Kyushu Ltd | Method of fabricating semiconductor device |
JPS5640831A (en) * | 1979-09-10 | 1981-04-17 | Roumiguieres Jean Louis | Projecting image of mask having periodically distributed plural slits onto support and its application to lithographic photography |
JPS63244736A (ja) * | 1987-03-31 | 1988-10-12 | Yokogawa Electric Corp | フオト・リソグラフイ装置 |
JP2015041649A (ja) * | 2013-08-20 | 2015-03-02 | 株式会社東芝 | パターン形成方法、露光用マスク及び露光装置 |
-
1975
- 1975-04-16 JP JP50045136A patent/JPS51120615A/ja active Granted
Cited By (6)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS55138839A (en) * | 1979-04-17 | 1980-10-30 | Nec Kyushu Ltd | Method of fabricating semiconductor device |
JPS5640831A (en) * | 1979-09-10 | 1981-04-17 | Roumiguieres Jean Louis | Projecting image of mask having periodically distributed plural slits onto support and its application to lithographic photography |
JPH0250613B2 (ja) * | 1979-09-10 | 1990-11-02 | Ruumigieeru Jannrui | |
JPS63244736A (ja) * | 1987-03-31 | 1988-10-12 | Yokogawa Electric Corp | フオト・リソグラフイ装置 |
JP2015041649A (ja) * | 2013-08-20 | 2015-03-02 | 株式会社東芝 | パターン形成方法、露光用マスク及び露光装置 |
US9329490B2 (en) | 2013-08-20 | 2016-05-03 | Kabushiki Kaisha Toshiba | Pattern formation method, mask for exposure, and exposure apparatus |
Also Published As
Publication number | Publication date |
---|---|
JPS5613973B2 (ja) | 1981-04-01 |
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