JPS56121038A - Manufacture of lithographic plate - Google Patents
Manufacture of lithographic plateInfo
- Publication number
- JPS56121038A JPS56121038A JP2360680A JP2360680A JPS56121038A JP S56121038 A JPS56121038 A JP S56121038A JP 2360680 A JP2360680 A JP 2360680A JP 2360680 A JP2360680 A JP 2360680A JP S56121038 A JPS56121038 A JP S56121038A
- Authority
- JP
- Japan
- Prior art keywords
- elements
- layer
- base
- silicone layer
- printing
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 238000004519 manufacturing process Methods 0.000 title 1
- 229920001296 polysiloxane Polymers 0.000 abstract 4
- 239000002904 solvent Substances 0.000 abstract 2
- 239000004743 Polypropylene Substances 0.000 abstract 1
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 abstract 1
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 abstract 1
- 229910052782 aluminium Inorganic materials 0.000 abstract 1
- 239000003054 catalyst Substances 0.000 abstract 1
- 239000011248 coating agent Substances 0.000 abstract 1
- 238000000576 coating method Methods 0.000 abstract 1
- 230000007547 defect Effects 0.000 abstract 1
- 238000000034 method Methods 0.000 abstract 1
- -1 polypropylene Polymers 0.000 abstract 1
- 229920001155 polypropylene Polymers 0.000 abstract 1
- 229910052710 silicon Inorganic materials 0.000 abstract 1
- 239000010703 silicon Substances 0.000 abstract 1
- 238000005507 spraying Methods 0.000 abstract 1
- 238000010186 staining Methods 0.000 abstract 1
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 abstract 1
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/075—Silicon-containing compounds
- G03F7/0752—Silicon-containing compounds in non photosensitive layers or as additives, e.g. for dry lithography
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Manufacture Or Reproduction Of Printing Formes (AREA)
- Photosensitive Polymer And Photoresist Processing (AREA)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2360680A JPS56121038A (en) | 1980-02-27 | 1980-02-27 | Manufacture of lithographic plate |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2360680A JPS56121038A (en) | 1980-02-27 | 1980-02-27 | Manufacture of lithographic plate |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS56121038A true JPS56121038A (en) | 1981-09-22 |
| JPS6154224B2 JPS6154224B2 (enrdf_load_stackoverflow) | 1986-11-21 |
Family
ID=12115262
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2360680A Granted JPS56121038A (en) | 1980-02-27 | 1980-02-27 | Manufacture of lithographic plate |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS56121038A (enrdf_load_stackoverflow) |
-
1980
- 1980-02-27 JP JP2360680A patent/JPS56121038A/ja active Granted
Also Published As
| Publication number | Publication date |
|---|---|
| JPS6154224B2 (enrdf_load_stackoverflow) | 1986-11-21 |
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