JPS5611754B2 - - Google Patents
Info
- Publication number
- JPS5611754B2 JPS5611754B2 JP9542674A JP9542674A JPS5611754B2 JP S5611754 B2 JPS5611754 B2 JP S5611754B2 JP 9542674 A JP9542674 A JP 9542674A JP 9542674 A JP9542674 A JP 9542674A JP S5611754 B2 JPS5611754 B2 JP S5611754B2
- Authority
- JP
- Japan
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
Landscapes
- Manufacturing Of Printed Circuit Boards (AREA)
- Drying Of Semiconductors (AREA)
- ing And Chemical Polishing (AREA)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP9542674A JPS5122637A (en) | 1974-08-20 | 1974-08-20 | Kinzokuhimakuno etsuchinguhoho |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP9542674A JPS5122637A (en) | 1974-08-20 | 1974-08-20 | Kinzokuhimakuno etsuchinguhoho |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS5122637A JPS5122637A (en) | 1976-02-23 |
| JPS5611754B2 true JPS5611754B2 (ja) | 1981-03-17 |
Family
ID=14137357
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP9542674A Granted JPS5122637A (en) | 1974-08-20 | 1974-08-20 | Kinzokuhimakuno etsuchinguhoho |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS5122637A (ja) |
Families Citing this family (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS6019139B2 (ja) * | 1976-07-26 | 1985-05-14 | 三菱電機株式会社 | エツチング方法およびプラズマエツチング用混合物ガス |
| NL8004007A (nl) * | 1980-07-11 | 1982-02-01 | Philips Nv | Werkwijze voor het vervaardigen van een halfgeleider- inrichting. |
| JPS59195831A (ja) * | 1983-04-21 | 1984-11-07 | Toshiba Corp | 半導体基板の表面処理方法 |
| US4659426A (en) * | 1985-05-03 | 1987-04-21 | Texas Instruments Incorporated | Plasma etching of refractory metals and their silicides |
| WO2003065419A2 (en) * | 2002-01-29 | 2003-08-07 | Tokyo Electron Limited | Plasma etching of ni-containing materials |
-
1974
- 1974-08-20 JP JP9542674A patent/JPS5122637A/ja active Granted
Also Published As
| Publication number | Publication date |
|---|---|
| JPS5122637A (en) | 1976-02-23 |