JPS5122637A - Kinzokuhimakuno etsuchinguhoho - Google Patents

Kinzokuhimakuno etsuchinguhoho

Info

Publication number
JPS5122637A
JPS5122637A JP9542674A JP9542674A JPS5122637A JP S5122637 A JPS5122637 A JP S5122637A JP 9542674 A JP9542674 A JP 9542674A JP 9542674 A JP9542674 A JP 9542674A JP S5122637 A JPS5122637 A JP S5122637A
Authority
JP
Japan
Prior art keywords
kinzokuhimakuno
etsuchinguhoho
kinzokuhimakuno etsuchinguhoho
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP9542674A
Other languages
English (en)
Other versions
JPS5611754B2 (ja
Inventor
Katsuhiro Fujino
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Fujitsu Ltd
Original Assignee
Fujitsu Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Fujitsu Ltd filed Critical Fujitsu Ltd
Priority to JP9542674A priority Critical patent/JPS5122637A/ja
Publication of JPS5122637A publication Critical patent/JPS5122637A/ja
Publication of JPS5611754B2 publication Critical patent/JPS5611754B2/ja
Granted legal-status Critical Current

Links

Landscapes

  • Drying Of Semiconductors (AREA)
  • ing And Chemical Polishing (AREA)
  • Manufacturing Of Printed Circuit Boards (AREA)
JP9542674A 1974-08-20 1974-08-20 Kinzokuhimakuno etsuchinguhoho Granted JPS5122637A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP9542674A JPS5122637A (en) 1974-08-20 1974-08-20 Kinzokuhimakuno etsuchinguhoho

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP9542674A JPS5122637A (en) 1974-08-20 1974-08-20 Kinzokuhimakuno etsuchinguhoho

Publications (2)

Publication Number Publication Date
JPS5122637A true JPS5122637A (en) 1976-02-23
JPS5611754B2 JPS5611754B2 (ja) 1981-03-17

Family

ID=14137357

Family Applications (1)

Application Number Title Priority Date Filing Date
JP9542674A Granted JPS5122637A (en) 1974-08-20 1974-08-20 Kinzokuhimakuno etsuchinguhoho

Country Status (1)

Country Link
JP (1) JPS5122637A (ja)

Cited By (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5314571A (en) * 1976-07-26 1978-02-09 Mitsubishi Electric Corp Etching method and mixed gas for etching
US4381967A (en) * 1980-07-11 1983-05-03 U.S. Philips Corporation Method of manufacturing a semiconductor device
JPS59195831A (ja) * 1983-04-21 1984-11-07 Toshiba Corp 半導体基板の表面処理方法
JPS61256638A (ja) * 1985-05-03 1986-11-14 テキサス　インスツルメンツ　インコーポレイテッド 薄膜配線層のパタ−ン化方法
WO2003065419A3 (en) * 2002-01-29 2003-11-13 Tokyo Electron Ltd Plasma etching of ni-containing materials

Cited By (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5314571A (en) * 1976-07-26 1978-02-09 Mitsubishi Electric Corp Etching method and mixed gas for etching
JPS6019139B2 (ja) * 1976-07-26 1985-05-14 三菱電機株式会社 エツチング方法およびプラズマエツチング用混合物ガス
US4381967A (en) * 1980-07-11 1983-05-03 U.S. Philips Corporation Method of manufacturing a semiconductor device
JPS59195831A (ja) * 1983-04-21 1984-11-07 Toshiba Corp 半導体基板の表面処理方法
JPH0475653B2 (ja) * 1983-04-21 1992-12-01 Tokyo Shibaura Electric Co
JPS61256638A (ja) * 1985-05-03 1986-11-14 テキサス　インスツルメンツ　インコーポレイテッド 薄膜配線層のパタ−ン化方法
WO2003065419A3 (en) * 2002-01-29 2003-11-13 Tokyo Electron Ltd Plasma etching of ni-containing materials
US7229563B2 (en) 2002-01-29 2007-06-12 Tokyo Electron Limited Plasma etching of Ni-containing materials

Also Published As

Publication number Publication date
JPS5611754B2 (ja) 1981-03-17

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