JPS56109352A - Original negative for engraving - Google Patents

Original negative for engraving

Info

Publication number
JPS56109352A
JPS56109352A JP1173180A JP1173180A JPS56109352A JP S56109352 A JPS56109352 A JP S56109352A JP 1173180 A JP1173180 A JP 1173180A JP 1173180 A JP1173180 A JP 1173180A JP S56109352 A JPS56109352 A JP S56109352A
Authority
JP
Japan
Prior art keywords
engraving
original negative
spots
negative
original
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP1173180A
Other languages
English (en)
Japanese (ja)
Other versions
JPS6216416B2 (enExample
Inventor
Masaaki Seshimo
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
SEJIMO CHIYOUKOKUSHIYO KK
Original Assignee
SEJIMO CHIYOUKOKUSHIYO KK
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by SEJIMO CHIYOUKOKUSHIYO KK filed Critical SEJIMO CHIYOUKOKUSHIYO KK
Priority to JP1173180A priority Critical patent/JPS56109352A/ja
Publication of JPS56109352A publication Critical patent/JPS56109352A/ja
Publication of JPS6216416B2 publication Critical patent/JPS6216416B2/ja
Granted legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
    • G03F1/68—Preparation processes not covered by groups G03F1/20 - G03F1/50

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Manufacture Or Reproduction Of Printing Formes (AREA)
  • Preparing Plates And Mask In Photomechanical Process (AREA)
JP1173180A 1980-02-01 1980-02-01 Original negative for engraving Granted JPS56109352A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP1173180A JPS56109352A (en) 1980-02-01 1980-02-01 Original negative for engraving

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP1173180A JPS56109352A (en) 1980-02-01 1980-02-01 Original negative for engraving

Publications (2)

Publication Number Publication Date
JPS56109352A true JPS56109352A (en) 1981-08-29
JPS6216416B2 JPS6216416B2 (enExample) 1987-04-13

Family

ID=11786169

Family Applications (1)

Application Number Title Priority Date Filing Date
JP1173180A Granted JPS56109352A (en) 1980-02-01 1980-02-01 Original negative for engraving

Country Status (1)

Country Link
JP (1) JPS56109352A (enExample)

Also Published As

Publication number Publication date
JPS6216416B2 (enExample) 1987-04-13

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