JPS56101141A - Photosensitive material and its developing method - Google Patents

Photosensitive material and its developing method

Info

Publication number
JPS56101141A
JPS56101141A JP340680A JP340680A JPS56101141A JP S56101141 A JPS56101141 A JP S56101141A JP 340680 A JP340680 A JP 340680A JP 340680 A JP340680 A JP 340680A JP S56101141 A JPS56101141 A JP S56101141A
Authority
JP
Japan
Prior art keywords
contg
water
coupler
polyvinyl alcohol
alkaline aqueous
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP340680A
Other languages
English (en)
Japanese (ja)
Other versions
JPH0246934B2 (enrdf_load_stackoverflow
Inventor
Takeo Moriya
Toshio Yamagata
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Kimoto Co Ltd
Original Assignee
Kimoto Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Kimoto Co Ltd filed Critical Kimoto Co Ltd
Priority to JP340680A priority Critical patent/JPS56101141A/ja
Publication of JPS56101141A publication Critical patent/JPS56101141A/ja
Publication of JPH0246934B2 publication Critical patent/JPH0246934B2/ja
Granted legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/09—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers
    • G03F7/105—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers having substances, e.g. indicators, for forming visible images

Landscapes

  • Engineering & Computer Science (AREA)
  • Architecture (AREA)
  • Structural Engineering (AREA)
  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
JP340680A 1980-01-16 1980-01-16 Photosensitive material and its developing method Granted JPS56101141A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP340680A JPS56101141A (en) 1980-01-16 1980-01-16 Photosensitive material and its developing method

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP340680A JPS56101141A (en) 1980-01-16 1980-01-16 Photosensitive material and its developing method

Publications (2)

Publication Number Publication Date
JPS56101141A true JPS56101141A (en) 1981-08-13
JPH0246934B2 JPH0246934B2 (enrdf_load_stackoverflow) 1990-10-17

Family

ID=11556496

Family Applications (1)

Application Number Title Priority Date Filing Date
JP340680A Granted JPS56101141A (en) 1980-01-16 1980-01-16 Photosensitive material and its developing method

Country Status (1)

Country Link
JP (1) JPS56101141A (enrdf_load_stackoverflow)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4537851A (en) * 1980-10-22 1985-08-27 Hitachi, Ltd. Process of forming powder pattern using positive diazonium salt photoresist

Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS4926003A (enrdf_load_stackoverflow) * 1972-07-03 1974-03-08
JPS4962205A (enrdf_load_stackoverflow) * 1972-10-20 1974-06-17
JPS5018777A (enrdf_load_stackoverflow) * 1973-06-26 1975-02-27
JPS5351004A (en) * 1976-10-18 1978-05-10 Aicello Chemical Co Composition of photosensitive resin plate

Patent Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS4926003A (enrdf_load_stackoverflow) * 1972-07-03 1974-03-08
JPS4962205A (enrdf_load_stackoverflow) * 1972-10-20 1974-06-17
JPS5018777A (enrdf_load_stackoverflow) * 1973-06-26 1975-02-27
JPS5351004A (en) * 1976-10-18 1978-05-10 Aicello Chemical Co Composition of photosensitive resin plate

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4537851A (en) * 1980-10-22 1985-08-27 Hitachi, Ltd. Process of forming powder pattern using positive diazonium salt photoresist

Also Published As

Publication number Publication date
JPH0246934B2 (enrdf_load_stackoverflow) 1990-10-17

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