JPS5596945A - Developing method - Google Patents

Developing method

Info

Publication number
JPS5596945A
JPS5596945A JP438879A JP438879A JPS5596945A JP S5596945 A JPS5596945 A JP S5596945A JP 438879 A JP438879 A JP 438879A JP 438879 A JP438879 A JP 438879A JP S5596945 A JPS5596945 A JP S5596945A
Authority
JP
Japan
Prior art keywords
developer
development
water droplets
heating element
atmosphere
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP438879A
Other languages
English (en)
Japanese (ja)
Other versions
JPS6328298B2 (enrdf_load_stackoverflow
Inventor
Mototsugu Ogura
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Panasonic Holdings Corp
Original Assignee
Matsushita Electric Industrial Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Matsushita Electric Industrial Co Ltd filed Critical Matsushita Electric Industrial Co Ltd
Priority to JP438879A priority Critical patent/JPS5596945A/ja
Publication of JPS5596945A publication Critical patent/JPS5596945A/ja
Publication of JPS6328298B2 publication Critical patent/JPS6328298B2/ja
Granted legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/26—Processing photosensitive materials; Apparatus therefor
    • G03F7/30—Imagewise removal using liquid means
    • G03F7/3021—Imagewise removal using liquid means from a wafer supported on a rotating chuck

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Photographic Processing Devices Using Wet Methods (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
JP438879A 1979-01-17 1979-01-17 Developing method Granted JPS5596945A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP438879A JPS5596945A (en) 1979-01-17 1979-01-17 Developing method

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP438879A JPS5596945A (en) 1979-01-17 1979-01-17 Developing method

Publications (2)

Publication Number Publication Date
JPS5596945A true JPS5596945A (en) 1980-07-23
JPS6328298B2 JPS6328298B2 (enrdf_load_stackoverflow) 1988-06-08

Family

ID=11582966

Family Applications (1)

Application Number Title Priority Date Filing Date
JP438879A Granted JPS5596945A (en) 1979-01-17 1979-01-17 Developing method

Country Status (1)

Country Link
JP (1) JPS5596945A (enrdf_load_stackoverflow)

Cited By (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5898640U (ja) * 1981-12-26 1983-07-05 三菱電機株式会社 自動現像装置
JPS63168025A (ja) * 1986-12-29 1988-07-12 Tokyo Electron Ltd 現像方法
JPS63181321A (ja) * 1987-01-23 1988-07-26 Hitachi Ltd ベ−ク装置
KR100776281B1 (ko) 2006-06-20 2007-11-13 세메스 주식회사 기판 처리 장치
US8267103B2 (en) 2006-06-12 2012-09-18 Semes Co. Ltd Method and apparatus for cleaning substrates

Cited By (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5898640U (ja) * 1981-12-26 1983-07-05 三菱電機株式会社 自動現像装置
JPS63168025A (ja) * 1986-12-29 1988-07-12 Tokyo Electron Ltd 現像方法
JPS63181321A (ja) * 1987-01-23 1988-07-26 Hitachi Ltd ベ−ク装置
US8267103B2 (en) 2006-06-12 2012-09-18 Semes Co. Ltd Method and apparatus for cleaning substrates
KR100776281B1 (ko) 2006-06-20 2007-11-13 세메스 주식회사 기판 처리 장치

Also Published As

Publication number Publication date
JPS6328298B2 (enrdf_load_stackoverflow) 1988-06-08

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