JPS559539A - Heat resistant paste for photoforming - Google Patents
Heat resistant paste for photoformingInfo
- Publication number
- JPS559539A JPS559539A JP8212178A JP8212178A JPS559539A JP S559539 A JPS559539 A JP S559539A JP 8212178 A JP8212178 A JP 8212178A JP 8212178 A JP8212178 A JP 8212178A JP S559539 A JPS559539 A JP S559539A
- Authority
- JP
- Japan
- Prior art keywords
- heat resistant
- pts
- photoforming
- photoresist
- type
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Landscapes
- Formation Of Insulating Films (AREA)
Abstract
PURPOSE: To prepare a paste capable of photoforming and superior in electric characteristics and heat resistance, by using a specified heat resistant photoresist as a binder.
CONSTITUTION: One hundred wt. pts of heat resistant photoresist consisting of a sensitizer and a heat resistant photoresist selected from polyimide type, polyamideimide type, or polyamide acid type photoresist, for example, cinnamate group- introduced organic solvent-soluble polyamideimide or polyamide acid are dissolved in a proper polar solvent, preferably in an amount of 140 to 2000 wt. pts.. Into this solution are dispersed particles selected from metals, metal oxides, metal nitrides, metal carbides, carbon, and boron for imparting electric characteristics, preferably in an amount of 50 to 1000 wt. pts..
COPYRIGHT: (C)1980,JPO&Japio
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP8212178A JPS559539A (en) | 1978-07-07 | 1978-07-07 | Heat resistant paste for photoforming |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP8212178A JPS559539A (en) | 1978-07-07 | 1978-07-07 | Heat resistant paste for photoforming |
Publications (1)
Publication Number | Publication Date |
---|---|
JPS559539A true JPS559539A (en) | 1980-01-23 |
Family
ID=13765572
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP8212178A Pending JPS559539A (en) | 1978-07-07 | 1978-07-07 | Heat resistant paste for photoforming |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS559539A (en) |
Cited By (10)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS5913616U (en) * | 1982-07-15 | 1984-01-27 | 三菱重工業株式会社 | Internal combustion engine supply and exhaust valves |
JPS59160139A (en) * | 1983-03-04 | 1984-09-10 | Hitachi Ltd | Photosensitive polymer composition |
JPS60255821A (en) * | 1984-05-17 | 1985-12-17 | チバ‐ガイギー アーゲー | Polymer, coated workpiece thereby, relief image and manufacture of protective layer |
JPS6195551A (en) * | 1984-10-16 | 1986-05-14 | Matsushita Electric Ind Co Ltd | Multiwiring structure of integrated circuit |
JPS6313032A (en) * | 1986-07-03 | 1988-01-20 | Ube Ind Ltd | Organic solvent soluble positive type photosensitive polyimide composition |
JPH05134402A (en) * | 1991-02-26 | 1993-05-28 | Hitachi Ltd | Resist mask for dry etching and it's resist mask resin composition and fine working method by dry etching using the resist mask |
JPH10319580A (en) * | 1994-11-17 | 1998-12-04 | Toray Ind Inc | Photosensitive conductive paste and production of electrode |
JPH1152572A (en) * | 1997-08-08 | 1999-02-26 | Fujitsu Ltd | Photosensitive resin composition and pattern forming method by using the same |
JPH11327135A (en) * | 1998-05-20 | 1999-11-26 | Fujitsu Ltd | Photosensitive heat-resistant resin composition, method for forming pattern of heat-resistant insulating film using this composition, and patterned heat-resistant insulating film obtained by this method |
JP2018521191A (en) * | 2015-07-22 | 2018-08-02 | サン ケミカル コーポレイション | Printed circuit board ink |
-
1978
- 1978-07-07 JP JP8212178A patent/JPS559539A/en active Pending
Cited By (11)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS5913616U (en) * | 1982-07-15 | 1984-01-27 | 三菱重工業株式会社 | Internal combustion engine supply and exhaust valves |
JPS59160139A (en) * | 1983-03-04 | 1984-09-10 | Hitachi Ltd | Photosensitive polymer composition |
JPH0318703B2 (en) * | 1983-03-04 | 1991-03-13 | Hitachi Seisakusho Kk | |
JPS60255821A (en) * | 1984-05-17 | 1985-12-17 | チバ‐ガイギー アーゲー | Polymer, coated workpiece thereby, relief image and manufacture of protective layer |
JPS6195551A (en) * | 1984-10-16 | 1986-05-14 | Matsushita Electric Ind Co Ltd | Multiwiring structure of integrated circuit |
JPS6313032A (en) * | 1986-07-03 | 1988-01-20 | Ube Ind Ltd | Organic solvent soluble positive type photosensitive polyimide composition |
JPH05134402A (en) * | 1991-02-26 | 1993-05-28 | Hitachi Ltd | Resist mask for dry etching and it's resist mask resin composition and fine working method by dry etching using the resist mask |
JPH10319580A (en) * | 1994-11-17 | 1998-12-04 | Toray Ind Inc | Photosensitive conductive paste and production of electrode |
JPH1152572A (en) * | 1997-08-08 | 1999-02-26 | Fujitsu Ltd | Photosensitive resin composition and pattern forming method by using the same |
JPH11327135A (en) * | 1998-05-20 | 1999-11-26 | Fujitsu Ltd | Photosensitive heat-resistant resin composition, method for forming pattern of heat-resistant insulating film using this composition, and patterned heat-resistant insulating film obtained by this method |
JP2018521191A (en) * | 2015-07-22 | 2018-08-02 | サン ケミカル コーポレイション | Printed circuit board ink |
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