JPS5593641A - Electromagnetic focussing cathode ray tube - Google Patents

Electromagnetic focussing cathode ray tube

Info

Publication number
JPS5593641A
JPS5593641A JP22479A JP22479A JPS5593641A JP S5593641 A JPS5593641 A JP S5593641A JP 22479 A JP22479 A JP 22479A JP 22479 A JP22479 A JP 22479A JP S5593641 A JPS5593641 A JP S5593641A
Authority
JP
Japan
Prior art keywords
magnetic
magnetizing yoke
cylindrical section
magnetic field
magnetizing
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP22479A
Other languages
Japanese (ja)
Other versions
JPH0131257B2 (en
Inventor
Kyohei Fukuda
Soichi Sakurai
Masanobu Takada
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Hitachi Ltd
Original Assignee
Hitachi Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Hitachi Ltd filed Critical Hitachi Ltd
Priority to JP22479A priority Critical patent/JPS5593641A/en
Publication of JPS5593641A publication Critical patent/JPS5593641A/en
Publication of JPH0131257B2 publication Critical patent/JPH0131257B2/ja
Granted legal-status Critical Current

Links

Abstract

PURPOSE: To reduce the leak magnetic field from a magnetic circuit consisting of permanent magnets and magnetizing yokes by providing the cylindrical section made of soft and ferro magnetic matreials whose shaft matches the central axis of each electron beam on its thru hole edge of the magnetizing yoke.
CONSTITUTION: The magnetizing yoke 14 consisting of soft and ferro magnetic materials is tightly placed on both magnetic pole surfaces of the permanent magnet 8 so that the disk shaped magnetizing yoke 14a in which the thru holes 7 of the electron beams 9, 10 and 11 are provided inline can match the procession direction of the electron beams 9, 10 and 11. The cylindrical section 14b which is parallel in the axial direction from the circumferential end of the magnetizing yoke 14a and which extends in each separation direction is formed in a body individually. A greater part of the magnetic fields from the permanent magnet 8 is produced as the focussing magnetic field distribution 12 and the leak magnetic field 13 inside the cylindrical section 14b can be reduced sharply.
COPYRIGHT: (C)1980,JPO&Japio
JP22479A 1979-01-08 1979-01-08 Electromagnetic focussing cathode ray tube Granted JPS5593641A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP22479A JPS5593641A (en) 1979-01-08 1979-01-08 Electromagnetic focussing cathode ray tube

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP22479A JPS5593641A (en) 1979-01-08 1979-01-08 Electromagnetic focussing cathode ray tube

Publications (2)

Publication Number Publication Date
JPS5593641A true JPS5593641A (en) 1980-07-16
JPH0131257B2 JPH0131257B2 (en) 1989-06-23

Family

ID=11467983

Family Applications (1)

Application Number Title Priority Date Filing Date
JP22479A Granted JPS5593641A (en) 1979-01-08 1979-01-08 Electromagnetic focussing cathode ray tube

Country Status (1)

Country Link
JP (1) JPS5593641A (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US8618514B2 (en) 2002-06-26 2013-12-31 Semequip, Inc. Ion implantation device and a method of semiconductor manufacturing by the implantation of boron hydride cluster ions

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US7960709B2 (en) * 2002-06-26 2011-06-14 Semequip, Inc. Ion implantation device and a method of semiconductor manufacturing by the implantation of boron hydride cluster ions

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US8618514B2 (en) 2002-06-26 2013-12-31 Semequip, Inc. Ion implantation device and a method of semiconductor manufacturing by the implantation of boron hydride cluster ions

Also Published As

Publication number Publication date
JPH0131257B2 (en) 1989-06-23

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