JPS5580317A - Device for automatically projecting and printing - Google Patents

Device for automatically projecting and printing

Info

Publication number
JPS5580317A
JPS5580317A JP15971179A JP15971179A JPS5580317A JP S5580317 A JPS5580317 A JP S5580317A JP 15971179 A JP15971179 A JP 15971179A JP 15971179 A JP15971179 A JP 15971179A JP S5580317 A JPS5580317 A JP S5580317A
Authority
JP
Japan
Prior art keywords
printing
automatically projecting
projecting
automatically
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP15971179A
Other languages
Japanese (ja)
Other versions
JPS598059B2 (en
Inventor
Peeta Kurainkunehito Hansu
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
RCA Corp
Original Assignee
RCA Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by RCA Corp filed Critical RCA Corp
Publication of JPS5580317A publication Critical patent/JPS5580317A/en
Publication of JPS598059B2 publication Critical patent/JPS598059B2/en
Expired legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F9/00—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically
    • G03F9/70—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically for microlithography
    • G03F9/7073—Alignment marks and their environment
    • G03F9/7076—Mark details, e.g. phase grating mark, temporary mark
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F9/00—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically
    • G03F9/70—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically for microlithography
    • G03F9/7049—Technique, e.g. interferometric

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Projection-Type Copiers In General (AREA)
JP54159711A 1978-12-08 1979-12-07 Automatic projection printing device Expired JPS598059B2 (en)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US96778578A 1978-12-08 1978-12-08
US9677851-5F64 1978-12-08

Publications (2)

Publication Number Publication Date
JPS5580317A true JPS5580317A (en) 1980-06-17
JPS598059B2 JPS598059B2 (en) 1984-02-22

Family

ID=25513318

Family Applications (1)

Application Number Title Priority Date Filing Date
JP54159711A Expired JPS598059B2 (en) 1978-12-08 1979-12-07 Automatic projection printing device

Country Status (4)

Country Link
JP (1) JPS598059B2 (en)
DE (1) DE2948646C2 (en)
GB (1) GB2040444B (en)
IT (1) IT1125000B (en)

Cited By (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS60257450A (en) * 1984-05-29 1985-12-19 エヌ・ベー・フイリツプス・フルーイランペンフアブリケン Mask pattern image forming apparatus
JPS6165251A (en) * 1984-09-07 1986-04-03 Matsushita Electric Ind Co Ltd Exposing device
JPS63283129A (en) * 1987-05-15 1988-11-21 Nikon Corp Alignment device
JP2007139752A (en) * 2005-10-18 2007-06-07 Canon Inc Pattern formation device and method, and mold for pattern formation
JP2007314898A (en) * 2006-05-23 2007-12-06 Big John Corp Jeans and method for producing the same

Families Citing this family (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4580900A (en) * 1982-04-02 1986-04-08 Eaton Corporation Auto focus alignment and measurement system and method
DE3212393A1 (en) * 1982-04-02 1983-10-13 Karl Süss KG, Präzisionsgeräte für Wissenschaft und Industrie - GmbH & Co, 8046 Garching INTERFERENCE LUBRICATION METHOD AND ALIGNMENT METHOD AND DEVICE
US4615621A (en) * 1982-04-02 1986-10-07 Eaton Corporation Auto-focus alignment and measurement system and method
DE3236872C2 (en) * 1982-10-05 1986-04-30 Karl Ludwig 8000 München Hörmann Device for the optical determination of the position of an object
GB2146427B (en) * 1983-08-01 1987-10-21 Canon Kk Semiconductor manufacture
EP0182251B1 (en) * 1984-11-13 1989-10-18 Hitachi, Ltd. Alignment method for reduction projection type aligner
JPS63167014U (en) * 1987-04-16 1988-10-31
CN109309144A (en) * 2018-10-26 2019-02-05 合肥晶澳太阳能科技有限公司 A kind of photovoltaic component lamination localization method, tooling and structure

Family Cites Families (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE2539206A1 (en) * 1975-09-03 1977-03-17 Siemens Ag METHOD FOR AUTOMATIC ADJUSTMENT OF SEMI-CONDUCTOR DISCS
US4200395A (en) * 1977-05-03 1980-04-29 Massachusetts Institute Of Technology Alignment of diffraction gratings

Cited By (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS60257450A (en) * 1984-05-29 1985-12-19 エヌ・ベー・フイリツプス・フルーイランペンフアブリケン Mask pattern image forming apparatus
JPS6165251A (en) * 1984-09-07 1986-04-03 Matsushita Electric Ind Co Ltd Exposing device
JPH0544817B2 (en) * 1984-09-07 1993-07-07 Matsushita Electric Ind Co Ltd
JPS63283129A (en) * 1987-05-15 1988-11-21 Nikon Corp Alignment device
JP2007139752A (en) * 2005-10-18 2007-06-07 Canon Inc Pattern formation device and method, and mold for pattern formation
JP2007314898A (en) * 2006-05-23 2007-12-06 Big John Corp Jeans and method for producing the same

Also Published As

Publication number Publication date
DE2948646A1 (en) 1980-06-19
GB2040444A (en) 1980-08-28
GB2040444B (en) 1983-03-23
IT1125000B (en) 1986-05-14
IT7927366A0 (en) 1979-11-16
DE2948646C2 (en) 1984-10-18
JPS598059B2 (en) 1984-02-22

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