JPS5572031A - Electron beam contraction projection exposure device - Google Patents
Electron beam contraction projection exposure deviceInfo
- Publication number
- JPS5572031A JPS5572031A JP14532878A JP14532878A JPS5572031A JP S5572031 A JPS5572031 A JP S5572031A JP 14532878 A JP14532878 A JP 14532878A JP 14532878 A JP14532878 A JP 14532878A JP S5572031 A JPS5572031 A JP S5572031A
- Authority
- JP
- Japan
- Prior art keywords
- mask
- electron beam
- photo
- projected
- cathode material
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Landscapes
- Electron Beam Exposure (AREA)
Abstract
PURPOSE: To prevent a formed image from poor focussing by a structure wherein a photo-cathode faces a transmittance type mask which is also used as an accelerating electrode, and transmitted electron beam image is contracted and projected.
CONSTITUTION: A photo-cathode material 14b is evaporated and uniformly deposited on the glass plate 14a, which is made to face the transmittance type mask 15 installed in the vacuum chamber 9. The mask 15 has a pattern 15a of mesh-type copper thin layer with lines about 1μm wide. The power supply 13 gives the mask 15 a voltage positive against the photo-cathode material 14b. Ultraviolet irradiation on the cathode material 14b causes photoelectrons to be uniformly emitted, which are accelerated by the mask 15 and projected to the projection lens. Even when the photo-cathode 14 is distorted by temperature rise, the structure allows no distorsion of the mask 15, thus permitting transmitting electron beam to maintain its parallelism. The uniformly formed cathode material 14b causes no distortion to the accelerated field and a uniform electron beam shower is projected to the mask 15. Thus, no blurredness occurs to the projected image.
COPYRIGHT: (C)1980,JPO&Japio
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP14532878A JPS5572031A (en) | 1978-11-27 | 1978-11-27 | Electron beam contraction projection exposure device |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP14532878A JPS5572031A (en) | 1978-11-27 | 1978-11-27 | Electron beam contraction projection exposure device |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS5572031A true JPS5572031A (en) | 1980-05-30 |
| JPS5622365B2 JPS5622365B2 (en) | 1981-05-25 |
Family
ID=15382617
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP14532878A Granted JPS5572031A (en) | 1978-11-27 | 1978-11-27 | Electron beam contraction projection exposure device |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS5572031A (en) |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2015204404A (en) * | 2014-04-15 | 2015-11-16 | 株式会社ニューフレアテクノロジー | Multi-beam drawing method and multi-beam drawing device |
Families Citing this family (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH0646117B2 (en) * | 1985-06-11 | 1994-06-15 | 積水ハウス株式会社 | Solar heat utilization device using wall of building |
-
1978
- 1978-11-27 JP JP14532878A patent/JPS5572031A/en active Granted
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2015204404A (en) * | 2014-04-15 | 2015-11-16 | 株式会社ニューフレアテクノロジー | Multi-beam drawing method and multi-beam drawing device |
Also Published As
| Publication number | Publication date |
|---|---|
| JPS5622365B2 (en) | 1981-05-25 |
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