JPS556367A - Production of multilayer film interference filter - Google Patents

Production of multilayer film interference filter

Info

Publication number
JPS556367A
JPS556367A JP7897378A JP7897378A JPS556367A JP S556367 A JPS556367 A JP S556367A JP 7897378 A JP7897378 A JP 7897378A JP 7897378 A JP7897378 A JP 7897378A JP S556367 A JPS556367 A JP S556367A
Authority
JP
Japan
Prior art keywords
interference filter
multilayer film
base material
base
filter
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP7897378A
Other languages
Japanese (ja)
Other versions
JPS6138442B2 (en
Inventor
Hidenori Nomura
Hiroshi Honmo
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
NEC Corp
Original Assignee
NEC Corp
Nippon Electric Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by NEC Corp, Nippon Electric Co Ltd filed Critical NEC Corp
Priority to JP7897378A priority Critical patent/JPS556367A/en
Priority to US06/008,979 priority patent/US4243398A/en
Priority to GB7904222A priority patent/GB2017331B/en
Priority to CA000321088A priority patent/CA1111683A/en
Publication of JPS556367A publication Critical patent/JPS556367A/en
Publication of JPS6138442B2 publication Critical patent/JPS6138442B2/ja
Granted legal-status Critical Current

Links

Landscapes

  • Optical Filters (AREA)

Abstract

PURPOSE: To provide stable desired filter characteristics by thermally expanding the filter base material deposited with two or more kinds of transparent dielectrics on either of inner or outer wall of a tubular base while making the pressure in the pipe positive thereby adjusting the deposited film thickness of the transparent dielectric to a desired value.
CONSTITUTION: SiO2-GeO2 base glass and SiO2-B2O3 base glass are alternately chemically evaporated on the inside wall of a tubular base 21 composed of quartz glass tube to form a multilayer film interference filter base material 20 having a transparent dielectric deposited layer 22 as A process. Next, as B process, the inside diameter of this multilayer film interference filter base material 20 is heated and gradually expanded while the pressure therein is being made positive, whereby the thickness of the transparent dielectric layer 22 is reduced down to a required value. As the final C process, a plate-form multilayer film interference filter 10 is cut out from the tubular multiplayer interference film base material 20, whereby the multilayer interference filter 10 having required filter characteristics is produced.
COPYRIGHT: (C)1980,JPO&Japio
JP7897378A 1978-02-09 1978-06-28 Production of multilayer film interference filter Granted JPS556367A (en)

Priority Applications (4)

Application Number Priority Date Filing Date Title
JP7897378A JPS556367A (en) 1978-06-28 1978-06-28 Production of multilayer film interference filter
US06/008,979 US4243398A (en) 1978-02-09 1979-02-02 Method of producing dielectric diffraction gratings or dielectric multilayer interference filters
GB7904222A GB2017331B (en) 1978-02-09 1979-02-07 Method of producing dielectric diffraction gratings
CA000321088A CA1111683A (en) 1978-02-09 1979-02-08 Method of producing dielectric diffraction gratings or dielectric multilayer interference filters

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP7897378A JPS556367A (en) 1978-06-28 1978-06-28 Production of multilayer film interference filter

Publications (2)

Publication Number Publication Date
JPS556367A true JPS556367A (en) 1980-01-17
JPS6138442B2 JPS6138442B2 (en) 1986-08-29

Family

ID=13676836

Family Applications (1)

Application Number Title Priority Date Filing Date
JP7897378A Granted JPS556367A (en) 1978-02-09 1978-06-28 Production of multilayer film interference filter

Country Status (1)

Country Link
JP (1) JPS556367A (en)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH02259602A (en) * 1988-11-14 1990-10-22 General Electric Co <Ge> Tantal oxide-silica interference filter and lamp using the same
JPH03233501A (en) * 1990-02-09 1991-10-17 Copal Co Ltd Optical multilayered film filter element and production thereof

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH02259602A (en) * 1988-11-14 1990-10-22 General Electric Co <Ge> Tantal oxide-silica interference filter and lamp using the same
JPH0816726B2 (en) * 1988-11-14 1996-02-21 ゼネラル・エレクトリック・カンパニイ Tantalum oxide-silica interference filter, substrate using it, interference filter and electric lamp
JPH03233501A (en) * 1990-02-09 1991-10-17 Copal Co Ltd Optical multilayered film filter element and production thereof

Also Published As

Publication number Publication date
JPS6138442B2 (en) 1986-08-29

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