JPS555904A - Production of base material for electroless plating - Google Patents

Production of base material for electroless plating

Info

Publication number
JPS555904A
JPS555904A JP7701678A JP7701678A JPS555904A JP S555904 A JPS555904 A JP S555904A JP 7701678 A JP7701678 A JP 7701678A JP 7701678 A JP7701678 A JP 7701678A JP S555904 A JPS555904 A JP S555904A
Authority
JP
Japan
Prior art keywords
polybutadiene
base material
treated
give
production
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP7701678A
Other languages
Japanese (ja)
Inventor
Hiroshi Ohira
Seisaburo Shimizu
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Toshiba Corp
Original Assignee
Toshiba Corp
Tokyo Shibaura Electric Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Toshiba Corp, Tokyo Shibaura Electric Co Ltd filed Critical Toshiba Corp
Priority to JP7701678A priority Critical patent/JPS555904A/en
Publication of JPS555904A publication Critical patent/JPS555904A/en
Pending legal-status Critical Current

Links

Landscapes

  • Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)
  • Chemically Coating (AREA)
  • Treatments Of Macromolecular Shaped Articles (AREA)

Abstract

PURPOSE: A silicon-modified polybutadine resulting from adding silane or polysiloxane derivatives to a specific polybutadiene is treated with water and then heat to produce said base material for electoless plating that requires no adhesive.
CONSTITUTION: The addition reaction of (a) 20W0.5 wt% of a silane derivative or polysiloxane derivative having at least one of bonds of formula I and II (X is 1W5C alokoxy, C1, Br) and the rests of methyl, ethyl, propy1, pheny1) to (b) 80W99.5 wt% of a polybutadiene with over 85% 1,2-addition structure and 10W 30% crystallinity is effected to give a slicone-modified polybutadiene. After formed into sheets or plates, the polybutadiene is treated with water or steam to crosslink the polybutatdiene chains through the organic silicon compound and then treated with heat to complete the crosslinking to give the base material.
COPYRIGHT: (C)1980,JPO&Japio
JP7701678A 1978-06-27 1978-06-27 Production of base material for electroless plating Pending JPS555904A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP7701678A JPS555904A (en) 1978-06-27 1978-06-27 Production of base material for electroless plating

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP7701678A JPS555904A (en) 1978-06-27 1978-06-27 Production of base material for electroless plating

Publications (1)

Publication Number Publication Date
JPS555904A true JPS555904A (en) 1980-01-17

Family

ID=13621949

Family Applications (1)

Application Number Title Priority Date Filing Date
JP7701678A Pending JPS555904A (en) 1978-06-27 1978-06-27 Production of base material for electroless plating

Country Status (1)

Country Link
JP (1) JPS555904A (en)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5213743A (en) * 1986-06-24 1993-05-25 Goyo Paper Working Co., Ltd. Method of manufacturing release paper
WO1996020964A1 (en) * 1994-12-30 1996-07-11 Novartis Ag Siloxane-containing networks

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5213743A (en) * 1986-06-24 1993-05-25 Goyo Paper Working Co., Ltd. Method of manufacturing release paper
WO1996020964A1 (en) * 1994-12-30 1996-07-11 Novartis Ag Siloxane-containing networks

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